Consultative Committee for Length Attilio Sacconi CCL President Main - - PowerPoint PPT Presentation

Consultative Committee for Length

Attilio Sacconi CCL President

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Geodetic‐scale metrology

(100s of metres)

Large volume metrology

(1 metre to 10s of metres)

Coordinate metrology (3D)

(~1 mm to ~2 m)

Realization of the metre definition

(UV to IR wavelengths)

Angle metrology

(sub arc second to n×360°)

Classical optical metrology

(nm flatness, 10 m RoC)

Surface metrology (form, roughness)

(1 nm to ~500 mm)

Micro‐metrology

(~50 µm to 250 mm, 3D)

Dimensional nanometrology

(10 pm to 100 nm, 1D or 2D)

Main metrological areas

pm km m, °

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Keeping the MeP updated and relevant

Support the growing use/introduction of combs Provide validation means for wavelength standards

Dimensional nanometrology

TEM traceability via lattice parameters Methods divergence (linewidth by: AFM, SEM, optical) Hybrid or multi‐sensor metrology (model‐based) Comparisons (nanogratings, step height, nanoparticles)

Coordinate and surface metrology

Non‐contact, e.g. optical scanners, fringe projection X‐ray Computed Tomography Traceability & accuracy of optical techniques

Shop‐floor metrology

In process, in situ, local traceability

Areas of priority

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MacroScale and NanoScale conference series

Stakeholder presentations at these conferences (from e.g. equipment manufacturers, some end users)

National programmes prioritisation

Local needs are best collected here

Inter‐NMI research Programmes, e.g. EMRP/EMPIR

Confirmed needs set the R&D programme agenda Individual projects have stakeholder committees End of project workshop for stakeholders – future scan activity Stakeholders take part (unfunded) as they can see a benefit

Accreditors and regulators

During re‐assessment or direct feedback to NMI/DI

Customers and partners

Users of calibration services provide feedback NMIs as partners in research projects with industry

Stakeholder involvement

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Thermal Expansion

Some email interactions between CCL and CCT on CTE standards – current issues have been solved

Nanometrology

Discussed at BIPM Nanometrology workshop in Feb. 2010: ‐ outcome: no urgent need for joint CC on Nanometrology Discussion paper on traceability via Si‐lattice prepared by WG‐N Using MEMS/nanoscale devices for dimensional metrology

WGFS – CCL & CCTF (frequency vs. wavelength)

Optical frequency list – ongoing developments

Software in metrology

Reference data sets, and algorithms Testing/validating commercial & ‘open’ software

Inter‐disciplinary issues

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Ongoing research into metre realization

Frequency standards and artefacts for nanometrology, distributed standards e.g. GPS, fiber nets etc.

Coordinate and surface metrology – new techniques

Multi‐sensor (tactile, optical, X‐ray CT) coordinate metrology Micro coordinate metrology for micro parts Metrology of functional structured surfaces (areal surface texture) Intrinsically traceable metrology (in situ realisation) High dynamic range (10 µm defect in 100 cm2 @ 20 m min‐1)

Metrology of large engineering structures & geodesy

Long distance interferometry and ranging (fs comb applications) GNSS verification 3D refractive index over larger volumes

Metrology at the nanoscale

Metrology of complex 3D nanostructures and nanoparticles High resolution interferometry at sub‐nanometre accuracy Nanometre accuracy over several 100 mm range (position, form, ...)

Future strategy