- 4. MOS: Device Operation and
4. MOS: Device Operation and Large Signal Model Lecture notes: - - PowerPoint PPT Presentation
4. MOS: Device Operation and Large Signal Model Lecture notes: - - PowerPoint PPT Presentation
4. MOS: Device Operation and Large Signal Model Lecture notes: Sec. 4 Sedra & Smith (6 th Ed): Sec. 5.1-5.3 Sedra & Smith (5 th Ed): Sec. 4.1-4.3 ECE 65, Winter2013, F. Najmabadi Operational Basis of a Field-Effect Transistor (1)
Operational Basis of a Field-Effect Transistor (1)
- F. Najmabadi, ECE65, Winter 2013, Intro to MOS (2/29)
P-type semiconductor Insulator Metal Dopent ions Holes (majority carries)
Consider the hypothetical semiconductor below: (constructed similar to a parallel plate capacitor)
Electrical contact
Operational Basis of a Field-Effect Transistor (2)
- F. Najmabadi, ECE65, Winter 2013, Intro to MOS (3/29)
- If we apply a voltage v1 between electrodes, a
charge Q = C v1 will appear on each capacitor plate.
- The electric field is strongest at the interface with the
insulator and charge likes to accumulate there.
- Holes are pushed away from the insulator
interface forming a “depletion region”.
- Depth of depletion region increases with v1.
Depletion Region (no majority carrier)
- If we increase v1 above a threshold value (Vt),
the electric field is strong enough to “pull” free electrons to the insulator interface. As the holes are repelled in this region, a “channel” is formed which contains electrons in the conduction band (“inversion layer”).
- Inversion layer is a “virtual” n-type material.
Depletion Region (no majority carrier)
Inversion layer (“channel”)
Operational Basis of a Field-Effect Transistor (3)
- F. Najmabadi, ECE65, Winter 2013, Intro to MOS (4/29)
With inversion layer (v1 > Vt):
- A current will flow in the channel
- Current will be proportional to electron
charge in the channel or (v1 − Vt )
- Magnitude of Current i2 is controlled by
voltage v1 (a Transistor!)
- We apply a voltage across the p-type semiconductor:
(Assume current flows only in the n-type material, ignore current flowing in the p-type semiconductor)
No inversion layer (v1 < Vt):
- No current will flow
Operational Basis of a Field-Effect Transistor (4)
- F. Najmabadi, ECE65, Winter 2013, Intro to MOS (5/29)
- We need to eliminate currents flowing in the p-type, i.e.,
current flows only in the “channel” which is a virtual n-type.
- Body-source and body-drain junctions should always be in reverse bias for FET to work!
- Make n-type material terminals (set up diodes between terminals & p-type “body”)
- Heavy doping of the n-type terminals provides a source of free electrons for the channel.
- Make insulator layer as thin as possible to increase the electric field.
Channel width (L) is the smallest feature on the chip surface
- F. Najmabadi, ECE65, Winter 2013, Intro to MOS (6/29)
MOSFET implementation on a chip MOSFET “cartoons” for deriving MOSFET characteristics MOSFET (or MOS): Metal-oxide field-effect transistor NMOS: n-channel enhancement MOS
NMOS i-v Characteristics (1)
- F. Najmabadi, ECE65, Winter 2013, Intro to MOS (7/29)
- To ensure that body-source and body-drain junctions are reversed bias, we
assume that Body and Source are connected to each other and vDS ≥ 0.
- We will re-examine this assumption later
- Without a channel, no current flows (“Cut-off”).
- For vGS > Vtn, a channel is formed. The total
charge in the channel is ) SiO (for F/m 10 45 . 3 9 . 3 insulator
- f
y permitivit : insulator
- f
Thickness : area unit per e Capacitanc : ) (
2 11 −
× = = = = = = ε ε ε ε
- x
- x
- x
- x
- x
- x
- x
tn GS
- x
t t C L W C C
- V
v WL C CV |Q|
Overdrive Voltage: VOV = vGS –Vtn
NMOS i-v Characteristics (2)
- vGS > Vtn A channel is formed
- Apply a small vDS between drain & source.
- F. Najmabadi, ECE65, Winter 2013, Intro to MOS (8/29)
- A current flows due to the “drift” of electrons
in the n-channel:
DS OV
- x
n D DS tn GS
- x
n D
v V L W C i v V v L W C i ) ( µ µ = − = For small vDS, MOS acts as a resistance with its conductivity controlled by VOV (or vGS). V L W C g v g i
OV
- x
n DS DS DS D
with µ = =
NMOS i-v Characteristics (4)
- F. Najmabadi, ECE65, Winter 2013, Intro to MOS (9/29)
- When vDS is increased the channel becomes narrower
near the drain (local depth of the channel depends on the difference between VG and local voltage).
Triode Mode
[ ]
2
5 .
DS DS OV
- x
n D
v v V L W C i − = µ
- When vDS is increased further such that vDS = VOV ,
the channel depth becomes zero at the drain (Channel “pinched off”).
- When vDS is increased further, vDS > VOV , the
location of channel pinch-off remains close to the drain and iD remains approximately constant.
Saturation Mode
2
5 .
OV
- x
n D
V L W C i µ =
NMOS i-v Characteristics (5)
- F. Najmabadi, ECE65, Winter 2013, Intro to MOS (10/29)
For a given vGS (or VOV)
NMOS i-v Characteristics Plot (1)
- F. Najmabadi, ECE65, Winter 2013, Intro to MOS (11/29)
- NMOS i-v characteristics is a surface
* Plot for Vt,n = 1 V and µnCox (W/L) = 2.0 mA/V2
) , (
DS GS D
v v f i =
NMOS i-v Characteristics Plot (2)
- F. Najmabadi, ECE65, Winter 2013, Intro to MOS (12/29)
Looking at surface with vGS axis pointing out of the paper* *Note: surface was truncated (i.e., vGS < 5 V)
NMOS i-v Characteristics Plot (3)
- F. Najmabadi, ECE65, Winter 2013, Intro to MOS (13/29)
Channel-Width Modulation
- F. Najmabadi, ECE65, Winter 2013, Intro to MOS (14/29)
- The expression we derived for saturation region
assumed that the pinch-off point remains at the drain and thus iD remains constant.
- In reality, the pinch-off point moves “slightly”
away from the drain: Channel-width Modulation
( )
A DS OV
- x
n D
V v V L W C i / 1 1 5 .
2
= + = λ λ µ
Body Effect
- Recall that Drain-Body and Source-Body diodes should be reversed biased.
- We assumed that Source is connected to the body (vSB = 0) and vDS = vDB > 0
- In a chip (same body for all NMOS), it is impossible to connect all sources
to the body (all NMOS sources are connected together.
- Thus, the body (for NMOS) is connected to the largest negative voltage
(negative terminal of the power supply).
- Doing so, changes the threshold voltage (called “Body Effect”)
- F. Najmabadi, ECE65, Winter 2013, Intro to MOS (15/29)
( )
| 2 | | 2 |
, F SB F tn tn
V V V φ φ γ − + + =
- In this course we will ignore body effect as well as other second-
- rder effects such as velocity saturation.
P-channel Enhancement MOS (PMOS)
- A PMOS can be constructed analogous to an NMOS: (n-type body), heavily
doped p-type source and drain.
- A virtual “p-type” channel is formed in a P-MOS (holes are carriers in the
channel) by applying a negative vGS.
- i-v characteristic equations of a PMOS is similar to the NMOS with the
exception:
- Voltages are negative (we switch the terminals to have positive voltages: use
vSG instead of vGS ).
- Use mobility of holes, µp , instead of µn in the expression for iD
- F. Najmabadi, ECE65, Winter 2013, Intro to MOS (16/29)
MOS Circuit symbols and conventions
- F. Najmabadi, ECE65, Winter 2013, Intro to MOS (17/29)
PMOS NMOS
MOS i-v Characteristics Equations
NMOS (VOV = vGS – Vtn)
- F. Najmabadi, ECE65, Winter 2013, Intro to MOS (18/29)
[ ]
[ ]
DS OV
- x
n D OV DS OV DS DS OV
- x
n D OV DS OV D OV
v V L W C i V v V v v V L W C i V v V i V λ µ µ + = ≥ ≥ − = ≤ ≥ = ≤ 1 5 . and : Saturation 2 5 . and : Triode : Off
- Cut
2 2
PMOS (VOV = vSG – |Vtp|)*
[ ]
[ ]
SD OV
- x
p D OV SD OV SD SD OV
- x
p D OV SD OV D OV
v V L W C i V v V v v V L W C i V v V i V λ µ µ + = ≥ ≥ − = ≤ ≥ = ≤ 1 5 . and : Saturation 2 5 . and : Triode : Off
- Cut
2 2
*Note: S&S defines |VOV |= vSG – |Vtp| and uses |VOV |in the PMOS formulas.
MOS operation is “Conceptually” similar to a BJT -- iD & vDS are controlled by vGS
- F. Najmabadi, ECE65, Winter 2013, Intro to MOS (19/29)
Controller part: Circuit connected to GS sets vGS (or VOV ) Controlled part: iD & vDS are set by transistor state (&
- utside circuit)
- A similar solution method to BJT:
- Write down GS-KVL and DS-KVL, assume MOS is in a particular state, solve
with the corresponding MOS equation and validate the assumption.
- MOS circuits are simpler to solve because iG = 0 !
- However, we get a quadratic equation to solve if MOS in triode (check MOS in
saturation first!)
- F. Najmabadi, ECE65, Winter 2013, Intro to MOS (20/29)
Example 1: In the circuit below, RD = 1 k, and VDD = 12 V. Compute vo for vi = 0, 6, and 12 V. (µnCox (W/L) = 0.5 mA/V2 , Vt = 2 V, and λ = 0 )
DS D DS D D DD GS i
v i v i R V v v + = + = = = 10 12 : KVL
- DS
: KVL
- GS
3
V 12 10 12 : KVL
- DS
- ff
- Cut
V 2 : KVL
- GS
3
= = → + × = = → → = < = =
DS
- DS
D t GS i
v v v i V v v correct Assumption V 4 V . 8 V . 8 10 4 10 12 : KVL
- DS
mA . 4 4 10 5 . 5 . 5 . V 4 : Saturation Assume
3 3 2 3 2
→ = > = = = → + × × = = × × × = = = ≥
− − OV DS DS
- DS
OV
- x
n D OV DS
V v v v v V L W C i V v µ
Part 1: vi = 0
V 4
- ff
- Cut
in Not V 2 6 : KVL GS = − = → = > = = −
t GS OV t GS i
V v V V v v
Part 2: vi = 6 V
- DS
v v =
- F. Najmabadi, ECE65, Winter 2013, Intro to MOS (21/29)
Example 1: In the circuit below, RD = 1 k, and VDD = 12 V. Compute vo for vi = 0, 6, and 12 V. (µnCox (W/L) = 0.5 mA/V2 , Vt = 2 V, and λ = 0 )
DS D DS D D DD GS i
v i v i R V v v + = + = = = 10 12 : KVL
- DS
: KVL
- GS
3
incorrect Assumption V 10 V 13 V . 13 10 . 25 10 12 : KVL
- DS
mA . 25 10 10 5 . 5 . 5 . V 10 : Saturation Assume
3 3 2 3 2
→ = > − = − = → + × × = = × × × = = = ≥
− − OV DS DS DS OV
- x
n D OV DS
V v v v V L W C i V v µ V 10
- ff
- Cut
in Not V 2 12 : KVL
- GS
= − = → = > = =
t GS OV t GS i
V v V V v v
Part 3: vi = 12 V
- DS
v v =
- F. Najmabadi, ECE65, Winter 2013, Intro to MOS (22/29)
Example 1: In the circuit below, RD = 1 k, and VDD = 12 V. Compute vo for vi = 0, 6, and 12 V. (µnCox (W/L) = 0.5 mA/V2 , Vt = 2 V, and λ = 0 )
DS D DS D D DD GS i
v i v i R V v v + = + = = = 10 12 : KVL
- DS
: KVL
- GS
3
- DS
v v =
[ ]
48 24 ] 20 [ 10 5 . 5 . 10 12 10 12 : KVL
- DS
2 5 . V 10 : Triode Assume
2 2 3
- 3
3 2
= + − + − × × × × = + × = − = = <
DS DS DS DS DS DS D DS DS OV
- x
n D OV DS
v v v v v v i v v V L W C i V v µ V 10 = − =
t GS OV
V v V
Part 3 (cont’d): vi = 12 V
mA 8 . 9 10 12 V 10 V 2 . 2 ) (incorrect 10 V 8 . 21
3
= → + × = = < = = = > = =
D DS D OV DS
- OV
DS
- i
v i V v v V v v
NMOS Transfer Function (1)
- F. Najmabadi, ECE65, Winter 2013, Intro to MOS (23/29)
vi can be applied directly to MOS There is no need for a RG . Circuit Equations:
- vGS = vi
- NMOS iv characteristics: iD = f (vGS , vDS )
- KVL:
vo = vDS = VDD − RD iD
NMOS Transfer Function (2)
- F. Najmabadi, ECE65, Winter 2013, Intro to MOS (24/29)
2) Just to the right of point A:
- VOV = vGS − Vt is small, so iD
is small.
- vDS = VDD − RD iD is close to VDD
- Thus, vDS > VOV and NMOS is in
saturation. 1) For vGS < Vt , NMOS is in cutoff: iD = 0 & vDS = VDD − RD iD = VDD
NMOS Transfer Function (2)
- F. Najmabadi, ECE65, Winter 2013, Intro to MOS (25/29)
3) As vGS increases:
- VOV = vGS − Vt and iD become larger;
- vDS = VDD − RD iD becomes smaller.
- At point B, vDS = VOV
4) To the right of point B, vDS < VOV = vGS − Vt and NMOS enters triode. Point B is called the “Edge of Saturation”
NMOS Transfer Function (2)
- F. Najmabadi, ECE65, Winter 2013, Intro to MOS (26/29)
2) Just to the right of point A:
- VOV = vGS − Vt is small, so iD
is small.
- vDS = VDD − RD iD is close to VDD
- Thus, vDS > VOV and NMOS is in
saturation.
3) As vGS increases:
- VOV = vGS − Vt and iD become larger;
- vDS = VDD − RD iD becomes smaller.
- At point B, vDS = VOV
1) For vGS < Vt , NMOS is in cutoff: iD = 0 & vDS = VDD − RD iD = VDD 4) To the right of point B, vDS < VOV = vGS − Vt and NMOS enters triode. Point B is called the “Edge of Saturation”
Graphical analysis of NMOS Transfer Function (1)
- F. Najmabadi, ECE65, Winter 2013, Intro to MOS (27/29)
- KVL equation is a plane in this space.
- Intersection of KVL plane with the iv
characteristics surface is a line.
- NMOS operating point is on this line
(depending on the value of vGS.)
DS D D DD DS GS D
v i R V v v f i i-v + = = : KVL ) , ( : sitics Characteri NMOS
- If we look from the bottom (iD
axis out of the paper), we can see the transfer function.
Graphical analysis of NMOS Transfer Function (2)
- F. Najmabadi, ECE65, Winter 2013, Intro to MOS (28/29)
- Every point on the load line
corresponds to a specific vGS value.
- As vGS increases, NMOS
moves “up” the load line.
Looking from the bottom Looking parallel to vGS axis
NMOS Functional circuits
- F. Najmabadi, ECE65, Winter 2013, Intro to MOS (29/29)
- Similar to a BJTs in the active mode,
NMOS behaves rather “linearly” in the saturation region (we discuss NMOS amplifiers later)
- Transition from cut-off to triode can
be used to build NMOS switch circuits.
- Voltage at point C (see graph)
depends on NMOS parameters and the circuit (in BJT vo = Vsat)!
- We can also built NMOS logic gate