Transport equations [Fonstad, Sze02, Ghione] Carriers - - PowerPoint PPT Presentation

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Transport equations [Fonstad, Sze02, Ghione] Carriers - - PowerPoint PPT Presentation

Transport equations [Fonstad, Sze02, Ghione] Carriers concentrations normally are functions of position and time; in a 1D model Their variations depend on drift currents diffusion currents generatio n and recombination


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SLIDE 1

Transport equations

[Fonstad, Sze02, Ghione]

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SLIDE 2

Carriers concentrations

 normally are functions of position and time; in a 1D model  Their variations depend on

 drift currents  diffusion currents  generation and recombination  other effects (only at very very high frequencies; we will

not consider these)

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SLIDE 3

Concentrations with and without thermal equilibrium

 We add a subscript to concentrations to specify doping:

in thermal equilibrium

 n doping: nn0, pn0  p doping: np0, pp0

 Out of thermal equilibrium

 n doping: nn, pn  p doping: np, pp

 Out of thermal equilibrium, law of mass action does not

hold any more!!

 Excess concentrations  If n’ or p’ >0: injection  If n’ or p’ <0: depletion  Neutrality hypothesis -> n’~p’

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SLIDE 4

Injection

 E.g. for n doping  Low level injection: n~n0~ND

 n does not change significantly  p does change significantly, but in any case p<<n

 High level injection: n>ND

 n does change significantly  p does change significantly  p ~ n  equations are much more complex in this case

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SLIDE 5

Conduction/drift current

 Free carriers are accelerated by the electric field E =>

electric current

 For low E, the (average) drift speed is proportional to E  with mn/mp electron/hole mobility; for silicon

  • mn ~ 1000 cm2/ Vs
  • mp ~ 400 cm2/ Vs

 During their motion, carriers collide with

  • lattice imperfections
  • dopants and other (i.e., not Si) atoms (these may be

seen as lattice imperfections)

  • lattice vibration (described by phonons): atoms are not

exactly in their place, so that they may be seen as (moving) lattice imperfections

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SLIDE 6

Effective mass

 The motion of an electron in a lattice is very complex  But the lattice is very regular. If the crystal is perfect, infinite,

with fixed atoms, it may be shown that CB electrons

  • can be modeled as particles which move through the lattice

without any collision or deflection (as they were in free space!)

  • but which respond to external forces as if they had a different

mass: electron effective mass me*

 This is the effective mass model  These particles can collide with lattice defects, dopants and

impurities, phonons (lattice vibrations)

 Similarly, for holes in VB: hole effective mass mh* the big dots here are impurities, defects…

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SLIDE 7

Mobility and E

 For large E,

the velocity saturates (velocity saturation)

  • r even

decreases

electrons holes velocity field

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SLIDE 8

Mobility and doping

 With high

doping levels, carriers collide more often => lower mobility

mobility doping electrons holes

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SLIDE 9

Mobility and T

 At high T, lattice

vibration are stronger => more collisions with phonons => lower mobility

mobility electrons holes temperature

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SLIDE 10

Ohm law at a microscopic level

 Considering for the moment electrons only:

with uniform E this is the drift, or conduction, current

 Current density is

J=sE

 so that s=qnmn  In general  and the total drift current is Jdrift=sE

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SLIDE 11

r=1/s versus doping

 increase in carriers concentration is larger than  reduction in mobility

resistivity doping

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SLIDE 12

Diffusion current

 Normally, gas particles tend to diffuse in all the available

space (e.g. a gas in a room): they tend to a uniform concentration

 The same is done by carriers in semiconductors  The intensity of motion is proportional to the gradient of

the concentration

 It holds  with diffusion coefficients Dn, Dp >0.  Pay attention to the signs! concentration diffusion

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SLIDE 13

Diffusion coefficients

 It normally holds (Einstein equation)

with “thermal voltage”, ~25 mV at 300 K

 In silicon

Dn ~25 cm2/s Dp ~10 cm2/s

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SLIDE 14

The total current

 is the sum of all the contributions (drift-diffusion model):  i.e.

J= qDndn/dx + qnmnE – qDpdp/dx + qpmpE

dr dr

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SLIDE 15

Generation and recombination (GR processes)

 Generation: an electron jumps from

VB to CB, so that we also have a hole in VB

 Recombination: an electron moves

from CB to VB, where it recombines with a hole (they both disappear)

 Direct processes: direct jump from

VB to CB or vice-versa

 Indirect processes: jump from VB to

CB or vice-versa “assisted” by recombination centers, or traps, (at energy level Et), in the forbidden gap

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SLIDE 16

Generation and recombination (first approximation)

 Generation: either thermal (a phonon is absorbed) or optical (a

photon is absorbed)

 Similarly for recombination

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SLIDE 17

Direct and indirect gap

 Up to now we had considered

the energy of the electrons, but this is only a part of the picture:

 they also have momentum  The energy band structure

plots energy versus some directions of the wave vector k

 k is proportional to total

momentum: Dptot=(h/2p)Dk with h Planck constant, h ~ 6.6 . 10-34 Js

 In any transition, k must be

preserved

VB is more complicated that CB, three branches do exist

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SLIDE 18

Direct gap semiconductor

 A direct energy gap

semiconductor, such as GaAs, has the minimum of CB at the same abscissa as the maximum of VB

 So, during the transition, there

is no change in k, which is preserved

 This is a band-to-band

process

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SLIDE 19

Direct gap semiconductor: photon absorption

 If the photon energy is higher

than EG:

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SLIDE 20

Indirect gap semiconductor

 Photons have neglectable

momentum; phonons normally have neglectable energy

 For an indirect energy gap

material both a photon and a phonon are needed or generated

 Much lower probability of

photon emission/absorption wrt direct gap

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SLIDE 21

Band-to-bound events

 In an indirect gap

material, normally G-R processes occur via more (e.g. 2) steps, relying on recombination centers (traps): Shockley-Read- Hall (SRH) recombination processes

 These are non radiative

transitions

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SLIDE 22

Absorption coefficients

 In parentheses: the

cutoff wavelengths lc

 a-Si is amorphous

silicon

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SLIDE 23

Neutral regions

 At thermal equilibrium  Out of thermal equilibrium, for the quasi-neutrality we have  so that

1/q

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SLIDE 24

GR processes

 Generation rate G: number of carriers generated per unit of

volume and time

 Recombination rate R: number of carriers recombined per unit

  • f volume and time

 Net recombination rate:  Of course, at thermal equilibrium  Average lifetime approximation:

with tn, tp, electron/holes excess carriers average lifetimes (indeed, for minority carriers only it is the average lifetime)

 Of course Un=Up because electrons and holes are generated in

pairs; for the quasi-neutrality n’=p’, then tn=tp

with light: Un~n’/tn-Glight Up~p’/tp-Glight

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SLIDE 25

Continuity equations

 We’ll get the time evolution of n and p basing

  • n the principle of preservation of charge

 Let us consider the electrons which travel

through the volume dV=Adx

 The variation of the number of electrons in dV

will be

attention to signs!  There are 4 contributions:

 electrons entering or exiting at x (a)  electrons entering or exiting at x+dx (b)  electrons generated (c)  electrons recombined (d)

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SLIDE 26

Continuity equations

 With  and with dx -> 0, we get the continuity equation for

electrons

 Similarly, for holes (note: a sign is different)

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SLIDE 27

 In the average lifetime

approximation:

 Remember that for the currents

we had

 We need another equation: the

Poisson equation with r net charge density Semiconductor mathematical model In the 1D case (the 3D case will have gradients, not derivatives)

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SLIDE 28

Semiconductor mathematical model

 Some approximations are needed to proceed analytically

 constant carrier mobility  full ionisation of the dopants

 then we get

with

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SLIDE 29

In low injection regime

 the drift current of minority carriers is neglectable

(because their concentration is << than that of the majority

  • nes, and m are similar)

 so that, for minority carriers only, we can write the diffusion

equations

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SLIDE 30

In low injection and stationary regime

 When

we have

 For minority carriers only and uniform doping

n’=Aex/Ln+Be-x/Ln or p’=Aex/Lp+Be-x/Lp with Ln=(Dntn)1/2 and Lp=(Dptp)1/2 diffusion lengths, and A and B suitable integration constants