A Rotatory Scanning Plasmonic Nanolithography System for Bit - - PowerPoint PPT Presentation

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A Rotatory Scanning Plasmonic Nanolithography System for Bit Patterned Media Shaomin Xiong, Jeongmin Kim, Yuan Wang, Xiang Zhang and David Bogy 26th CML sponsor meeting 2014 Introduction for BPM Mask Fabrication Media Fabrication

SLIDE 1

A Rotatory Scanning Plasmonic Nanolithography System for Bit Patterned Media

Shaomin Xiong, Jeongmin Kim, Yuan Wang, Xiang Zhang and David Bogy

26th CML sponsor meeting 2014

SLIDE 2

 Media Fabrication Nanoimprint Pattern transfer

 Planarization  Lube and Burnish

Introduction for BPM

 Mask Fabrication

 Rotatory e-beam Patterning  Directed self-assembly  Template Replication

ne master

duplicated thousands of patterned disk

SLIDE 3

Concept of Plasmonic Nanolithography System

A plasmonic structure (near field transducer) carried by the flying slider can expose the samples at ~ m/s.

Nature Nanotechnology 3, 733 - 737 (2008)

SLIDE 4

Plasmonic Nanolithography System

GUI

System in airhood Challenging positioning in both radial and circumferential direction

line edge roughness

SLIDE 5

Linear stage along radial direction

Stage positioning error along the radial direction RMS: <10 nm

SLIDE 6

Positioning and pattern generation

Encoder patterns on the magnetic disk ~ 3 million count per revolution

Experimental encoder signal readback and trigger for lithography pattern

Experimental pattern generation

SLIDE 7

Preliminary lithography results (demo) Free space lithography pattern

Those patterns are aligned Optical image of the lithography line patterns

SLIDE 8

Summary

A plasmonic nanolithography sysem for bit patterned media was introduced to assist the BPM mask fabrication Fast patterning, better pattern alignment performance Future work for performance verification

SLIDE 9

Acknowledgment

Thank you to the SINAM and CML for supporting

Faculty members: Xiang Zhang Professor at UC Berkeley Director of SINAM David B. Bogy Professor at UC Berkeley Director of CML Other faculty members for plasmonic nanolithography Cheng Sun (Northwestern), Robert J. Hocken (UNCC), Tsu-Chin Tsao (UCLA) Adrienne Lavine (UCLA) Manager: Yuan Wang Current graduate student members : Shaomin Xiong (UC Berkeley), Jeongmin Kim (UC Berkeley), Yenchi Chang (UCLA), Kang Ni (UNCC).