Failure analysis with X-ray CT: state-of-the-art, limitations and - - PowerPoint PPT Presentation

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Failure analysis with X-ray CT: state-of-the-art, limitations and - - PowerPoint PPT Presentation

Failure analysis with X-ray CT: state-of-the-art, limitations and future developments Philipp Schtz Iwan Jerjen and Peter Jacob Empa Laboratory for Eletronics/Metrology/Reliability Dbendorf, Switzerland philipp.schuetz@empa.ch


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Failure analysis with X-ray CT: state-of-the-art, limitations and future developments

Philipp Schütz Iwan Jerjen and Peter Jacob Empa – Laboratory for Eletronics/Metrology/Reliability Dübendorf, Switzerland philipp.schuetz@empa.ch

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Purpose

  • Review applications of CT for failure

analysis in electronics and systems

  • Discuss limitations of current CT

technology

  • Provide an outlook on future technologies

important for failures analysis

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Outline

  • How to record a Computed Tomography?
  • Which errors on IC and board level can be

identified?

  • How to investigate time-dependent

phenomena and errors on system level?

  • Where are the current limitations?
  • Which future developments might close

the gap?

  • What did we learn?
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How does a CT work?

source

  • bject

detector array manipulator

Generic setup CT-system Measurement principle: Rotate the sample and record for each

  • rientation X-ray projections
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How does a measurement work?

Example: Capacitor Recorded X-ray images (sinogram)

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How does a measurement work?

Recorded X-ray images (sinogram) Recorded X-ray images (sinogram) Different rotation angles

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How to get virtual cross-section?

Central slice for different phases of reconstruction Reconstruction process: Determine material and density distribution from projection information

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Bond Detachment in a chip

3D view of broken bond wires (gap 5 – 10 μm) Tomographic cross section

  • P. Jacob et al., Proc. from the 36th Intern. Symposium for Testing

and Failure Analysis, November 14 – 18, 2010, Addison Texas, p. 444

Mechanically polished cross section

20 μm

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Imaging aluminum bond wires

Goal: Investigate aluminum bond wires

Aluminum bond wires Aluminum bond wires Aluminum bond wires Aluminum bond wires Lead frame (strongly absorbing material) Chip structures visible

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Electrical stress on vias

New VIA VIA after electrical stress Destroyed VIA

Goal: Investigate degradation of VIA under electrical stress.

100 μm

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Failure analysis in capacitors

Goal: Find causes for a shortcut in a capacitor Metallic connection Broken electrolyte layer

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Arcing within a diode

Goal: Investigate roll-over in diode

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128 mm

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Analysis of arc channel

Goal: Analyse form and properties of arc channel

Interior surface

  • f plastic isolator

after voltage arcing

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Mechanical or electronic stress

Question: Did the fuse break or melt?

Electric stress: Mechanical stress may lead to edgy surfaces.

  • Rounded surfaces
  • Droplets of molten

metal

Fuse wire after

  • vercurrent

Droplets of molten metal Rounded surfaces

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Inspection of solder points

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Goal: Identify broken solder points

Steel casing RPM-meter 4 mm wall

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Resonance behaviour

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Goal: Determine resonance behaviour of components in a transformer

Movement of components measured by laser interferometry. Position of opening and mobile parts determined by CT.

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Monitoring processes

Key question Can CT monitor time-dependent processes? Answer Yes, if a) process slower than measurement b) Process can be halted

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Freezing processes

Decharging of a battery New Empty

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Processes involving organic material

Deposition points of chalk in aerator

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Challenges

  • Detect failures of sub-micrometer size in

large samples Example: Microcracks in a chip

  • Examining interfaces of materials with

different attenuation behavior Example: Interface mold gold wire

  • Lowering the speed limit on processes to

be monitored.

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Example for bad interface recognition

Strongly absorbing materials cause artifacts impeding a reliable examination of the interface region

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Differential Phase Contrast - CT

X-ray source Test object Grids

Schematic presentation

  • f X-ray attenuation and

refraction Schematic of Talbot-Lau Interferometer

[1] Jerjen et al., Opt. Expr., 19, 13604 - 13611 (2011). [2] Revol et al., J. Appl. Phys, 110, 044912 (2011)

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Why is DPC an interesting development?

Measured by conventional CT Measured in DPC-CT less artifacts from strongly absorbing material (gold) Materials indiscernible in attenuation imaging may be visible in DPC.

Advantages of DPC

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Water in bricks

Jerjen et al., Fachtagung industrielle CT, Wels, Austria, 2010

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Identifying small pores in a large specimen

Conventional CT DPC Imaging High resolution CT Sub-pixel pores can be identified with DPC imaging.  Microscopic pores can be detected with large field of view

Revol et al, J. Appl. Phys. 110, 044912 (2011)

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CT-equipment at Empa

Microfocus-System Industrial X-ray CT-System Industrial X-ray CT-System Linac X-ray CT-System

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CT-equipment at Empa

Diameter 1 mm 1 cm 10 cm 1 m Nanofocus-CT Industrial CT Linear accelerator Mikrofocus-CT Resolution 0.1 mm 1 mm 0.01 mm 0.001 mm

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Conclusions

  • CT allows a non-destructive failure analysis
  • Broad range of length scales can be investigated

from bond wires to complete systems.

  • Large variety of materials and combinations can

be examined.

  • Challenging are interfaces of disparate materials

and tiny failures with respect to the system size

  • New developments such as differential phase

contrast imaging allow to facilitate some challenges.