Gencoa 3G Circular Magnetron Presenting Gencoas 3 rd generation - - PowerPoint PPT Presentation

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Gencoa 3G Circular Magnetron Presenting Gencoas 3 rd generation - - PowerPoint PPT Presentation

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Gencoa 3G Circular Magnetron Presenting Gencoas 3 rd generation range of circular magnetrons November 2017 www.gencoa.com 1 Contents Product Overview Introduction 3G Design Features 3G Mechanical Options Low pressure

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SLIDE 1

Gencoa 3G Circular Magnetron

Presenting Gencoa’s 3rd generation range of circular magnetrons

November 2017 www.gencoa.com 1

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SLIDE 2

November 2017 2 www.gencoa.com

  • Product Overview
  • Introduction
  • 3G Design Features
  • 3G Mechanical Options
  • Low pressure operation
  • High Yield Magnetics from 4” target
  • High Strength Magnetics
  • Performance curves
  • Deposition Rate
  • Conclusion

Copper target, DC 300W, 8.5 E-3 Torr Copper target, RF 300W, 8.5 E-3 Torr

Contents

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SLIDE 3

November 2017 www.gencoa.com 3

3G

Gencoa circular product range

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3G magnetron features

  • Launched in 2017
  • Works in wide range of pressure – into 10-6 Torr range
  • Compact Size
  • Unique non-bellow tilted magnetron head
  • High Yield magnetics for the 4” target size
  • Magnetic material sputtering
  • Gas Injection as standard
  • PEEK insulation to reduce outgassing
  • Accommodates different target thickness
  • DC, DC pulse, RF and HIPIMS ready

November 2017 www.gencoa.com 4 Copper target, DC 300W, 8.5 E-3 Torr Copper target, RF 300W, 8.5 E-3 Torr

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SLIDE 5

November 2017 6 www.gencoa.com

Available in a choice of five assembly

  • ptions:
  • 3G - Full option with 45⁰ tilt, RF /HIPIMS

ready and gas injection

  • 3G(A) - The cathodes are supplied with a

straight shaft, RF/HIPIMS ready and gas injection

  • 3G(B) - The basic design with only gas

injection as option

  • 3G(C) - This model comes with tilt and gas

injection but no power connection box.

  • 3G(E) – Externally-mounted magnetron

with gas injection and RF/HIPIMS ready

3G 3G(E) 3G(C) 3G(B)

3G cath thode variations

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SLIDE 6

November 2017 7 www.gencoa.com

  • Small head size – approx. 1” larger than target size
  • Most compact tilt height in industry – tilt pivot point is 1” from cathode

rear allowing higher tilt angles

  • 3G dimensions allow for smaller chambers to be used whilst having the

same tilt and head positions

C A B

24.4

Target A B C 2” 92.3 83.8 76.2 3” 97.7 85.7 101.6 4” 114 101.5 128.1

3G small head size and ti tilt means smaller chambers

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SLIDE 7
  • ±45° tilt without bellows
  • Angle can be viewed and adjusted from the front of the

cathode

  • The 2 position clamp pressure is released by means of a

supplied tool or by hand, the head is rotated to the desired angle, then the clamp is re-fixed to the first ‘notch’ tight position

  • To measure the angle, there is a milled slot on the

clamp that is aligned with the protractor angle allowing the tilt angle to be fixed accurately to 1°.

  • The protractor is removable.

November 2017 www.gencoa.com 8

Shaft Angle Pointer Tilt Clamp Angle Call out

45° tilted magnetron

In Innovative head angle adjustment

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SLIDE 8

November 2017 www.gencoa.com 9

  • Target clamp adjust to the target thickness. anti-

sticking materials used for the threaded fixing

  • Can use a thermal conduction gasket between target

and cooled diaphragm

  • High water flow (2 l/min) and diaphragm cooling for

high power capacity

  • Directly cooled targets available – factory configured

Threaded Target Clamp PEEK Insulator (reduces Outgassing) 4” HY target with graphite gasket and diaphragm Eroded Target Thermal Conduction Sheet (Graphite) Diaphragm

Self-adjusting target cla lamps

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SLIDE 9

3G mechanical option matrix

Model Gas injection Tilt RF/ HIPIMS Shutter Chimney Wall mount feedthrough Water-cooled anode Hidden anode 3G

  • 3G(A)
  • 3G(B)
  • 3G(C)
  • 3G(E)
  • November 2017

www.gencoa.com 10

  • Standard Feature
  • Optional
  • Not Applicable
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SLIDE 10

November 2017 11 www.gencoa.com

Various mechanical options available

  • Design allows to fit manual and pneumatic shutter
  • Anode cooling to provide extra source cooling for

HOT chamber environments

  • Hidden anode
  • Sputter chimney
  • Quick coupling feedthrough
  • ISO or CF flange mounting option

Shutter (Optional) Power Connector (N type /7-16”/HN) Anode Cooling (Optional) Wall Mount Feedthrough (Optional) Shutter Adjustment Manual/Pneumatic (Shown) (Optional) Gas Injection

3G mechanical options

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SLIDE 11

November 2017 www.gencoa.com 12

Shutter option External mount Anode cooling 3G in 45⁰ tilt position 3G with no shaft (customer weld) Sputter chimney

3G mechanical options

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SLIDE 12

November 2017 www.gencoa.com 13

  • High yield (HY) type array available from 4”
  • >40% target utilization
  • Gencoa solution for precious material sputtering

Target profile ,mm

  • 60
  • 40
  • 20

20 40 60

4” high yield 10mm thick target erosion

Radial Position, mm

9 6 3

Target profile ,mm

3G hig igh yie ield ty type magnetics for hig igh target use

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SLIDE 13

Magnetic material sputtering (hig igh strength array) )

November 2017 www.gencoa.com 14

  • The cathodes allow magnetic material sputtering as

standard with diaphragm cooled target.

  • Thicker target can be sputtered using directly cooled target.

(Pre- configured at factory)

  • Anode height adjustable to accommodate different target

thickness.

Size Magnetic Strength on the target surface (G) Fe Thickness (mm) Ni Thickness (mm) 50mm (2”) 780 1 3 75mm (3”) 840 1.5 4 100mm (4”) 620 0.5 2

Anode height line

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SLIDE 14

November 2017 15 www.gencoa.com

  • Extensive testing performed on 3G prototypes for product

reliability and plasma stability

  • Achieved 2 l/min water flow through the cathode at 1.5 bar

pressure difference

  • Operates across a wide range of pressures
  • Coating uniformity & deposition rate measured for

different target diameters

  • Performance curves obtained at various pressure levels for

various power modes

Copper target, DC 300W, 8.5 E-3 Torr Copper target, RF 300W, 8.5 E-3 Torr

3G cath thode testing

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SLIDE 15

80 120 160 200 240 1.00E-05 1.00E-04 1.00E-03 1.00E-02 Target voltage, V Pressure, Torr

2” Cu Target

RF 300W RF 180W 300 350 400 450 1.00E-05 1.00E-04 1.00E-03 1.00E-02 Target voltage, V Pressure, Torr

2” Cu target

DC 300W DC 180W

November 2017 www.gencoa.com 16

10 10-6 to 10-2 operating pressure range (2” target diameter)

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SLIDE 16

November 2017 www.gencoa.com 17

300 350 400 450 500 1.00E-05 1.00E-04 1.00E-03 1.00E-02 Target voltage, V Pressure, Torr

3” Al target

DC 600W DC 300W 300 350 400 450 500 1.00E-05 1.00E-04 1.00E-03 1.00E-02 Target voltage, V Pressure, Torr

3” Cu target

DC 600W DC 300W

10 10-6 to 10-2 operating pressure range (3” target diameter)

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SLIDE 17

10 10-6 to 10-2 Operating Pressure Range (4” target dia iameter)

November 2017 www.gencoa.com 18

300 350 400 450 500 1.00E-05 1.00E-04 1.00E-03 1.00E-02 Target voltage, V Pressure, Torr

4” Cu target

DC 600W DC 300W 300 350 400 450 500 1.00E-05 1.00E-04 1.00E-03 1.00E-02 Target voltage, V Pressure, Torr

4” high strength Cu target

DC 600W DC 300W

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SLIDE 18

300 350 400 450 500 550 600 650 1.00E-05 1.00E-04 1.00E-03 1.00E-02 Target voltage, V Pressure, Torr

4” high yield Cu Target

DC 600W DC 300W

Precious material sputtering (h (hig igh yie ield array) )

November 2017 www.gencoa.com 19

1 2 3 4 5 200 300 400 500 600 700 400 800 1200 1600 Current, A Voltage, V Power, W

5.0E-4 Torr, DC power Al target

Voltage Current

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Coating unif iformity (2” target dia iameter)

November 2017 www.gencoa.com 20

0.2 0.3 0.4 0.5

  • 50
  • 30
  • 10

10 30 50 OD Position, mm

DC Power 150mm T/S, Copper target

Range (mm) Uniformity 50 2.0% 30 0.9% 20 0.4%

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Coating unif iformity (2” target dia iameter)

November 2017 www.gencoa.com 21

0.2 0.4 0.6 0.8 1 1.2

  • 50
  • 40
  • 30
  • 20
  • 10

10 20 30 40 50 OD Position (mm)

Normalised Uniformity over 100mm

50mm T/S 150mm T/S 100mm T/S

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DC/RF unif iformity comparison (3” target diameter)

November 2017 www.gencoa.com 22

Range, mm DC Uniformity 50 ±4.4% 60 ±6.5% 70 ±8.4% Range, mm RF Uniformity 50 ±3.5% 60 ±5.7% 70 ±7.9%

Al target, DC 300W, 2.5 E-3 Torr Al target, RF 300W, 2.5 E-3 Torr

0.2 0.4 0.6 0.8 1 1.2

  • 30
  • 20
  • 10

10 20 30

3" Al target @100mm T-S

RF DC

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SLIDE 22

DC/RF unif iformity comparison (4 (4” target dia iameter)

November 2017 www.gencoa.com 23

Range, mm DC Uniformity 50 ±5.1% 60 ±7.2% 70 ±9.1% Range, mm RF Uniformity 50 ±5.2% 60 ±6.9% 70 ±9.1%

Cu target, DC 300W, 1.4 e-2Torr Cu target, RF 300W, 1.4 e-2Torr

0.2 0.4 0.6 0.8 1 1.2

  • 40
  • 20

20 40

4" Cu Target @150mm T-S

DC RF

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Power Vs Voltage Vs Current (2” Cu target, DC power)

November 2017 www.gencoa.com 24

0.2 0.4 0.6 0.8 1

250 300 350 400 450

60 120 180 240 300 Current, A Voltage, V Power, W 5E-4 Torr 0.2 0.4 0.6 0.8 1 250 300 350 400 450 60 120 180 240 300 Current, A Voltage, V Power, W 2.5E-3 Torr 0.2 0.4 0.6 0.8 1

250 300 350 400 450 60 120 180 240 300

Current, A Voltage, V Power, W 1.4E-2 Torr

Voltage Current Voltage Current Voltage Current

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Power Vs Voltage (2” target, RF Power)

November 2017 www.gencoa.com 25

50 90 130 170 50 100 150 200 250 300

DC voltage, V Forward power, W

Cu target

5.0E-4 Torr 2.5E-3 Torr 1.4E-2 Torr

250 300 350 400 450 500 550 600 50 100 150 200

DC voltage, V Forward power, W RF power, 2.5E-3 Torr, fused silica target

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Power Vs Voltage Vs Current (3” Al l target, DC power)

November 2017 www.gencoa.com 26

0.4 0.8 1.2 1.6 2 220 270 320 370 420 470 120 240 360 480 600

Current, A Voltage, V Power, W

5.0E-4 T orr,

0.4 0.8 1.2 1.6 2 220 270 320 370 420 470 120 240 360 480 600

Current, A Voltage, V Power, W

2.5E-3 T orr, Voltage Current Voltage Current

0.4 0.8 1.2 1.6 2 220 270 320 370 420 470 120 240 360 480 600

Current, A Voltage, V Power, W 8.5E-3 Torr Voltage Current

0.4 0.8 1.2 1.6 2 220 270 320 370 420 470 120 240 360 480 600

Current, A Voltage, V

Power, W 1.4E-2 Torr

Voltage Current

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Power Vs Voltage (3” target, RF power)

November 2017 www.gencoa.com 27

120 160 200 240 280 50 100 150 200 250 300

DC voltage, V

Forward power, W

RF power, Al target

5.0E-4 Torr 2.5E-3 Torr 8.5E-3 Torr 1.4E-2 Torr

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Power Vs Voltage Vs Current (4” Cu target, DC power)

November 2017 www.gencoa.com 28

0.5 1 1.5 2 2.5 3 250 300 350 400 450 500 550 200 400 600 800 1000 1200 Current, A Voltage, V Power, W 1.4E-2 Torr

Voltage Current

0.5 1 1.5 2 2.5 3 250 300 350 400 450 500 550 200 400 600 800 1000 1200 Current, A Voltage, V Power, W 8.5E-3 Torr

Voltage Current

0.5 1 1.5 2 2.5 3 250 300 350 400 450 500 550 200 400 600 800 1000 1200 Current, A Voltage, V Power, W 2.5E-3 Torr

Voltage Current

0.5 1 1.5 2 2.5 3 250 300 350 400 450 500 550 200 400 600 800 1000 1200 Current, A Voltage, V Power, W 5.0E-4 Torr

Voltage Current

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Power Vs Voltage (4” target, RF power)

November 2017 www.gencoa.com 29

50 100 150 200 250 50 100 150 200 250 300 DC voltage, V Forward power, W

RF power, Cu target

5.0E-4 Torr 2.5E-3 Torr 8.5E-3 Torr 1.4E-2 Torr

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3G Cu example deposition rates (1 (100mm T-S) S)

November 2017 www.gencoa.com 30 Target Size Target Thickness (mm) Power Mode Power (W) Deposition Rate (nm/min)

2” 3 DC 300 134 2” 3 RF 300 94.5 3” 6 DC 300 133 3” 6 RF 300 80 4” 6 DC 300 116 4” 6 RF 300 70

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Gencoa 3G – No.1 choice for R&D Thin Fil ilm Technology

November 2017 www.gencoa.com 31

Gencoa 3G Advantages

Competition

Lower Pressure Operation. 3G magnetrons can work down to e-6 Torr range Most small size magnetrons work e-4 Torr range only Small head size allows for smaller chambers or more sources within the same space Larger heads require larger chambers Magnetron head can be tilted 45 ⁰ with ease. No welded bellows and compact tilt height allows sources closer together in a cluster. The angle can be fixed accurately to 1 °. Magnetrons are tilted using welded bellows which requires more chamber space and less accurate. High Yield magnetics for 4” offering >40 % target use and recommended for precious metal sputtering Not Available Gas injection standard for all magnetrons Extra cost DC, RF & HIPIMS compatible as standard Ordered as an option Gencoa developed uniformity software to generate a coating uniformity direct from the magnetic field model and taking into account all system parameters Not available

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3G Cathode Summary ry

  • Compact Size
  • Wide range of working pressure range
  • ± 45º tilt angle adjustment (1° accuracy)
  • Standard target sizes
  • High yield (HY) magnetics available for 4" and 5" target diameters
  • Internal gas injection as standard
  • DC,RF and HIPIMS ready
  • Easy target change and choice of target thickness (1-6mm)
  • High strength magnetics for sputtering of magnetic material
  • Indirect or direct target cooling (pre-configured)

November 2017 www.gencoa.com 32

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SLIDE 32

Gencoa clu luster solution for R&D Market

November 2017 www.gencoa.com 33

IMC75

  • A powerful new tool for

thin film research.

  • Fits into the space of a

typical magnetron and has head tilt adjustment.

  • Multiple uses - ion

assistance, patterning, pre-cleaning, coating stripping, PECVD

  • DC power technology

for low cost of

  • wnership.
  • Dedicated Power supply

with Gas regulation via automatic feedback control FFE75

  • Dynamic plasma

movement for full face erosion

  • Clean target for

defect free layers

  • High target use for

precious metals

  • Better Uniformity
  • Ideal for high cost

and compound targets.

  • RF, HIPIMS and

DC Option

  • Tilt, shutter, Gas

injection available 3G75

  • State of the

art design

  • Wide rang of
  • perating

pressure

  • Compact in

size

  • Various

mechanical

  • ptions

possible.

  • RF, HIPIMS

and DC Option

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Further in information

For further information on the Gencoa range of 3G circular magnetrons, visit www.gencoa.com/3g-circular or email sales@gencoa.com to contact member of the sales team.

November 2017 www.gencoa.com 34