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Planar sensor R&D activity in Liverpool Liverpool pixel - - PowerPoint PPT Presentation
Planar sensor R&D activity in Liverpool Liverpool pixel - - PowerPoint PPT Presentation
Planar sensor R&D activity in Liverpool Liverpool pixel R&D mask Designed for investigating several issues of general relevance to any pixel system for future Vertex detectors in high luminosity experiments. Important issue are
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every guard structure has 4 variances to study the cut edges GR structure 5:
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10u m 32 um
- High resistivity polysilicon used to fill the trenches to assure
mechanical strength
- Thermal oxide inside trenches to assure insulation.
- No guard ring
Possible layout n-p
SiO2
80 um 10um 80um
With CNM Barcelona Edgeless detectors with trenches
100um
p+ (epitaxy) p
200um
Al
Side cut (DRIE or Diamond saw)
poly
n+ p+ n+ n+
p-stop strips
p+
Si3N4
guard
p+
Giulio Pellegrini, CNM
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Detector 3
Guard rings P-stops trench DRIE cut line Bias ring Floating ring
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Detector type (6 sensors each on a 4” mask)
- Detector 1, no floating ring, small bias ring.
- Detector 2, large bias ring.
- Detector 3: one bias ring + one floating ring (best conditions
from simulation).
- Distance between last strip and cut line (DRIE) and Diamond
Saw:
- Detector 1 80um 325um
- Detector 2 258um 325um
- Detector 3 258um 325um
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