umbc
play

UMBC A B M A L T F O U M B C I M Y O R T 1 - PowerPoint PPT Presentation

Advanced VLSI Design Details of the Diode I CMPE 640 Physical Representation SiO 2 p acceptor (boron) holes n donor (phosphorus) electrons Abrupt junction between p and n materials creates a concentration gradient among the carriers.


  1. Advanced VLSI Design Details of the Diode I CMPE 640 Physical Representation SiO 2 p acceptor (boron) holes n donor (phosphorus) electrons Abrupt junction between p and n materials creates a concentration gradient among the carriers. Electrons diffuse from n to p while holes diffuse from p to n . The diffusion leaves behind bound charge in the lattice. The bound charge sets up an electric field that counteracts the diffusion. Electrons drift from p to n while holes drift from n to p . L A N R Y D UMBC A B M A L T F O U M B C I M Y O R T 1 (9/27/04) I E S R C E O V U I N N U T Y 1 6 9 6

  2. Advanced VLSI Design Details of the Diode I CMPE 640 Charge Distribution, Electric Field and Electrostatic Potential Hole diffusion Electron diffusion - - + + p n plate - plate + neutral region - - neutral region + + Electron drift p region more heavily Hole drift doped, N A >N D + Charge Density Distance - Electric Field Distance Potential φ 0 Distance L A N R Y D UMBC A B M A L T F O U M B C I M Y O R T 2 (9/27/04) I E S R C E O V U I N N U T Y 1 6 9 6

  3. Advanced VLSI Design Details of the Diode I CMPE 640 Built-In Potential and I-V Characteristics Build-in potential: NAND kT where φ T φ 0 φ T ln = - - - - - - = 26mV at 300K (Thermal V) = - - - - - - - - - - - - - - - - - - q 2 10 carriers/cm3 ni × 10 ni = 1.5 For example: 10151016 1015carriers/cm3 NA = φ 0 = 26 ln - - - - - - - - - - - - - - - - - - - - - - - - - - = 638 mV 20 × 10 1016carriers/cm3 2.25 ND = Forward bias: Raising potential of the p w.r.t n causes current to flow from p to n . Lowers potential barrier and diffusion dominates drift . Minority carriers injected into neutral region and diffuse toward plates. Recombine with majority carrier causing a net flow of current. L A N R Y D UMBC A B M A L T F O U M B C I M Y O R T 3 (9/27/04) I E S R C E O V U I N N U T Y 1 6 9 6

  4. Advanced VLSI Design Details of the Diode I CMPE 640 I-V Characteristics Reverse bias: Raising potential of the n w.r.t p causes current to fl ow fr om n to p . Drift dominates diffusion . However, current is small since the number of minority carriers (e.g., electrons in p neutral region) is small. For forward bias, the current is exponentially related to applied bias. Small deviation 1.5 10 0 due to recombination I D (mA) in depletion region. 1.0 I D (A) 10 -5 0.5 2.3 φ T V/decade 10 -10 10 -15 1.0 0.5 V D 0.0 0.2 0.4 0.6 0.8 V D Linear scale Log scale Current increases by a factor of 10 for every 60mV (2.3 φ T ) of forward bias. L A N R Y D UMBC A B M A L T F O U M B C I M Y O R T 4 (9/27/04) I E S R C E O V U I N N U T Y 1 6 9 6

  5. Advanced VLSI Design Details of the Diode I CMPE 640 Static Behavior Ideal diode equation: VD φ T ⁄   where I S is a constant: saturation current. ID = IS e – 1   With V D << 0, I D ~= -I S = 10 -17 A/um 2 (actual values are 10 3 higher) Forward Bias: Physical basis for ideal equation: Minority carrier concentration Metal contact to p region Metal contact to n region p n (x) p n (W 2 ) p n0 n p (x) n p0 p-region -W 1 0 x W 2 n-region W n -W p L A N R Y D UMBC A B M A L T F O U M B C I M Y O R T 5 (9/27/04) I E S R C E O V U I N N U T Y 1 6 9 6

  6. Advanced VLSI Design Details of the Diode I CMPE 640 Static Behavior Reverse Bias: Ideal diode equation predicts diode current approaches the saturation current as V D gets much smaller than the thermal voltage. → φ T I D – I S V D » for Concentration of minority carriers at depletion-region approaches 0 under sufficient reverse bias. Minority carrier concentration Metal contact to p region Metal contact to n region p n0 n p0 p n (x) n p (x) p-region -W 1 0 W 2 n-region W n x -W p L A N R Y D UMBC A B M A L T F O U M B C I M Y O R T 6 (9/27/04) I E S R C E O V U I N N U T Y 1 6 9 6

  7. Advanced VLSI Design Details of the Diode I CMPE 640 Static Behavior Simple models of the diode. Left model based on ideal diode but is strongly non-linear and approxi- mated by a simple model on the right. VD φ T ⁄   + + I D ID = IS e – 1   V D + V D V Don - First order approx. - - Ideal diode model For a fully conducting diode, voltage drop across diode is ~0.7V Example: Assume V S = 3V and R S = 10k Ω and I S = 0.5X10 -16. I D Using non-linear model yields: V D R S V D =0.757V and I D =0.224mA + V S - Assuming V D =0.7V yields I D =0.23mA L A N R Y D UMBC A B M A L T F O U M B C I M Y O R T 7 (9/27/04) I E S R C E O V U I N N U T Y 1 6 9 6

  8. Advanced VLSI Design Details of the Diode I CMPE 640 Dynamic Behavior Dynamic behavior determines the maximum operational frequency. It is dependent on how fast charge can be moved around. Two capacitances : Depletion and diffusion . Depletion region and Junction capacitance: Under the ideal model, the depletion region is void of mobile carriers. Its charge is determined by the immobile donor and acceptor ions. Intuitively: Forward bias : Potential barrier is reduced which means that less space charge is needed to produce the potential difference. This corresponds to a reduced depletion-region width. Reverse bias : Potential barrier increased, increase in space charge, wider depletion width. L A N R Y D UMBC A B M A L T F O U M B C I M Y O R T 8 (9/27/04) I E S R C E O V U I N N U T Y 1 6 9 6

  9. Advanced VLSI Design Details of the Diode I CMPE 640 Dynamic Behavior Expressions that convey this fact. • Depletion region charge (V D is positive for forward bias):   φ 0 N A N D A D 2 ε si q ( )   - - - - - - - - - - - - - - - - - - - - - - - Q j = – V D (1)   N A + N D • Depletion-region width : 2 ε si   φ 0 N A + N D (2) ( )   W j = W 2 – W 1 = - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - – V D   q N A N D • Maximum electric field : where   φ 0 N A N D 2 q – 12 ( )   ε si × × 10 - - - - - - - - - - - - - - - - - - - - - - - - - - - - - E j = – V D = 11.7 1.053 F/cm ε si  N A + N D  The ratio of the n-side versus p-side depletion region width is determined by the doping level ratios: W 2 N A - - - - - - - - - - - - - - - - = - - - - - - - - ( ) – W 1 N D L A N R Y D UMBC A B M A L T F O U M B C I M Y O R T 9 (9/27/04) I E S R C E O V U I N N U T Y 1 6 9 6

  10. Advanced VLSI Design Details of the Diode I CMPE 640 Dynamic Behavior The model (for an abrupt junction): Imagine the depletion region as the dielectric of a capacitor with dielec- tric constant of silicon. And the n- and p-neutral regions act as the capacitor plates: - - + + p n plate plate - + neutral region - - neutral region + + insulator Forward bias, cap increases Reverse bias, cap decreases A small change in the voltage applied to the junction (dV D ) causes a change in the space charge (dQ j ). L A N R Y D UMBC A B M A L T F O U M B C I M Y O R T 10 (9/27/04) I E S R C E O V U I N N U T Y 1 6 9 6

  11. Advanced VLSI Design Details of the Diode I CMPE 640 Dynamic Behavior Depletion layer capacitance: Junction capacitance is easily computed by taking the derivative of equa- tion (1) with respect to V D . For an abrupt junction: ε si q dQ j N A N D C j 0 ) 1 – - φ 0 ( C j = - - - - - - - - - - - = A D - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - – V D = - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - V D φ 0 ⁄ dV D 2 N A + N D 1 – C j0 is the capacitance under zero-bias conditions and is only a function of the physical parameters of the device: ε si q N A N D – 1 - φ 0 ( ) C j 0 = A D - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - 2 N A + N D The same result can be obtained using the standard parallel-plate capac- itor equation:   A D ε si   where W j is given by equation (2). - - - - - - - - C j =   W j L A N R Y D UMBC A B M A L T F O U M B C I M Y O R T 11 (9/27/04) I E S R C E O V U I N N U T Y 1 6 9 6

  12. Advanced VLSI Design Details of the Diode I CMPE 640 Dynamic Behavior Junction capacitance plotted as a function of applied voltage bias: 2.0 Strongly non-linear Abrupt junction m = 0.5 C j (fF)/um 2 1.5 Linear junction 1.0 m = 0.33 0.5 C j0 0.0 -4.0 -2.0 0.0 V D Capacitance decreases with an increasing reverse bias. For -5V, the cap. is reduced by more than a factor of 2 over the zero bias case.: – 3 F/ m 2 × 10 = 2 C j 0 0.5 um 2 then a reverse bias of -2.5V yields AD = 0.9 fF um 2 ) 0.5 um 2 φ 0 ( ⁄ ( ) = 0.64 V = 0.45 fF L A N R Y D UMBC A B M A L T F O U M B C I M Y O R T 12 (9/27/04) I E S R C E O V U I N N U T Y 1 6 9 6

Download Presentation
Download Policy: The content available on the website is offered to you 'AS IS' for your personal information and use only. It cannot be commercialized, licensed, or distributed on other websites without prior consent from the author. To download a presentation, simply click this link. If you encounter any difficulties during the download process, it's possible that the publisher has removed the file from their server.

Recommend


More recommend