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Computational modelling of Silica nanoparticle formation in a flame - - PowerPoint PPT Presentation

Computational modelling of Silica nanoparticle formation in a flame reactor S. Shekar, M. Sander, A. J. Smith, M. Kraft 26 April, 2010 Introduction Mesoporous silica nanoparticles Precursor (TEOS) Aim: To answer the following questions


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SLIDE 1
  • S. Shekar, M. Sander,
  • A. J. Smith, M. Kraft

26 April, 2010

Computational modelling of Silica nanoparticle formation in a flame reactor

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SLIDE 2

Shraddha Shekar ss663@cam.ac.uk

Introduction

Aim: To answer the following questions

  • What happens in the gas-phase?
  • How do gas-phase precursors form the particles?
  • How do these particles grow?
  • How to describe the overall system from first-principles?

Precursor (TEOS) Mesoporous silica nanoparticles

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SLIDE 3

Shraddha Shekar ss663@cam.ac.uk

Product : Silica nanoparticles

Mesoporous Silica Nanoparticles: network of Si-O bonds such that Si:O = 1:2 Applications:

  • Support material for

functional/composite nanoparticles.

  • Optics, optoelectronics,

photoelectronics

  • Catalysis
  • Bio-medical applications, drug

delivery

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SLIDE 4

Shraddha Shekar ss663@cam.ac.uk

Industrial Flame Reactor

Precursor(TEOS) Fuel(ethanol+air) / Inerts(Ar) Product (Silica nanoparticles) Flame Spray Reactor Aim: To describe the flame synthesis of silica nanoparticles Experiments (Herzler et al / Seto et al / Pratsinis et al ) Model P ≥ 1 atm T ≈ 1100 - 1500 K

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Shraddha Shekar ss663@cam.ac.uk

Ab initio modelling

Quantum Chemistry calculations Statistical Mechanics

H(T) S(T) Cp(T)

Thermochemistry calculation Chemical Kinetics Equilibrium calculation Overall Model Species generation Population Balance Model

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Shraddha Shekar ss663@cam.ac.uk

Equilibrium Plot

Ref: W. Phadungsukanan, S. Shekar, R. Shirley, M. Sander, R. H. West, and M. Kraft. First-principles thermochemistry for silicon species in the decomposition of

  • tetraethoxysilane. J. Phys. Chem. A, 113, 9041–9049, 2009
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Shraddha Shekar ss663@cam.ac.uk

Reaction kinetics

  • Equilibrium

– Hints towards the existence of stable intermediates & products. – Intermediates Si(OH)x(OCH3)4-x Si(OH)y(OC2H5)4-y – Main Product Si(OH)4

  • Kinetics

– Reaction set generated to include all intermediates and products from equilbrium. – Reactions obey Arrhenius law rate constant k = ATβe-Ea/RT – Rate parameters (A, β, Ea) fitted to experimental vaues (a)

(a) J. Herzler, J. A. Manion, and W. Tsang. Single-Pulse Shock Tube Study of the decomposition of tetraethoxysilane and Related Compounds. J. Phys. Chem. A, 101, 5500-5508, 1997

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SLIDE 8

Shraddha Shekar ss663@cam.ac.uk

Gas-phase mechanism

Si O O O O H2C CH2 CH2 H2C

  • C2H4

H3C H2 C CH3 H Si O O O O H2C CH2 CH3 H3C H3C CH3 Si O O O O H3C H3C CH3 H3C Si OH HO HO OH H2C H

  • C2H4

Si O O O O H3C H3C H H

  • C2H4

Si O O O O H2C CH2 CH2 H2C

  • C2H4

H3C H2 C CH3 H CH3

  • C2H4

Si O O O O H2C CH2 CH2 H H3C CH3 CH3

  • C2H4

Si O O O O H2C CH2 H H H3C CH3 Si O O O O H CH2 H H H3C

  • C2H4
  • C2H4

Reaction Pathway 1 Reaction Pathway 2

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SLIDE 9

Shraddha Shekar ss663@cam.ac.uk

Reactor Plot

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SLIDE 10

Shraddha Shekar ss663@cam.ac.uk

Particle Model

Si O O O O H H H H Si O O O O H H H H

  • H2O

Si O O O O H H H Si O O O H H H

INCEPTION

Si O O O O Si O O Si

  • nH2O

SURFACE GROWTH

O Si Si Si Si Si O

n(-O-Si-O-Si-)

Si(OH)4 molecules in gas-phase undergo inception to form a dimer (-Si-O-Si). This dimer is considered to be the first particle. Particle growth then proceeds by subsequent removal of hydroxyl groups.

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Shraddha Shekar ss663@cam.ac.uk

Particle Model

[1]: M. Sander, R. H. West, M. S. Celnik, and M. Kraft. A Detailed Model for the Sintering of Polydispersed Nanoparticle Agglomerates, Aerosol Sci. Tech., 43, 978-989, 2009

Surface growth

New inception and surface growth steps have been incorporated in a previously developed stochastic particle model developed by Sander et al. [1].

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Shraddha Shekar ss663@cam.ac.uk

The Data Structure

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Shraddha Shekar ss663@cam.ac.uk

Particle-gasphase reactions

1. Inception 2. Surface growth

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Shraddha Shekar ss663@cam.ac.uk

The Algorithm

1. Set start time t←t0 and the initial system x←x0. 2. Calculate an exponentially distributed waiting time where U is a uniformly distributed random number, U Є (0; 1), and Rtot is the total rate of all processes (surface reaction, coagulation and inception) defined for rates Ri , i Є {coag,, inception, surfrxn}

Ref: M. Sander, R. H. West, M. S. Celnik, and M. Kraft. A Detailed Model for the Sintering of Polydispersed Nanoparticle Agglomerates, Aerosol Sci. Tech., 43, 978-989, 2009

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Shraddha Shekar ss663@cam.ac.uk

The Algorithm

3. Increment time variable t←t+dt. 4. If t > tstop then end. 5. Update the sintering level for the time dt for all the particles. 6. Choose a process i according to the probability: 7. Perform process i. 8. Go to step 2.

Ref: M. Sander, R. H. West, M. S. Celnik, and M. Kraft. A Detailed Model for the Sintering of Polydispersed Nanoparticle Agglomerates, Aerosol Sci. Tech., 43, 978-989, 2009

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Shraddha Shekar ss663@cam.ac.uk

Experimental Setup of Seto et al.

Ref: T. Seto, A. Hirota, T. Fujimoto, M. Shimada, and K. Okuyama. Sintering of Polydisperse Nanometer-Sized Agglomerates, Aerosol Sci. Tech., 27, 422- 438, 1997

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Shraddha Shekar ss663@cam.ac.uk

Model Validation

Ref: T. Seto, A. Hirota, T. Fujimoto, M. Shimada, and K. Okuyama. Sintering of Polydisperse Nanometer-Sized Agglomerates, Aerosol Sci. Tech., 27, 422- 438, 1997

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Shraddha Shekar ss663@cam.ac.uk

Model produced TEM-like images at 0.1 s, T = 1300 K

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Shraddha Shekar ss663@cam.ac.uk

Overall mechanism for particle formation

G a s

  • p

h a s e r e a c t i

  • n

s P a r t i c l e f

  • r

m a t i

  • n

P a r t i c l e g r

  • w

t h

The gas-phase and particle model described above are coupled using an

  • perator splitting

technique to generate the overall model.

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Shraddha Shekar ss663@cam.ac.uk

Conclusion

1. New kinetic model proposed which postulates silicic acid Si(OH)4 as the main product of TEOS decomposition. 2. A novel pathway proposed for the formation of silica nanoparticles via the interaction of silicic acid monomers. 3. Feasibility of using first-principles to gather a deeper understanding of complex particle synthesis processes.

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Shraddha Shekar ss663@cam.ac.uk

Acknowledgements

Thank you!