A Rotatory Scanning Plasmonic Nanolithography System for Bit Patterned Media Shaomin Xiong, Jeongmin Kim, Yuan Wang, Xiang Zhang and David Bogy 26th CML sponsor meeting 2014
Introduction for BPM Mask Fabrication Media Fabrication Rotatory e-beam Patterning Nanoimprint Directed self-assembly Pattern transfer Template Replication Planarization Lube and Burnish one master duplicated thousands of patterned disk
Concept of Plasmonic Nanolithography System Nature Nanotechnology 3, 733 - 737 (2008) A plasmonic structure (near field transducer) carried by the flying slider can expose the samples at ~ m/s.
Plasmonic Nanolithography System System in airhood GUI Challenging positioning in both radial and circumferential direction line edge roughness
Linear stage along radial direction Stage positioning error along the radial direction RMS: <10 nm
Positioning and pattern generation Experimental encoder signal readback and trigger for lithography pattern Experimental pattern generation Encoder patterns on the magnetic disk ~ 3 million count per revolution
Preliminary lithography results (demo) Free space lithography pattern Optical image of the lithography line patterns Those patterns are aligned
Summary A plasmonic nanolithography sysem for bit patterned media was introduced to assist the BPM mask fabrication Fast patterning, better pattern alignment performance Future work for performance verification
Acknowledgment Thank you to the SINAM and CML for supporting Faculty members: David B. Bogy Xiang Zhang Professor at UC Berkeley Professor at UC Berkeley Director of CML Director of SINAM Other faculty members for plasmonic nanolithography Cheng Sun (Northwestern), Robert J. Hocken (UNCC), Tsu-Chin Tsao (UCLA) Adrienne Lavine (UCLA) Manager: Yuan Wang Current graduate student members : Shaomin Xiong (UC Berkeley), Jeongmin Kim (UC Berkeley), Yenchi Chang (UCLA), Kang Ni (UNCC). Thank you to the HDD companies for HGA and media supporting
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