CMOS Transistor Theory (and its effects on scaling) Michael Niemier - - PowerPoint PPT Presentation
CMOS Transistor Theory (and its effects on scaling) Michael Niemier - - PowerPoint PPT Presentation
CMOS Transistor Theory (and its effects on scaling) Michael Niemier (Some slides based on lecture notes by David Harris) Nanowire-based Gates Can make very small pn junctions and diode based lgoic If each wire was just 5 nm in diameter, would
Nanowire-based Gates
If each wire was just 5 nm in diameter, would you be excited about this technology? Can make very small pn junctions and diode based lgoic
MOSFET cross section…
n P
With applied Vgs, depletion region forms
n
To recap…
- So far, we have treated transistors as ideal switches
- An ON transistor passes a finite amount of current
– Depends on terminal voltages – Derive current-voltage (I-V) relationships
- Transistor gate, source, drain all have capacitance
– I = C (ΔV/Δt) -> Δt = (C/I) ΔV – Capacitance and current determine speed
MOS Capacitor
- Gate and body form MOS capacitor
- Operating modes
polysilicon gate (a) silicon dioxide insulator p-type body +
- Vg < 0
(b) +
- 0 < Vg < Vt
depletion region (c) +
- Vg > Vt
depletion region inversion region
Terminal Voltages
- Mode of operation depends on Vg, Vd, Vs
– Vgs = Vg – Vs – Vgd = Vg – Vd – Vds = Vd – Vs = Vgs - Vgd
- Source and drain are symmetric diffusion terminals
– By convention, source is terminal at lower voltage – Hence Vds ≥ 0
- nMOS body is grounded. First assume source is 0 too.
- Three regions of operation
– Cutoff – Linear – Saturation
Vg Vs Vd Vgd Vgs Vds +
- +
- +
nMOS Cutoff
- No channel formed, so no current flows
- Ids = 0
+
- Vgs = 0
n+ n+
+
- Vgd
p-type body b g s d
nMOS Linear
- Channel forms
- Current flows from d to s
– e- from s to d
- Ids increases with Vds
- Similar to linear resistor
+
- Vgs > Vt
n+ n+
+
- Vgd = Vgs
Vds = 0 p-type body b g s d
Vgs > Vt Vds = 0, no current
+
- Vgs > Vt
n+ n+
+
- Vgs > Vgd > Vt
0 < Vds < Vgs-Vt p-type body b g s d Ids
Vgs > Vt Vds > 0, but < (Vgs - Vt) (current flows)
nMOS Saturation
- Channel pinches off
- Ids independent of Vds
- We say current saturates
- Similar to current source
+
- Vgs > Vt
n+ n+
+
- Vgd < Vt
Vds > Vgs-Vt p-type body b g s d Ids
Vds > Vgs - Vt Essentially, voltage difference over induced channel fixed at Vgs - V (current flows, but saturates) (or ids no longer a function of Vds)
Outline (part 2)
- Today…
– nMOS & pMOS I-V characteristics
- Why (part 1):
– Quantify - or at least estimate - how we represent & move information
- Why (part 2):
– This way we can estimate what happens when we make device smaller -- and in theory, better.
- Possibly today…
– A very brief discussion of RC delay models
- Why?
– Important because delay = one of the 2 performance metrics we care most about.
- Another, “why”
– Can leverage in 1st HW :-)
- David Frank talk - starts with 1st principles, extrapolates
to practical, chip-level performance
A little bit of foreshadowing
Board digression #0 S2 S2/U2 1 P/Area
Power Density
1 1/U2 1/S2 IsatV P 1/S 1/S 1/S RonCgate
Intrinsic Delay
1 1 1 V/Isat Ron S2 S2/U S Isat/Area
Current Density
1 1/U 1/S CoxWV Isat S S S CoxW/L kn, kp 1/S 1/S 1/S CoxWL Cgate S S S 1/tox Cox 1/S2 1/S2 1/S2 WL Area/device S2 S2/U S V/Wdepl
2
NSUB 1 1/U 1/S Vdd, Vt 1/S 1/S 1/S W, L, tox
Fixed-Voltage Scaling General Scaling Full Scaling Relation Parameter
A little bit of foreshadowing
Board digression #0
A little bit of foreshadowing
Board digression #0
tox
350 nm 250 nm 180 nm 150 nm 120 nm 90 nm 65 nm 350/250=1.4 250/180~1.39 180/150~1.2 150/120~1.25 120/90~1.33 90/65~1.38 8/6~1.333 6/3.8~1.58 3.8/2.6~1.46 2.6/1.5~1.7 1.5/1.2~1.25 1.25/1~1.25
Ok, let’s derive some I-V relationships
I-V Characteristics
- In Linear region, Ids depends on
– How much charge is in the channel? – How fast is the charge moving?
Channel Charge
- MOS structure looks like parallel plate capacitor while
- perating in inversion
– Gate – oxide – channel
- Qchannel =
n+ n+ p-type body + Vgd gate + + source
- Vgs
- drain
Vds channel
- Vg
Vs Vd Cg
n+ n+ p-type body W L tox SiO2 gate oxide (good insulator, ox = 3.9) polysilicon gate
Board digression #1
Channel Charge
- MOS structure looks like parallel plate capacitor while
- perating in inversion
– Gate – oxide – channel
- Qchannel = CV
- C =
n+ n+ p-type body + Vgd gate + + source
- Vgs
- drain
Vds channel
- Vg
Vs Vd Cg
n+ n+ p-type body W L tox SiO2 gate oxide (good insulator, ox = 3.9) polysilicon gate
Channel Charge
- MOS structure looks like parallel plate capacitor while
- perating in inversion
– Gate – oxide – channel
- Qchannel = CV
- C = Cg = εoxWL/tox = CoxWL
- V =
n+ n+ p-type body + Vgd gate + + source
- Vgs
- drain
Vds channel
- Vg
Vs Vd Cg
n+ n+ p-type body W L tox SiO2 gate oxide (good insulator, ox = 3.9) polysilicon gate
Cox = εox / tox
Channel Charge
- MOS structure looks like parallel plate capacitor while
- perating in inversion
– Gate – oxide – channel
- Qchannel = CV
- C = Cg = εoxWL/tox = CoxWL
- V = Vgc – Vt = (Vgs – Vds/2) – Vt
n+ n+ p-type body + Vgd gate + + source
- Vgs
- drain
Vds channel
- Vg
Vs Vd Cg
n+ n+ p-type body W L tox SiO2 gate oxide (good insulator, ox = 3.9) polysilicon gate
Cox = εox / tox
Board digression #2
Carrier velocity
- Charge is carried by e-
- Carrier velocity v proportional to lateral E-field
between source and drain
- v =
Carrier velocity
- Charge is carried by e-
- Carrier velocity v proportional to lateral E-field
between source and drain
- v = µE
µ called mobility
- E =
Board digression #3 How I try not to teach…
Carrier velocity
- Charge is carried by e-
- Carrier velocity v proportional to lateral E-field
between source and drain
- v = µE
µ called mobility
- E = Vds/L
- Time for carrier to cross channel:
– t =
Carrier velocity
- Charge is carried by e-
- Carrier velocity v proportional to lateral E-field
between source and drain
- v = µE
µ called mobility
- E = Vds/L
- Time for carrier to cross channel:
– t = L / v
Board digression #4
nMOS Linear I-V
- Now we know
– How much charge Qchannel is in the channel – How much time t each carrier takes to cross
ds
I =
nMOS Linear I-V
- Now we know
– How much charge Qchannel is in the channel – How much time t each carrier takes to cross
channel ds
Q I t = =
nMOS Linear I-V
- Now we know
– How much charge Qchannel is in the channel – How much time t each carrier takes to cross
channel
- x
2 2
ds ds gs t ds ds gs t ds
Q I t W V C V V V L V V V V µ
- =
- =
- =
- x
= W C L
- µ
Board digression #5
Let’s go back to…
Board digression #6 S2 S2/U2 1 P/Area
Power Density
1 1/U2 1/S2 IsatV P 1/S 1/S 1/S RonCgate
Intrinsic Delay
1 1 1 V/Isat Ron S2 S2/U S Isat/Area
Current Density
1 1/U 1/S CoxWV Isat S S S CoxW/L kn, kp 1/S 1/S 1/S CoxWL Cgate S S S 1/tox Cox 1/S2 1/S2 1/S2 WL Area/device S2 S2/U S V/Wdepl
2
NSUB 1 1/U 1/S Vdd, Vt 1/S 1/S 1/S W, L, tox
Fixed-Voltage Scaling General Scaling Full Scaling Relation Parameter
nMOS Saturation I-V
- If Vgd < Vt, channel pinches off near drain
– When Vds > Vdsat = Vgs – Vt
- Now drain voltage no longer increases current
ds
I =
nMOS Saturation I-V
- If Vgd < Vt, channel pinches off near drain
– When Vds > Vdsat = Vgs – Vt
- Now drain voltage no longer increases current
2
dsat ds gs t dsat
V I V V V
- =
nMOS Saturation I-V
- If Vgd < Vt, channel pinches off near drain
– When Vds > Vdsat = Vgs – Vt
- Now drain voltage no longer increases current
( )
2
2 2
dsat ds gs t dsat gs t
V I V V V V V
- =
- =
- Board digression #7
nMOS I-V Summary
( )
2
cutoff linear saturatio 2 2 n
gs t ds ds gs t ds ds dsat gs t ds dsat
V V V I V V V V V V V V V
- <
- =
- <
- >
- Shockley 1st order transistor models
Again, let’s go back to…
Board digression #8 S2 S2/U2 1 P/Area
Power Density
1 1/U2 1/S2 IsatV P 1/S 1/S 1/S RonCgate
Intrinsic Delay
1 1 1 V/Isat Ron S2 S2/U S Isat/Area
Current Density
1 1/U 1/S CoxWV Isat S S S CoxW/L kn, kp 1/S 1/S 1/S CoxWL Cgate S S S 1/tox Cox 1/S2 1/S2 1/S2 WL Area/device S2 S2/U S V/Wdepl
2
NSUB 1 1/U 1/S Vdd, Vt 1/S 1/S 1/S W, L, tox
Fixed-Voltage Scaling General Scaling Full Scaling Relation Parameter