EE-612: Lecture 26: CMOS Limits Mark Lundstrom Electrical and - - PowerPoint PPT Presentation

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EE-612: Lecture 26: CMOS Limits Mark Lundstrom Electrical and - - PowerPoint PPT Presentation

EE-612: Lecture 26: CMOS Limits Mark Lundstrom Electrical and Computer Engineering Purdue University West Lafayette, IN USA Fall 2006 NCN www.nanohub.org Lundstrom EE-612 F06 1 Outline 1) Review: CMOS Metrics 2) MOSFET limits 3)


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Lundstrom EE-612 F06 1

EE-612: Lecture 26: CMOS Limits

Mark Lundstrom Electrical and Computer Engineering Purdue University West Lafayette, IN USA Fall 2006

www.nanohub.org

NCN

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Lundstrom EE-612 F06 2

Outline

1) Review: CMOS Metrics 2) MOSFET limits 3) Circuit limits 4) System Limits

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CMOS metrics

1) Switching energy: ES = 1 2 CVDD

2

2) Switching delay: τ S = CVDD ID(ON) 3) Dynamic power: P

D = α f CVDD 2

4) Energy-delay product: ESτ = 1 2 C 2VDD

3

ID(on)

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Outline

1) CMOS Metrics 2) MOSFET limits 3) Circuit limits 4) System limits

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device limit questions

1) minimum energy dissipation per logic transition 2) minimum channel length 3) maximum device density 4) minimum device delay 5) power density 6) power-limited device density 7) CMOS vs. the ultimate switch

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acknowledgment

The approach that I take here is similar to the work of V.V. Zhirnov, R.K. Cavin, J.A. Hutchby, and G. Bourianoff, “Limits to Binary Logic Switch Scaling - A Gedankan Model,” Proc. IEEE, Special Issue on Nanoelectronics and Nanoscale Processing, Nov. 2003.

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Lundstrom EE-612 F06 7

MOSFETs control current with potential barriers

S D G

ID VDS

VGS

VD= VDD

electron energy

  • vs. position

VD≈ 0V

E.O. Johnson, RCA Review, 1971

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Lundstrom EE-612 F06 8

L

ballistic channel

ultimate MOSFET in the off-state

source (strong scattering) drain (strong scattering)

OFF state EC y EF EF − qVDS EB

low gate voltage: large barrier

ED

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Lundstrom EE-612 F06 9

ultimate MOSFET in the on-state

source (strong scattering) drain (strong scattering)

ON state EC y L EF EF − qVDS EB = 0

ballistic channel

high gate voltage: no barrier

ED(on)

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Lundstrom EE-612 F06 10

minimum switching energy

To distinguish off from on, electrons in the source must have less than a 50:50 chance of moving over the barrier from the source to drain.

e− EB /kBT < 1 2 EB > Emin = kBT ln(2)

source drain

OFF

EC y

EB

L

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minimum switching energy (ii)

To distinguish on from off, electrons in the drain must have less than a 50:50 chance of moving over the barrier from the drain to source.

e− ED /kBT < 1 2 ED > Emin = kBT ln(2) (minimum energy dissipation per logic transition)

source

ON

EC y ED

drain

ES > kBT ln(2)= 0.003 aJ L

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Lundstrom EE-612 F06 12

minimum switching energy (iii)

Does it take additional energy to move the gate-controlled barrier up and down?

(kBT ln(2) is the min energy dissipation per logic transition)

source

ON

EC y ED

drain

L

?

+

  • I

1 2 CTOTVDD

2

Vin(t)

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Lundstrom EE-612 F06 13

minimum device size

To distinguish off from on, the probability that an electron tunnels through the barrier must be less than a 50:50.

P(WKB) = exp − 2 2mE

  • L

⎛ ⎝ ⎜ ⎞ ⎠ ⎟ < 1 2 E = kBT = ES(min) ln(2)

source drain

“OFF”

EC y L

L > ln(2) 2

  • 2mE

Lmin ≈ h 2mES(min) = 1.5nm(300K)

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minimum device size (again)

Lmin ≈ h 2mES(min) = 1.5nm(300K) ΔpΔx > h

source drain

“OFF”

EC y L Δp2 2m = ES min

( )

Δx = L

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Lundstrom EE-612 F06 15

minimum device size (iii)

Note also that the size of a device, S, must be larger than the size

  • f its minimum element, L. (For a MOSFET, S ~ 10-15L.)
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maximum device density

nD(max) ≈ 1 10Lmin

( )

2 = 4.7 ×1011 cm-2

We will show later that device density is limited by the maximum power density that can be dissipated - not by device size.

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maximum device speed

tS(min) ≈ Lmin υ = Lmin 2E m The minimum device transit time sets the maximum speed. E = kBT = ES(min) ln(2) Lmin ≈ h 2mES(min) tS(min) ≈ h ES(min) = 0.04 ps (300K)

source

ON

EC y

drain

L

ΔEΔt =

ts ≈ L υ

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power dissipation

P

D = α nD ES

tS

α = 1, nD(max), ES(min), tS(min)

P

D = 3.7 ×104 W/cm2

surface of the sun: forced water cooling: < 800 W/cm2 ITRS: < 100 W/cm2

6×103 W/cm2

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power-limited device density

ˆ nD(max) = P

maxtS(min)

α ES(min)

maximum power dissipation per unit area limits density

  • not our ability to make devices small.

ˆ nD(max) ~ 1.5 ×109 devices/cm2

for P

max = 100W/cm2 and α = 1

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power-constrained design

(Dave Frank, IBM) integration density power

P

max = 100W/cm2

P

standby

P

active

there is an

  • ptimum

device size!

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power-delay product

P

Dτ = ES

tS tS = ES

But….this metric does not capture the fact that we usually want to runs circuits fast and at low power.

P

Dτ min = ES min = kBT ln2

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energy-delay product

Eτ min = EStS min = ES(min) h ES(min) = h ΔEΔt > h

( )

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summary

1) Switching energy: ES > kBT ln(2) 2) Switching delay: tS >h ES(min) 3) Device size: Lmin > h 2mES(min) 4) Device density: ˆ nD <P

maxtS(min) ES(min)

5) Energy-delay: Eτ > h

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comparison to 65nm CMOS

parameter 65nm ITRS Limit 65nm /Limit

Es (aJ) 23 0.003 8000 τ (fs) 640 40 16 L (nm) 25 nm 1.5 nm 17 0.8 x 109 1.5 x 109 0.5 1.5 x 10-29 1.1 x 10-34 136,000 ˆ n

S (cm−2)

Eτ (J-s)

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  • utline

1) CMOS Metrics 2) MOSFET limits 3) Circuit limits 4) System limits

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minimum VDD

VDD VIN VOUT

VDD VDD

VOUT -->

VDD/2

VIN --> S D S D

VDD/2

Question: What is the smallest VDD for a CMOS inverter? Answer: The smallest VDD that gives a gain > 1

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reference

J.D. Meindl and J.A. Davis, “The Fundamental Limit on Binary Switchin Energy for Terascale Integration, IEEE J. Solid-State Circuits, 35, pp. 1515-1516, 2000.

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minimum VDD

VDD VIN VOUT S D S D

ID = Ke

q VGS −VT

( )/mkBT 1− e−qVDS /kBT

( )

assume subthreshold operation: IDN = KNe

q Vin −VTN

( )/mkBT 1− e−qVout /kBT

( )

IDP = KPe

q VDD −Vin +VTP

( )/mkBT 1− e

q Vout −VDD

( )/kBT

( )

IDN = IDP → Vout Vin

( )

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minimum VDD (ii)

KNe

q Vin −VTN

( )/mkBT 1− e−qVout /kBT

( )= KPe

q VDD −Vin +VTP

( )/mkBT 1− e

q Vout −VDD

( )/kBT

( )

AV > 1 ⇒ VDD > 2ln 2

( )kBT

q VDD min = 2ln 2

( )kBT

q KN = KP = K VTN = VT = −VTP m = 1 solve for AV = dVout dVin = f VDD

( )

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Lundstrom EE-612 F06 30

minimum VDD (iii)

VDD min = 2ln 2

( )kBT

q e− ED /kBT < 1 2 ED > ED min = kBT ln(2)

source

ON

EC y ED

drain

VDD min = ED min / q = kbT q ln 2

( )

L 2 MOSFETS in series ⇒

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minimum switching energy

VDD min = 2ln(2)kBT / q

VIN VOUT S D D S

+

  • CTOT

ES = 1 2 CTOTVDD

2

ES = 1 2 QVDD Q min = q ES = 1 2 Q min VDD min ES = kBT ln(2)

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  • utline

1) CMOS Metrics 2) MOSFET limits 3) Circuit limits 4) System limits

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circuit performance

device CPU circuit increase delay: switching energy: energy- delay: 0.64 ps 250 ps ~ 400 × 23 aJ 6000 aJ ~300 × ~ 10−29 J-s ~ 10−24 J-s ~100,000 ×

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circuits and fundamental limits

parameter CPU circuit Limit circuit /limit

Es (aJ) 6000 0.003 2,000,000 τ (fs) 250,000 40 6250 1.4 x 10-24 1.1 x 10-34 ~1010

Eτ (J-s)

Since 1960, switching energy has decreased by about 5 orders of

  • magnitude. (J.D. Meindl, Q. Chen, and J.A. Davis, “Limits on Silicon

Nanoelectronics for Terascale Integration,” Science, 239, pp. 2044- 2049, 2001)

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chip performance index

B = N τ S

  • ps / cm2-s

CPI = N τ S × 1 ES tS

( )

= N ES

  • ps / s-cm2-W

J.D. Meindl, “Low Power Microelectronics: Retrospect and Prospect,”

  • Proc. IEEE, 83, 619-635, 1995

CPI : 1023

(today’s high-performance logic)

CPI ultimat : 1032

(since 1960, the CPI has increased by factor of ~ 1014)

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summary

1) Key device metrics include size, switching energy, and speed. 2) Key system metrics include density, switching energy, speed, and power. 3) Device metrics are ‘approaching’ fundamental limits. 4) System metrics are a long way from fundamental limits.

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  • utline

1) CMOS Metrics 2) MOSFET limits 3) Circuit limits 4) System limits