SLIDE 12 08/01/2018 12
Alexander A. Iskandar Electromagnetic Interactions in Matter 24
Anti-symmetric mode Illumination with = 400 nm Ag film thickness 50 nm Propagation length L = 1388.31 nm
500 1000 1500
200 400
0.5 1 x(nm) Profil Medan Listrik Tangensial Untuk Tebal Film = 50 nm, Lambda = 400 nm z(nm) Ex(N/C) SiO2 SiO2 Ag 500 1000 1500
100 200 300 400 x(nm) Profil Medan Listrik Tangensial Untuk Tebal Film = 50 nm, Lambda = 400 nm z(nm) Ag SiO2 SiO2
100 200 300 400
0.2 0.4 0.6 0.8 1 z (nm) Ex(z) Cross-Section Profil Medan E pada x=0, Tebal Film = 50, Lambda = 400 nm
Ex DISTRIBUTION AND FIELD CROSS-SECTION
Alexander A. Iskandar Electromagnetic Interactions in Matter 25
Ex DISTRIBUTION AND FIELD CROSS-SECTION
Symmetric mode Illumination with = 400 nm Ag film thickness 50 nm Propagation length L = 434.81 nm
500 1000 1500
200 400
0.5 1 x(nm) Profil Medan Listrik Tangensial Untuk Tebal Film = 50 nm, Lambda = 400 nm z(nm) Ex(N/C) SiO2 SiO2 Ag 500 1000 1500
100 200 300 400 x(nm) Profil Medan Listrik Tangensial Untuk Tebal Film = 50 nm, Lambda = 400 nm z(nm) Ag SiO2 SiO2
100 200 300 400 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 0.9 1 z (nm) Ex(z) Cross-Section Profil Medan E pada x=0, Tebal Film = 50, Lambda = 400 nm