Nicola Pinna Department of Chemistry, CICECO, University of Aveiro, - - PDF document

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Nicola Pinna Department of Chemistry, CICECO, University of Aveiro, - - PDF document

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Nicola Pinna Department of Chemistry, CICECO, University of Aveiro, 3810-193 Aveiro, Portugal. School of Chemical and Biological Engineering, College of Engineering, Seoul National University (SNU), Seoul 151-744, Korea E-mail: pinna@ua.pt -

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Department of Chemistry, CICECO, University of Aveiro, 3810-193 Aveiro, Portugal. School of Chemical and Biological Engineering, College of Engineering, Seoul National University (SNU), Seoul 151-744, Korea E-mail: pinna@ua.pt - pinna@snu.ac.kr Phone: 02-880-1525

Nicola Pinna

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  • Prof. Marie-Paule PILENI

Université Pierre et Marie Curie

Shape Control of CdS Nanoparticles

  • Adv. Mater. 2001, 13, 261 - Langmuir 2001, 17, 7982
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Optical Properties of Silver Nanoparticles

  • Phys. Rev. B. 2002, 66, 045415
  • Prof. Robert Schlögl
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Vanadium Oxide Nanowires

2VO(OiPr)3 + 3H2O V2O5 + 6ROH

  • Adv. Mat. 2003, 15, 329 - Nano Lett. 2003, 3, 1131 - Phys. Rev. B, 2004, 69, 155114

Size Control of V2O5 nanorods and nanowires

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  • Dr. Axel Knop-Gericke, Dr. Michael Hävecker @ FHI

With Michael Hävecker in Bessy February 11, 2005 @ 1:24:58 AM

  • Prof. Markus Antonietti
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Acknowledgements

Tiago Belo Mélanie Ferrié Susana Gomes Catherine Marichy Andrea Pucci Valentina Rebuttini

  • Dr. Marc-Georg Willinger

The group in Aveiro (02-2010)

Former Members:

  • Dr. Guylhaine Clavel - Montpellier University
  • Dr. Weihua Di – Changchun Institute of Optics, Fine Mechanics
  • Dr. Tobias Herntrich –TU Darmstadt
  • Dr. Mohamed Karmaoui – Oslo University
  • Dr. Erwan Rauwel – Oslo University

Kyunghwan Lee Seunghwan Baek The group in Seoul (03-2010)

Inorganic Nanoparticles Hybrid Materials Thin Films by ALD

Metal complexes + organic solvents e.g benzyl alcohol V2O3, Nb2O5, HfO2, ZrO2, Ta2O5, SnO2, In2O3, ZnO, Fe3O4, (Ba,Sr)TiO3, BaZrO3, LiNbO3, etc.

  • Angew. Chem. Int. Ed. 2008, 47, 5292

“Benzyl Alcohol route”: Metal alkoxides + alcohols

  • Yttrium and lanthanide oxide
  • Phosphonates
  • Alkaline earth aluminates
  • rganic inorganic nanostructures

Surface ester elimination reaction: Metal alkoxides + carboxylic acid Nanometric coatings on different substrates: HfO2, TiO2, Ta2O5,V2O4

  • Angew. Chem. Int. Ed. 2008, 47, 3592
  • J. Phys. Chem. C 2008, 112, 12754

Nano Lett. 2008, 8, 4201

  • J. Mater. Chem. 2009, 19, 454
  • Phys. Chem. Chem. Phys. 2009, 11, 3615

Nanoscale, 2010, 2, 786 Patent WO 2008 098963 A2

  • J. Mater. Chem. 2007, 17, 2769

Nanoscale, 2009, 1, 360

  • J. Phys. Chem. C 2010, 114, 6290

Non-aqueous sol-gel routes to oxides

  • M. Niederberger, N. Pinna, Metal Oxide Nanoparticles in Organic Solvents,

Springer, 2009 - ISBN: 978-1-84882-670-0

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  • Angew. Chem. Int. Ed. 2008, 47, 5292

In2O3 SnO2 Ga2O3 Fe3O4 Nb2O5 HfO2

  • Angew. Chem. Int. Ed. 2008, 47, 5292

In2O3 SnO2 WOx Fe3O4 Nb2O5 HfO2

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10 20 30 40 50 60 70

(333) (440) (311)

Intensity (a.u.) 2θ (°)

(111) (400)

  • J. Mater. Chem. 2010, submitted

Lithium Titanium Oxide Lithium Titanium Oxide

50 100 150 200 20 40 60 80 100 120 140 160 180

Discharge Calcined Charge Calcined Discharge Pristine Charge Pristine

Cycle Number Capacity (mAh/g)

10 20 30 40 50 60 70 80 90 100 20 40 60 80 100 120 140 160

1C 1C 30C 20C 10C 8C 4C 2C 1C

Capacity (mAh/g) Cycle number

1C

a) 10 20 30 40 50 60 70 80 20 40 60 80 100 120 140 160 180 b)

30C 20C 10C 8C 4C 2C 1C

Capacity (mAh/g) Cycle number

1C

  • J. Mater. Chem. 2010, submitted
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Hybrid Materials

See detailed example next lecture

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Atomic Layer Deposition

  • ALD is a deposition technique based on self-limiting sequential surface

chemistry.

  • ALD permits to deposit conformal thin films of materials onto substrates
  • f varying compositions.
  • ALD is similar in chemistry to chemical vapor deposition (CVD), except

that the ALD reaction breaks the CVD reaction into two half-reactions, keeping the precursor materials separate during the reaction.

ALD film growth makes atomic scale deposition control possible

Adapted from:

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21.3 2.02 10.9 350 21.7 1.85 10.3 300 14.6 2.88 10.8 250 15.7 2.92 11.7 200 11.5 2.95 8.7 150 12.5 2.97 9.5 100 9.6 3.26 7.6 80 Relative permittivity (εr) EOT (nm) Thickness (nm) Temperature (°C)

5nm Si wafer HfO2

Conformal coating of carbon nanotubes

Nano Lett. 2008, 8, 4201 - Phys. Chem. Chem. Phys. 2009, 11, 3615

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In collaboration with Renaud Vallée and Serge Ravaine from CRPP - Bordeaux

Modification of the optical properties of opals

Coating with TiO2 by ALD with 1 nm step proving the robustness of our ALD process

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Opal Completely Filled Silica Opal