Optical Navigation Division
Transceivers and semiconductor lasers for photonic networks
12/06/2007
Michele Agresti Michele Agresti TTC TTC-
- Avago Technologies Italy
Avago Technologies Italy Torino, ITALY Torino, ITALY
Transceivers and semiconductor lasers for photonic networks - - PowerPoint PPT Presentation
Optical Navigation Division Transceivers and semiconductor lasers for photonic networks 12/06/2007 Michele Agresti Michele Agresti TTC TTC- - Avago Technologies Italy Avago Technologies Italy Torino, ITALY Torino, ITALY FOPD Outline
Optical Navigation Division
Michele Agresti Michele Agresti TTC TTC-
Avago Technologies Italy Torino, ITALY Torino, ITALY
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Field/Order Fulfillment R&D Facilities Manufacturing R&D and Manufacturing
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March 2, 1999 HP announces creation of two independent companies
July 28, 1999 Agilent’s name is introduced November 18, 1999 Agilent’s IPO takes place
June 2, 2000 Agilent becomes fully independent November 1, 1999 Agilent starts operating as an independent company
April 2000 TTC acquisition 1 December 2005 DAY 1Avago Technologies
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Data storage Servers Storage arrays Switches and routers Service provider networking
Wireless handsets Wireless infrastructure Wireless networking
Printers and imaging Laser and
Digital TVs:
Safety In-car infotainment Navigation Lighting
Factory automation Motor controls Power generation
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Networking ASICs Fiber Optics Printer ASICs, SOCs, Motion Control, Infrared, Optical Navigation
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FOPD Long Haul Metro Storage Enterprise
a market which outperformed (vs. Telecom Market)
a market which start recovering
2-20 km 20-100 km
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FOPD Traditional components Pluggable transceiver approach
per circuit card
go
module per equipment circuit card
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LAMBDAPACK
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High Yield, high repeatability run-to-run
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EAM DFB
separation
ED08
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XENPAK is the first 10G Ethernet transceiver
X2 is the next evolution to a smaller XAUI-based 10G Ethernet solution
XFP is the next generation platform with a 10Gbit/s serial: data agnostic
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1960 1960 1970 1970 1980 1980 1990 1990 2000 2000
GaAs-omojunction GaAs/GaAlAs- eterojunction InP/InGaAsP Short wavelength - compact disk High performance lasers for telecom Transceiver - datacom downturn telecom market
1962, Semiconductor lasers: GE,MIT, IBM, Un. Illinois 1969, R.T. semiconductor lasers 1972, Bell Labs,paper on DFB (Distributed Feed-Back) 1976, MIT first 1 um laser 1984 laser for compact disk 10.000.000 chp/year 1990, MQW laser 2000, uncooled laser
FOPD
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Eg n p b) eterogiunzione in assenza di polarizzazione d) eterogiunzione in polarizzazione diretta p n
livelllo di Fermi
p n
livelllo di Fermi
Eg a) omogiunzione in assenza di polarizzazione c) omogiunzione in polarizzazione diretta p n
elettroni elettroni lacune lacune
FOPD
1 1.1 1.2 1.3 1.4 1.5 1.6 1.7 3.15 3.2 3.25 3.3 3.35 3.4 3.45 3.5 3.55
Refractive index wavelength (m)
Q(g=1.1 m) Q(g=1.3 m) Q(g=1.55 m) Material In1-xGax AsyP1-y
strato n stratoattivo n
1
n
1
n
2
2
FOPD
Cavity modes
condition)
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20 40 60 80 corrente (mA) 2 4 6 8 potenza (mW)
1280 1285 1290 1295 1300 1305
Wavelength (nm) Amplitude (dBm)
\fa36; Device:br00T20u; I = 30.0 mA; Peak: 1291.0 nm; 23-Jan-2003
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b b+ = m ( / n) b = sin (1+sinm( / n)
2n 2n Bragg wavelength
1260 1270 1280 1290 1300 1310 1320 1330 1340 1350
Wavelength (nm)
l Peak: 1306.7 nm; SMSR: 49 dB
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Threshold gain and gain margin between lasing mode and competitive mode varying grating phase Assumption: if gain margin >0.25 Single mode emission Yield=100% Phase shift value:
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MULTI QUANTUM WELL substrate: InP:n InP:p
MOCVD
<10 nm
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FOPD photoresist SiN 1) photolithography 1) photolithography 2) Chemical etch 2) Chemical etch luce UV mask
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Ti Ti-
Pt-
Au metal
SiO SiO2
2
Optimised facet cleavage process Optimised facet cleavage process Heat path Heat path Narrow reverse mesa (small cavity, fast chips) Narrow reverse mesa (small cavity, fast chips) Au plated pad Au plated pad
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material gain for different carriers density (N)
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Bulk laser: Lx = 0.1-0.3 m QW (Quantum Well) laser : Active layer Lx < 0.01 m
banda di valenza banda di conduzione
active
cladding cladding
x =growth
banda di conduzione banda di valenza E1c E2c E3c
h
E 1lh E 2lh E1hh E2hh E3hh
(Single Quantum Well) (Single Quantum Well)
Ec/g=0.67 Ev/Eg=0.33
GaAs/GaAlAs
Ec/ g=0.67 Ev/Eg=0.33
InP/InGaAsP
Ec/ g=0.75 Ev/Eg=0.25
InP/InGaAlAs
Band structure SQW
Active layer
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150 100 50 50 100 150 0.1 0.2
Level positions e hh
Ecbulk Ec Ev Ec = 0.057 eV 45 % Ev = 0.070 eV 55%
InGaAsP/InGaAsP InGaAsP/InP for unstrain MQW (Ec:Ev = 40:60) for optimized strain (Ec:Ev = 50:50 or better) InGaAlAs/InP (Ec:Ev = 70:30) InGaAsN/GaAs (Ec:Ev = 80:20!) InGaAsP/InP for unstrain MQW (Ec:Ev = 40:60) for optimized strain (Ec:Ev = 50:50 or better) InGaAlAs/InP (Ec:Ev = 70:30) InGaAsN/GaAs (Ec:Ev = 80:20!)
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10 20 30 40 50 60 70 80 90 100 5 10 15 20 25 30 35 40 45 Current (mA); - 09-Aug-2002 Power (mW)
10 20 30 40 50 60 70 80 90 100 5 10 15 20 25 30 35 40
10 20 30 40 50 60 70 80 90 100 Current (mA); - 20-Aug 2004 5 10 15 20 25 30 35 40 Power (mW)
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Current Optical power
Bias Modulation “0” level “1” level Threshold
P(0) P(1) Eye mask experimental Eye aperture Eye amplitude simulated
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FOPD A picture like this gives little information on signal distortion
Bit 1&2 Bit 1&2&3 Bit 1&2&3&4 Bit 1…5 Bit 1…8 Bit 1…32 Bit 1…127 First 32 bits of a longer bit sequence Bit 1…12 Bit 1…18 Bit 1…24 Bit 1 2 3 4 5 6 7 8 9 10
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FOPD Jitter : DJ deterministic or pattern dependent jitter RJ random jitter Eye mask Eye aperture Eye amplitude experimental simulated
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Device design:
Designed to enhance T0
High yield/low cost/Al compatible
Very fast chip at high T operation
Temperature and speed
200 m long x 250 m wide device Post Deadline Paper at OFC 2005
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20 °C base chip temperature:
85 °C base chip temperature:
95 °C base chip temperature:
10 20 30 40 50 60 70 80 90 100 5 10 15 20 25 fa021a
k113: Optical Power (T=20, 40, 60, 80, 85, 90, 95 °C)
Current (mA); - 23-Dec-2004 Power (mW)
T=20ºC; Ith= 7.6mA; P
Ith+30
= 8.9mW; Pmax = 23.8mW T=40ºC; Ith= 9.3mA; P
Ith+30
= 8.5mW, Pratio,Ith+30 =0.95; Pmax = 22.4mW T=60ºC; Ith=11.5mA; P
Ith+30
= 7.8mW, Pratio,Ith+30 =0.88; Pmax = 20.0mW T=80ºC; Ith=14.5mA; P
Ith+30
= 7.1mW, Pratio,Ith+30 =0.80; Pmax = 17.4mW T=85ºC; Ith=15.6mA; P
Ith+30
= 6.9mW, Pratio,Ith+30 =0.78; Pmax = 16.8mW T=90ºC; Ith=16.6mA; P
Ith+30
= 7.0mW, Pratio,Ith+30 =0.78; Pmax = 15.9mW T=95ºC; Ith=17.9mA; P
Ith+30
= 6.7mW, Pratio,Ith+30 =0.76; Pmax = 15.3mW
Key points:
coupling loss
since high T0
Constant eye quality with constant modulation current!
Centre of eye power Bias variation (0-85 °C)
Measured on chip on carrier Measured on chip on carrier
Slope eff. ratio= 80%
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10 Gb eye diagrams, 35 mA modulation current swing constant over T (20-110 °C) 20 °C base chip temperature:
(Fiber)
Measured probing directly the chip by 40 GHz 50 Measured probing directly the chip by 40 GHz 50 Ohm Ohm-
series matched RF probe
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techniques to compensate for limitations incurred during fiber propagation:
circuit.
existing transceivers and enabling new applications.
10 Gbps to 300m over legacy multimode fiber
TX CDR/ LD FP/DFB LinTIA 220m MMF RX CDR
Electronic Dispersion Compensation algorithm
D
t1
D
t2
D
tn
LPF
CDR Signal
Feedback
Adaptive controller
t1 tn
EQ
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L L/2 L/2
Grating, /4 phase shift centered
stop etch InP:p spacer grating layer
InGaAlAs ridge structure
InP:n InP + InGaAs contact layer
InGaAlAs MQW
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250 um
Emitting facet
200 um Angled section toward
AR AR AR AR Bar number
Main specs
Target application: 10Gb/s multi rate XFP LR
DFB top view
1250 1260 1270 1280 1290 1300 1310 1320 1330 1340
W avelength (nm)
da071a_y1; Device: da071a_y101T 20w; I = 50.0 mA; 21-S ep-2006
O Peak: 1294.8 nm; SMSR: 50 dB
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margin on OC192 SONET mask
margin on OC192 SONET mask * XFP-module provides higher Ibias and up to 55mA Iswing Lab results
20 40 60 80 100 120 5 10 15 20 25 da071ay139: Optical P ower (T =20, 40, 60, 80, 85 °C) Current (mA); - 21-S ep-2006 Power (mW) T=20ºC; Ith= 9.9mA; PIth+30= 8.0mW; Pmax= 22.5mW T=40ºC; Ith=13.1mA; PIth+30= 7.1mW, Pratio,Ith+30=0.89; Pmax= 18.6mW T=60ºC; Ith=18.3mA; PIth+30= 5.8mW, Pratio,Ith+30=0.73; Pmax= 13.9mW T=80ºC; Ith=26.2mA; PIth+30= 4.3mW, Pratio,Ith+30=0.54; Pmax= 9.0mW T=85ºC; Ith=28.8mA; PIth+30= 4.0mW, Pratio,Ith+30=0.50; Pmax= 7.8mW
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FOPD 70C 40C
0.426 A 3.3V ICC 36.256 mA I2CTXBIAS 50.38 dB SMSR 1297.38 nm PEAKWL
dB m TXOPT 6.91 dB TXEXR 18 % TXMM
0.445 A 3.3V ICC
dB m TXOPT 6.98 dB TXEXR 16 % TXMM 40C 0.488 A 3.3V ICC 64.61 mA I2CTXBIAS 48.22 dB SMSR 1304.36 nm PEAKWL
dB m TXOPT 6.96 dB TXEXR 19 % TXMM 38.6 mUI Jitter Gen Vpk-pk 4M- 80M 54.9 mUI Jitter Gen Vpk-pk 50K- 80M 70C
2 4 6 8 10 12 14 16 18 20
5 Frequency (GHz)
Device: \ NET _AN\ da130__y1\ da130__y121T 20 : Mod. Bandwidth; 11-Jun-2007 Ith + 10 mA: (Ith = 11 mA); f-3dB= 12.90 GHz Ith + 30 mA: (Ith = 11 mA); f-3dB= 18.96 GHz Ith + 50 mA: (Ith = 11 mA); f-3dB= 20.00 GHz Ith + 70 mA: (Ith = 11 mA); f-3dB= 20.00 GHz Ith + 90 mA: (Ith = 11 mA); f-3dB= 20.00 GHz
Bw=19GHz @ Ibias=40mA T=20C
2 4 6 8 10 12 14 16 18 20
5 10 Frequency (GHz)
Device: \ NET _AN\ da130__y1\ da130__y121T 80 : Mod. Bandwidth; 11-Jun-2007 Ith + 10 mA: (Ith = 27 mA); f-3dB= 9.12 GHz Ith + 30 mA: (Ith = 27 mA); f-3dB= 13.69 GHz Ith + 50 mA: (Ith = 27 mA); f-3dB= 15.28 GHz Ith + 70 mA: (Ith = 27 mA); f-3dB= 15.73 GHz
Bw=13.7GHz @ Ibias=57mA T=20C
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Pout Ia Ig Pout
DBR a 2 sezioni
Sezione attiva responsabile della emissione di fotoni Sezione di tuning sulla quale è presente un reticolo di Bragg
2 4 6 8 1 0 1 2 14 16 1 8 20 1.5
1 .51
Simulazione e misura della lunghezza d’onda di emissione in funzione della corrente nel grating
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10 20 30 40 50 60 70 1.55 1.555 1.56 1.565 Wavelength [um] GRATING Current [mA]
10 20 30 40 50 60 70 20 40 60 SMSR [dB]
Emitted wavelength and SMSR versus grating current > 10 nm tuning > 40 dB SMSR @ I active > 40 mA
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Passive and tuning waveguides DBR and SOA active waveguide
Bent waveguides MMI SOA 4 grating pitches (EBL) 10 nm spaced Bragg Wavelengths Bent
tuning DBR array
ECOC 2003 ECOC 2003
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By a monolithic InP based chip
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1.52 1.53 1.54 1.55 1.56 1.57 1.58 1.59 1.6
chip4-M35-2 @ 20°C: I
act=50mA
Wavelength - nm -
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Books
Related published paper
IEEE Transaction on Components, Hybrids, and Manufacturing Technology, Part B, Vol. 17, No 3, pp. 412-417, august 1994.
three different 1.55 m InGaAsP Buried Laser Structures", SPIE’S International Symposia - Photonics West ’96, pp. 296-305, 30 Jan. - 1 Febr. 1996, S. Josè, CA, USA.
Technology Letters, Vol. 8, No. 11, pp. 1447-1449, November 1996.
Semiconductor Laser Source”, 23rd European Conference on Optical Communication ECOC ’97, Mo 3B. 22-25 September 1997, Edimburgh (UK).
Spot Size Converted (SSC) laser”, IEEE Photonics Technology Letters, Vol. 10, No. 6, pp. 775-777, June 1998.
Technology, Vol. 16, No. 7, July 1998.
Magnetti, J. Massa, G. Meneghini, G. Rossi, P. Ryder, A. Taylor, P. Valenti and M. Meliga, "100 C, 10 Gb/s directly modulated InGaAsP DFB lasers for uncooled Ethernet applications", post-deadline at European Conference on Optical Communication ECOC ’2001, October 2001,Amstedam (NL).
Photonics West Optoelectronics 20021, 19 - 25 Jan. 2002, S. Josè, CA, USA.
electronic controlled tunable laser source with 40 nm tuning range and 20 mW output power for WDM applications", ECOC 2003, 21 - 25 Sept. 2003, Rimini, Italy
Morello, C. Rigo, E. Riva, D. Soderstrom, S. Stano, P. Valenti, M. Vallone, M. Meliga" Highly reliable and high yield 1300 nm InGaAlAs directly modulated ridge Fabry-Perot lasers, operating at 10 Gb/s, up to 110 ºC, with constant current swing ", Post deadline at Optical Fiber Conference OFC 2005, Anaheim (CA)