PVMD
Delft University of Technology
PVMD Delft University of Technology Atomic layer deposition C 1. - - PowerPoint PPT Presentation
Other TF deposition techniques part 3 Arno Smets PVMD Delft University of Technology Atomic layer deposition C 1. C Al C Al Al Al C Al C C C C Al C Al C C Al C C Al Al Al O O O O Substrate Heater Atomic layer
Delft University of Technology
Al Al Al
Substrate Heater
O O O O C
Al
C
Al
C
Al
C
Al
C C C C
Al
C
Al
C
Al
C C C Al
Al Al Al
Substrate Heater
O O O O C C C C
Al
C
Al
N N N N N N N N N N N N N N N N N N N N N N N N N N N N N N N N
C C C Al
N N
Al Al Al
Substrate Heater
O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O
C C C Al
N N O O
Al Al Al
Substrate Heater
O O O O
C C C Al
N N O O
O O O O O O O O O O O O O O O O O O N N N N N N N N N N N N N N N N N N N N N N N N N N N N N N N N
N N
Substrate Solvent Target
Evaporation deposition
Metallic layers
Sputtering deposition
TCO’s Metallic layers Chalcogenides
Close space sublimation
Cadmium telluride
Chemical bath deposition
Cadmium sulphide Plasma enhanced CVD Silicon alloys Molecular beam epitaxy III-V alloys Metal-organic CVD III-V alloys Spin coating Organic PV Atomic layer deposition Ultra-thin, uniform layers