Gencoa 3G Circular Magnetron Presenting Gencoa’s 3 rd generation range of circular magnetrons November 2017 www.gencoa.com 1
Contents • Product Overview • Introduction • 3G Design Features • 3G Mechanical Options • Low pressure operation Copper target, DC • High Yield Magnetics from 4” target 300W, 8.5 E-3 Torr • High Strength Magnetics • Performance curves • Deposition Rate • Conclusion Copper target, RF 300W, 8.5 E-3 Torr November 2017 www.gencoa.com 2
Gencoa circular product range 3G November 2017 www.gencoa.com 3
3G magnetron features • Launched in 2017 • Works in wide range of pressure – into 10 -6 Torr range • Compact Size • Unique non-bellow tilted magnetron head • High Yield magnetics for the 4” target size Copper target, DC • Magnetic material sputtering 300W, 8.5 E-3 Torr • Gas Injection as standard • PEEK insulation to reduce outgassing • Accommodates different target thickness • DC, DC pulse, RF and HIPIMS ready Copper target, RF 300W, 8.5 E-3 Torr November 2017 www.gencoa.com 4
3G cath thode variations Available in a choice of five assembly options: • 3G - Full option with 45 ⁰ tilt, RF /HIPIMS ready and gas injection • 3G(A) - The cathodes are supplied with a 3G(C) straight shaft, RF/HIPIMS ready and gas 3G(B) injection • 3G(B) - The basic design with only gas injection as option • 3G(C) - This model comes with tilt and gas injection but no power connection box. • 3G(E) – Externally-mounted magnetron with gas injection and RF/HIPIMS ready 3G 3G(E) November 2017 www.gencoa.com 6
3G small head size and ti tilt means smaller chambers • Small head size – approx. 1” larger than target size • Most compact tilt height in industry – tilt pivot point is 1” from cathode rear allowing higher tilt angles • 3G dimensions allow for smaller chambers to be used whilst having the same tilt and head positions A B 24.4 C Target A B C 2” 92.3 83.8 76.2 3” 97.7 85.7 101.6 4” 114 101.5 128.1 November 2017 www.gencoa.com 7
Innovative head angle In adjustment Shaft • ±45° tilt without bellows • Angle can be viewed and adjusted from the front of the Angle cathode Pointer • The 2 position clamp pressure is released by means of a supplied tool or by hand, the head is rotated to the Tilt desired angle, then the clamp is re-fixed to the first Clamp ‘notch’ tight position • To measure the angle, there is a milled slot on the Angle clamp that is aligned with the protractor angle allowing Call out the tilt angle to be fixed accurately to 1 ° . • The protractor is removable. 45 ° tilted magnetron November 2017 www.gencoa.com 8
Self-adjusting target cla lamps • Target clamp adjust to the target thickness. anti- sticking materials used for the threaded fixing Can use a thermal conduction gasket between target • and cooled diaphragm • High water flow (2 l/min) and diaphragm cooling for high power capacity • Directly cooled targets available – factory configured Threaded PEEK Insulator Target Clamp (reduces Outgassing) Eroded Target Thermal Conduction Sheet (Graphite) Diaphragm 4” HY target with graphite gasket and diaphragm November 2017 www.gencoa.com 9
3G mechanical option matrix Gas RF/ Wall mount Water-cooled Hidden Model Tilt Shutter Chimney injection HIPIMS feedthrough anode anode • • • • • • • • 3G • • • • • • • • 3G(A) • • • • • • • • 3G(B) • • • • • • • • 3G(C) • • • • • • • • 3G(E) • Standard Feature • Optional • Not Applicable November 2017 www.gencoa.com 10
3G mechanical options Various mechanical options available • Design allows to fit manual and pneumatic shutter • Anode cooling to provide extra source cooling for HOT chamber environments • Hidden anode • Sputter chimney • Quick coupling feedthrough • ISO or CF flange mounting option Shutter Adjustment Manual/Pneumatic (Shown) Anode Cooling Wall Mount (Optional) (Optional) Feedthrough Shutter Gas (Optional) (Optional) Injection Power Connector (N type /7- 16”/HN) November 2017 www.gencoa.com 11
3G mechanical options Shutter option External mount Anode cooling 3G with no shaft (customer weld) 3G in 45 ⁰ t ilt position Sputter chimney November 2017 www.gencoa.com 12
3G hig igh yie ield ty type magnetics for hig igh target use • High yield (HY) type array available from 4” • >40% target utilization • Gencoa solution for precious material sputtering 4” high yield 10mm thick target erosion Target profile ,mm Target profile ,mm 9 6 3 -60 -40 -20 0 20 40 60 Radial Position, mm November 2017 www.gencoa.com 13
Magnetic material sputtering (hig igh strength array) ) • The cathodes allow magnetic material sputtering as standard with diaphragm cooled target. • Thicker target can be sputtered using directly cooled target. (Pre- configured at factory) • Anode height adjustable to accommodate different target thickness. Anode Magnetic Fe Ni height line Strength on Size Thickness Thickness the target (mm) (mm) surface (G) 50mm 780 1 3 (2”) 75mm 840 1.5 4 (3”) 100mm 620 0.5 2 (4”) November 2017 www.gencoa.com 14
3G cath thode testing • Extensive testing performed on 3G prototypes for product reliability and plasma stability • Achieved 2 l/min water flow through the cathode at 1.5 bar pressure difference • Operates across a wide range of pressures • Coating uniformity & deposition rate measured for Copper target, DC different target diameters 300W, 8.5 E-3 Torr • Performance curves obtained at various pressure levels for various power modes Copper target, RF 300W, 8.5 E-3 Torr November 2017 www.gencoa.com 15
10 -6 to 10 -2 operating pressure 10 range (2” target diameter) 2” Cu Target 2” Cu target 240 450 DC 300W RF 300W 200 DC 180W Target voltage, V Target voltage, V 400 RF 180W 160 350 120 80 300 1.00E-05 1.00E-04 1.00E-03 1.00E-02 1.00E-05 1.00E-04 1.00E-03 1.00E-02 Pressure, Torr Pressure, Torr November 2017 www.gencoa.com 16
10 -6 to 10 -2 operating pressure 10 range (3” target diameter) 3” Al target 3” Cu target 500 500 DC 600W DC 600W 450 450 Target voltage, V DC 300W Target voltage, V DC 300W 400 400 350 350 300 300 1.00E-05 1.00E-04 1.00E-03 1.00E-02 1.00E-05 1.00E-04 1.00E-03 1.00E-02 Pressure, Torr Pressure, Torr November 2017 www.gencoa.com 17
10 -6 to 10 -2 Operating Pressure 10 Range (4” target dia iameter) 4” high strength Cu target 4” Cu target 500 500 DC 600W DC 600W 450 450 Target voltage, V DC 300W DC 300W Target voltage, V 400 400 350 350 300 300 1.00E-05 1.00E-04 1.00E-03 1.00E-02 1.00E-05 1.00E-04 1.00E-03 1.00E-02 Pressure, Torr Pressure, Torr November 2017 www.gencoa.com 18
Precious material sputtering (h (hig igh yie ield array) ) 700 5 4” high yield Cu Target 5.0E-4 Torr, DC power 650 Al target DC 600W 600 4 600 550 DC 300W 500 3 Target voltage, V Voltage, V 500 Current, A 450 400 2 400 Voltage 300 1 350 Current 300 1.00E-05 1.00E-04 1.00E-03 1.00E-02 200 0 Pressure, Torr 0 400 800 1200 1600 Power, W November 2017 www.gencoa.com 19
Coating unif iformity ( 2” target dia iameter) DC Power 150mm T/S, Copper target 0.5 0.4 OD 0.3 0.2 -50 -30 -10 10 30 50 Position, mm Range (mm) Uniformity 50 2.0% 30 0.9% 20 0.4% November 2017 www.gencoa.com 20
Coating unif iformity ( 2” target dia iameter) Normalised Uniformity over 100mm 1.2 1 0.8 OD 50mm T/S 0.6 150mm T/S 100mm T/S 0.4 0.2 0 -50 -40 -30 -20 -10 0 10 20 30 40 50 Position (mm) November 2017 www.gencoa.com 21
DC/RF unif iformity comparison ( 3” target diameter) DC Range, mm Uniformity 3" Al target @100mm T-S 50 ±4.4% 1.2 60 ±6.5% 1 70 ±8.4% 0.8 Al target, DC 300W, 2.5 E-3 Torr 0.6 RF 0.4 DC RF 0.2 Range, mm Uniformity 50 ±3.5% 0 -30 -20 -10 0 10 20 30 60 ±5.7% 70 ±7.9% Al target, RF 300W, 2.5 E-3 Torr November 2017 www.gencoa.com 22
DC/RF unif iformity comparison (4 (4 ” target dia iameter) DC Range, mm Uniformity 4" Cu Target @150mm T-S 50 ±5.1% 1.2 60 ±7.2% 70 ±9.1% 1 0.8 DC 0.6 Cu target, DC 300W, 1.4 e-2Torr RF 0.4 0.2 RF 0 Range, mm Uniformity -40 -20 0 20 40 50 ±5.2% 60 ±6.9% 70 ±9.1% Cu target, RF 300W, 1.4 e-2Torr November 2017 www.gencoa.com 23
Power Vs Voltage Vs Current ( 2” Cu target, DC power) 450 1 1 450 2.5E-3 Torr 5E-4 Torr 0.8 0.8 400 400 0.6 0.6 Voltage, V Current, A Voltage, V Current, A 350 350 0.4 0.4 300 300 Voltage 0.2 0.2 Voltage Current Current 250 0 0 250 0 60 120 180 240 300 0 60 120 180 240 300 Power, W Power, W 1 450 1.4E-2 Torr 0.8 400 0.6 Voltage, V Current, A 350 0.4 300 Voltage 0.2 Current 0 250 0 60 120 180 240 300 Power, W November 2017 www.gencoa.com 24
Power Vs Voltage ( 2” target , RF Power) Cu target 170 DC voltage, V 130 5.0E-4 Torr 2.5E-3 Torr 90 1.4E-2 Torr 50 50 100 150 200 250 300 Forward power, W 600 RF power, 2.5E-3 Torr, fused silica target 550 500 DC voltage, V 450 400 350 300 250 50 100 150 200 Forward power, W November 2017 www.gencoa.com 25
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