I SPD 2 0 0 7 Shankar Krishnamoorthy Chief Technical Officer - - PowerPoint PPT Presentation

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I SPD 2 0 0 7 Shankar Krishnamoorthy Chief Technical Officer - - PowerPoint PPT Presentation

Variation and Litho-driven Physical Design I SPD 2 0 0 7 Shankar Krishnamoorthy Chief Technical Officer Agenda Physical Design at 65nm/45nm Variation challenges and solutions Routing challenges and solutions Summary 2


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Variation and Litho-driven Physical Design

I SPD 2 0 0 7

Shankar Krishnamoorthy Chief Technical Officer

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Agenda

  • Physical Design at 65nm/45nm
  • Variation challenges and solutions
  • Routing challenges and solutions
  • Summary
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  • WYSNWYG – 193nm light used to create

65nm/45nm patterns

  • Due to light dosage, light focus, mask

alignment

  • OPC simulation – exploding data volume

Three Major PD Challenges

  • Lithography Variations
  • Complexity in Routing

Rules

  • Need for DFM-driven

routing

  • Process & Operational

Variations

  • Variation-driven STA
  • Need for Variation-driven

implementation

  • Large Design Sizes
  • Scalability of Physical

Design Algorithms

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Agenda

  • Physical Design at 65nm/45nm
  • Variation challenges and solutions
  • Routing challenges and solutions
  • Summary
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Variability Leads to Design Margins

DSP, 65nm, 9M Gates, 12 modes/corners

Device (Vt) Variation Device (Vt) Variation

Voltage

(1.08, 1.9)

Voltage

(1.08, 1.9)

Temperature

(30, 125)

Temperature

(30, 125)

RC variation

(maxC, maxVia, minC,,minVIA)

RC variation

(maxC, maxVia, minC,,minVIA)

Modes

(func, pbist, capture_pll, shift)

Modes

(func, pbist, capture_pll, shift)

MARGIN

300ps uncertainty, 12% OCV, 15% RC derate

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Design Flow with Margins

  • Sample Margins
  • 20% faster clock
  • 250-300ps uncertainty
  • 10% RC derating
  • 10% OCV
  • 25% max slew derate
  • Resulting Chips
  • 20-100% more time to

closure

  • 5-15% bigger die
  • 5-15% more power

MARGIN

Floorplanning Synthesis Placement CTS Routing Post-Route Signoff LIB LE F DRC

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Design Flow Without Margins

  • Instead of margins,

define mode/corner variation scenarios upfront

  • Variation Timer back-

bone ensures closure

  • ver each step of flow
  • Results
  • Up to 2X faster TAT
  • Up to 15% smaller die
  • Up to 15% lesser power

Floorplanning Synthesis Placement CTS Routing Post-Route Signoff LIB LEF DRC

M1C1 M1C2 M2C1 M3C3 MxCx

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Case Study : Server Chip

  • Design Details:
  • 12M gates flat (3M instances)
  • 4 Corners + 6 Modes (24 Combinations)
  • Target:
  • Fix Setup, Hold for All 24 modes/corners
  • Leakage opt on selected combinations
  • 14hrs CPU

XAUI (slow_ocv, Cworst) setup, hold XAUI (fast_ocv RCbest) hold, leakage XAUI (fast_lv, Cbest) hold, leakage XAUI (fast_ht, RCworst) hold, leakage RGMII (slow_ocv, Cworst) setup, hold RGMII (fast_ocv, RCbest) hold, leakage RGMII (fast_lv, Cbest) hold, leakage RGMII (fast_ht, RCworst) hold, leakage LB (slow_ocv, Cworst) setup, hold LB (fast_ocv, RCbest) hold, leakage LB (fast_lv, Cbest) hold, leakage LB (fast_ht, RCworst) hold, leakage BIST (slow_ocv, Cworst) setup, hold BIST (fast_ocv RCbest) hold, leakage BIST (fast_lv, Cbest) hold, leakage BIST (fast_ht, RCworst) hold, leakage SHFT (slow_ocv, Cworst) setup, hold SHFT (fast_ocv, RCbest) hold, leakage SHFT (fast_lv, Cbest) hold, leakage SHFT (fast_ht, RCworst) hold, leakage CAP (slow_ocv, Cworst) setup, hold CAP (fast_ocv, RCbest) hold, leakage CAP (fast_lv, Cbest) hold, leakage CAP (fast_ht, RCworst) hold, leakage

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Key Technologies Needed for Variation aware tools

  • Concurrent Multi-mode analysis (operational

variability)

  • Concurrent Multi-corner analysis (global variability)
  • Concurrent local variability analysis (OCV, NBTI,

Statistical Models)

  • Concurrent Multi-mode Multi-corner Implementation
  • Placement, CTS, Optimization, Routing, DFM Steps
  • Scalability
  • Sub-linear increase in runtime and memory with number of

scenarios

  • Hierarchical Methodology
  • Budgeting, chip-level timing closure are affected by modes

and corners

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Agenda

  • Physical Design at 65nm/45nm
  • Variation challenges and solutions
  • Routing challenges and solutions
  • Summary
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Routing / OPC interaction

Synthesis Placement Routing

LEF .lib

OPC

GDSII

At 65/45nm

  • OPC analyze/fix iterations take longer

since routing is oblivious to OPC

  • Complex DRC rules are developed to

prevent bad patterns resulting in longer runtimes / time to closure

DRC

Complex DRCs

Mask OPC Routing

DRC++

At 130/90nm

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Impact on Routing Rules

  • Complexity of Routing DRC Rules Increasing
  • Number of rules increasing from node to node
  • More rules are becoming dependent on ranges of variables

like width, halo, parallel length

  • Increasing number of objects involved in a rule
  • Stringent requirements with each node
  • Recommended or “Soft” Routing Rules increasing in

number from node to node, usually for DFM

  • Routing has to consider Timing and SI constraints
  • Flexible routing flow and algorithms needed
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Migration to shape-based checks

S1 S2 S1

Edge-to-Edge spacing check Composite shape causes different spacing requirements Adding a via causes more complicated DRCs to be triggered

Step-Rules

S2 S3 S1

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Spacing Rules

  • Between different-nets and same-net objects.
  • Objects can be port-shapes, wire segments, via metal, pre-routes

S W L

S3 > W3 > L3 S2 > W2 > L2 S1 > W1 > L1

Spacing Parallel Length Overlap Metal Width Range

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Cut Number Rule

  • Number of vias and spacing between vias

when used on “fat” metal

OPTIONAL where the second via is placed

W > 1.7u

W>1.7u W>2.4u

Number of vias and Spacing between vias is a parameter

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Complex Via Rules

  • Use double via when turn is less than 5u away from a wide metal
  • Parameters are length, width and distance from neighbor. Value is

number of vias needed W > 3u Distance < 5u L>10u

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INFLUENCE Rule

All metal connected to fat-metal, inherits the spacing rule of the fat-metal. Also depends upon “distance of influence”. Beyond this distance use standard spacing rules S W > 1.7u S

Distance of influence

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“Dense” End-of-line Rule for OPC Prevention

S1 L1

  • Litho error prevention rule appears in

65nm/45nm nodes

L2 W1

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Growing DRC Complexity

5 5 1 n.a Min-step (OPC) All layers M1/M2 n.a n.a

Dense End-

  • f-Line (OPC)

5-6 4-5 1-2 n.a

Cut Number

5pitch 3pitch 2pitch 1pitch

Min-Area

7 3-5 2-3 1-2

Width-based Spacing

45nm 65nm 90nm 130nm

DRC Rule

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DFM Requirements

  • Recommended Rules
  • Via Minimization
  • Double-via replacement levels
  • Metal Density Rules
  • Increase via enclosure where possible
  • Litho Hot-spot avoidance, detection and

repair

  • Critical Area Analysis (CAA) and CAA-driven

wire-spreading for random defect prevention

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DFM Metrics

With DoubleVia and WireSpreading With WireSpreading DFM Metrics

  • Via Count
  • Double Via
  • Litho HotSpot Counts
  • CAA score
  • Metal Density violations
  • Larger via enclosures
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Introduction to Routing Flow

  • 4 major steps
  • Global Routing
  • Computes total resource availability over the chip
  • Assigns initial topologies to nets
  • Track Routing
  • Takes Global Routes as “guides”
  • Assigns detailed wires on different layers to nets
  • Detail Routing
  • Starts with track routing and cleans up DRCs using local

routing within small windows

  • Uses simplified model of complex DRCs for speed
  • Post-Processing
  • Cleans up remaining DRC errors with local re-routing in

conjunction with DRC checker

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Routing Flow : Global Routing

GCELL edges

Pins to be connected Groute wire

  • n M3
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Routing Flow : Track Routing

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Routing Flow : Track Routing

Target M1 pin is blocked by another net on M2 short … Via is not clean

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Routing Flow : Detail Routing

Short resolved Via properly connected

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Routing Flows : Traditional Flow

Global Routing Track Routing Detailed Routing Post-Processing

  • Simplified DRC models used for all stages

except Post-processing

  • Pros
  • Complex DRCs/DFM fixed only when all

details are complete

  • Global/Track/Detailed steps are very fast

due to simpler DRC model

  • Cons
  • Final clean-up is unpredictable in runtime
  • Complex DRCs in congested areas may

lead to extensive re-routing without success at the very end

  • DFM metrics may be poor for congested

designs where routing density is high

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Routing Flows : Proposed Flow

Global Routing Track Routing Detailed Routing Post-Processing

  • Full DRC/DFM models used for all stages
  • Pros
  • Complex DRCs/DFM is modeled throughout the

flow rendering final step less critical

  • Shorter total routing runtime especially for

congested designs

  • Complex DRCs in congested areas are handled

much better since it is considered throughout the flow

  • DFM metrics are considered throughout the flow
  • Cons
  • Routing algorithms becomes more complex

because of introduction of complex DRCs in maze search

  • Need strategies to gracefully scale-back on

Recommended DFM Rules in case of congested designs

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Impact of complex DRCs on routing

  • Testcase : High performance core, 65nm, 260K nets

2.42M 2.42M 2.41M 2.38M 2.35M 2.35M Via 10.48 10.48 10.51 10.49 10.45 10.45 WL 84 82 81 76 66 66 Runtime +End Of Line + Cut Space + Fat Space +Cut Number +MinStep Simple Metric 4K 5.7K 41K 73K 73K Incoming DRCs 84 101 105 172 171 171 Total time 19 24 96 105 105 Final Cleanup Traditional Proposed

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Litho Hot-spot Fixing

PINCHING

  • 1. Litho simulation

identifies Error

  • 2. Litho errors

annotated into router

  • 3. Router corrects

error by local R&R

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Summary

  • Timing Variation, Litho Variation and Capacity have

to be addressed at 65nm/45nm

  • Modeling timing variation with concurrent multi-

mode/multi-corner analysis reduces the need for design margins in physical design

  • At 65nm/45nm, there is a significant increase in

routing complexity due to complex DRCs and DFM rules

  • A flexible routing flow and new routing algorithms

are needed to produce good results