Ionic liquid gating of InAs nanowire-based FETs
Francesco Rossella
NEST, Scuola Normale Superiore and Istituto Nanoscienze-CNR Pisa, Italy
Ionic liquid gating of InAs nanowire-based FETs Francesco Rossella - - PowerPoint PPT Presentation
Ionic liquid gating of InAs nanowire-based FETs Francesco Rossella NEST, Scuola Normale Superiore and Istituto Nanoscienze-CNR Pisa, Italy NEST, Scuola Normale Superiore & Istituto Nanoscienze-CNR A public institute for higher education
NEST, Scuola Normale Superiore and Istituto Nanoscienze-CNR Pisa, Italy
http://www.laboratorionest.it/
Palazzo Carovana, SNS
A public institute for higher education and research
self-assembled NW heterostructures
self-assembled NW heterostructures
field effect controlled NW-based devices
self-assembled NW heterostructures
field effect controlled NW-based devices
electrical & thermal transport, luminescence
self-assembled NW heterostructures
field effect controlled NW-based devices
electrical & thermal transport, luminescence
fucntional devices: (Q)ICTs, energy harvesting
self-assembled NW heterostructures
field effect controlled NW-based devices
electrical & thermal transport, luminescence
fucntional devices: (Q)ICTs, energy harvesting Implementation: I. hemogeneous nanowires II. InAs/InP axial heterostructures III. InAs/InP/GaSb radial heterostructures
self-assembled NW heterostructures
field effect controlled NW-based devices
electrical & thermal transport, luminescence
fucntional devices: (Q)ICTs, energy harvesting Implementation: I. homogeneous nanowires II. InAs/InP axial heterostructures III. InAs/InP/GaSb radial heterostructures
Chemical Beam Epitaxy
NW nucleation gaseous reactant catalyst
Au catalyst
Semiconductors
nanocrystals (bottom-up approach)
epitaxy
Lucia Sorba
EBL-defined dots Au colloids Au film
Daniele Ercolani Valentina Zannier Isha Verma Omer Arif
EBL-defined dots Au colloids Au film Au thin film
Gomes et al., SST 30, 115012 (2015)
Daniele Ercolani Valentina Zannier Isha Verma Omer Arif
EBL-defined dots Au colloids Au film Au thin film
0 10 20 30 40 50 60 70 80 10 20 30
NW Counts
EBL-defined dots
Gomes et al., SST 30, 115012 (2015)
Daniele Ercolani Valentina Zannier Isha Verma Omer Arif
200 nm 100 nm
InAs GaSb e h
~0.8eV ~0.4eV
S.Pezzini, … and F.Rossella, in preparation M.Rocci, F.Rossella* et al., Nano Lett. 16, 7950 (2016)
Umesh Gomes Zhara Montmatz Mirko Rocci
Sharp interface between 2 semiconductors
Sharp interface between 2 semiconductors
InP barriers few nm thick inside an InAs NW
Sharp interface between 2 semiconductors
100 nm
Metal/semiconductor junctions
InP barriers few nm thick inside an InAs NW
M. Gemmi V. Piazza J. David
A.Arcangeli, F. Rossella* et al, Nano Lett. 16, 5688 (2016)
s-SNOM
NEST, Scuola Normale Superiore and Istituto Nanoscienze-CNR, Pisa (Italy) Central Research Institute of Electric Power Industry, Yokosuka, Kanagawa (Japan)
T k k S ZT
e l
2
SUPPORTED NW devices: Seebeck & Power Factor
T k k S ZT
e l
2
SUPPORTED NW devices: Seebeck & Power Factor V0 -VH V0 +VH Differential bias 2VH
S.Roddaro, et al., Nano Research 2014
T k k S ZT
e l
2 S.Roddaro, et al., Nano Lett. 2013
SUPPORTED NW devices: Seebeck & Power Factor V0 -VH V0 +VH Differential bias 2VH
S.Roddaro, et al., Nano Research 2014
T k k S ZT
e l
2 S.Roddaro, et al., Nano Lett. 2013 D.Prete et al, in preparation 2018
SUPPORTED NW devices: Seebeck & Power Factor V0 -VH V0 +VH Differential bias 2VH
S.Roddaro, et al., Nano Research 2014
T k k S ZT
e l
2
SUSPENDED NW devices: thermal conductivity
T k k S ZT
e l
2
SUSPENDED NW devices: thermal conductivity
Nano Research 2015
Optical approach
T k k S ZT
e l
2
SUSPENDED NW devices: thermal conductivity
Nano Research 2015
Optical approach All-electrical method: Current injection at freq ω Voltage probing at freq 3ω
M.Rocci et al, submitted 2018
15% R modulation within +/- 20V (combining BG and SG)
F.Rossella et al, Semiconductor and Semimetals 2018
CATIONS ANIONS
CATIONS ANIONS Made for each other!
DFT Hexafluorophosphate (coarse grain) + layered electrodes + porosity Molecular dynamics diffusion coefficients
Many additional problems in simulations! realistic structure of the porosity (→ sponge builder) Size of the system The model of electrode must be polarizable Test with mechanically induced diffusion: anion has a larger diffusivity than the cation Tests to validate the model optimize the simulation parameters Test with nanoporous charged polarizable electrodes
Parameter space:
Parameter space:
(liquid gate voltage Sweep rate)
Parameter space:
(liquid gate voltage Sweep rate) T = 240 K dVLG/dt < 10 mV/s
1 2 2.0 2.1 2.2 2.3 2.4
I
MIN DS
V
MIN LG
IDS (A) VLG (V)
W
1 2 2.0 2.1 2.2 2.3 2.4
I
MIN DS
V
MIN LG
IDS (A) VLG (V)
W
220 240 260 280 300 1.8 2.0 2.2
1 2 220 240 260 280 300
I
MIN DS (A)
T (K) V
MIN LG (V) 4mV/s
T (K) W (V)
1 2 2.0 2.1 2.2 2.3 2.4
I
MIN DS
V
MIN LG
IDS (A) VLG (V)
W
220 240 260 280 300 1.8 2.0 2.2
1 2 220 240 260 280 300
I
MIN DS (A)
T (K) V
MIN LG (V) 4mV/s
T (K) W (V)
40 80 120 1.8 2.0 2.2
1 2 40 80 120
I
MIN DS (A)
sweep rate (mV/s) V
MIN LG (V)
sweep rate (mV/s) W (V)
< 100 pA Full pinch-off
< 100 pA Full pinch-off Linear & saturation regions
LIQUID GATE
n ≈ 5*1017 cm-3 µ ≈ 200 cm2/Vs CBG ≈ 60 aF LIQUID GATE BACK GATE (no liquid)
n ≈ 5*1017 cm-3 µ ≈ 200 cm2/Vs CBG ≈ 60 aF CLIQUID GATE ≈ 30*CBG BACK GATE (no liquid) LIQUID GATE BOTH (same device)
VLG << 0V semiconductor VLG >> 0 V Metal-like
TE-NW@EUT Fabio Beltram Valeria Demontis Daniele Ercolani Lucia Sorba Valentina Zannier Domenic Prete
Shimpei Ono
(Lungarno Pacinotti)