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Handling Partial Correlations in Yield Prediction
Sridhar Varadan
Dept of ECE Texas A&M University
Jiang Hu
Dept of ECE Texas A&M University
Janet Wang
Dept of ECE University of Arizona
Handling Partial Correlations in Yield Prediction Sridhar Varadan - - PowerPoint PPT Presentation
Handling Partial Correlations in Yield Prediction Sridhar Varadan Janet Wang Jiang Hu Dept of ECE Dept of ECE Dept of ECE Texas A&M University University of Arizona Texas A&M University 1 Presentation Outline What is Yield?
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Dept of ECE Texas A&M University
Dept of ECE Texas A&M University
Dept of ECE University of Arizona
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Yield - Probability of any Manufacturing or Parametric spec
satisfying its limits.
Manufacturing Yield – for manufacturing specs. Parametric Yield – performance measures (timing, power etc.) Process variations affect yield prediction. Intra-die process variations no longer negligible.
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Chip manufacturing involves complex chemical and physical processes. Tighter pitches and bounds make process variations unavoidable. Types of process variations –
(1) Independent random variations (2) Partially correlated random variations
where µ(n) – systematic intra-die variations ε(n) – random intra-die variations
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Chemical Mechanical Planarization (CMP) – used in patterning Cu
interconnects.
CMP model – Yield is probability of thicknesses at all locations lying within the
Upper and Lower thickness limits.
For simplicity, a chip is meshed into a no. of tiles. Each tile is a location monitored for interconnect thickness. Meshing a chip into small tiles –
Dimension – 100 µm x 90 µm. Size of each tile – 10 µm x 10 µm Total no. of tiles – 90
100 um 90 um
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Process variations in interconnect thicknesses at n locations – CMP Yield –Probability for thickness at n locations to lie in the
shaded region.
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Factors making Yield Prediction important -
Dishing – Excessive polishing of Cu. Erosion – Loss in field oxide between
interconnects.
Potential open and short faults in interconnects.
Predict Yield in circuit design stages to get Yield friendly design.
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∑ − ∑ − =
− n T
p p p ) 2 ( ) ( ) ( ) (
1
π μ μ φ
=
U L U L U L
n
dp dp dp p Y
....... 2 1
). ( ...... φ
Where
∑ - covariance matrix for the n variables – {p1, p2,…,pn}
Yield is obtained via numerical integration of a joint PDF - …..(1) …..(2) U, L & µ - upper and lower thickness limits, & mean thickness value.
Yield equation (1) can be decomposed as – Where YU (High Yield) - probability for thickness at all locations to stay below upper thickness limit. YL (or Low Yield) - probability for thickness at all locations to stay above lower thickness limit.
L U
….(3)
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Issues Affecting Yield Prediction –
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Perfect Correlation Circles (PCC) approach – to reduce no. of tiles. Luo, et al., DAC 2006
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Find tile with maximum thickness MAX1.
2.
Form PCC -CIRCLE1 (centre at MAX1, pre-fixed radius).
3.
Find tile with maximum thickness MAX2 outside CIRCLE1.
4.
Form PCC CIRCLE2 (centre at MAX2).
5.
Form similar PCCs until no tiles are left uncovered by PCCs.
6.
Centers of PCCs (MAX1, ….., MAXm) form reduced set of variables.
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Use Genz algorithm to compute yield.
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Let the setup look like this
after reduction
Reduction from 90 tiles
to 14 variables (the centres
PCCs are formed in a sequence –
MAX1 – CIRCLE1, MAX2 – CIRCLE2, ………………….., MAX13 – CIRCLE13, MAX14 – CIRCLE14.
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Advantages -
Disadvantages –
(over-estimation in yield)
more accurate yield estimate (but larger run-time)
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Develop reduction methods to –
Two new methods for predicting yield –
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Let vector be metal thicknesses at n locations - This vector an be decomposed as follows –
and where - nominal value
T
n
2 1
i i i
i i
i
i
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Objective – Transform correlated random variables to a reduced &
uncorrelated set through an orthogonal base
Procedure –
Initial Setup for OPCA –
Let the initial thickness variations at n locations be –
Let be the variance.
T
n}
2 1
….(1)
nxn
nxn
2 i
j i nxn
nxn ij)
and
….(2)
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where - eigenvalue (diagonal) matrix
such that
relationship between a correlated set of variables.
T
n n ×
n
2 1
….(3) ….(4)
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are related as follows – where
1 × n
T
1 × n
&
1 × n
B
….(5) ….(6) ….(7) ….(8)
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uncorrelated set through an orthogonal base.
giving reduction.
T T
k k
&
….(9) ….(10) ….(11)
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Conquer and divide based clustering approach. Clustering done using sub-regions (similar to PCCs). Clustering in sub-regions is based on thickness variations. Sizes of clusters are not homogeneous.
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Consider entire chip as one basic sub-region S. Sub-region S consists of tiles used in evaluating yield. Threshold thickness value θ decides possibility of clustering. Threshold θ tells on variations in thickness of tiles in a sub-region.
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Stage 1:- Sub-region S covers the entire chip. Let θ be 10.
Sub-region Monitored Max Thickness Cd Cd ≤θ Next Action Critical Non-Critical S 97 93, 95, 94 2 Yes Quadrisect
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Stage 2 – After forming sub-regions S1, S2, S3 and S4. Sub-region Monitored Max Thickness Cd Cd ≤θ Next Action Critical Non-Critical S1 93 85, 78, 81 8 Yes Quadrisect S2 97 83, 79, 86 11 No Retain S3 95 76, 73, 80 15 No Retain S4 94 88, 84, 89 5 Yes Quadrisect
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Stage 3 – Inside sub-regions {S11, S12, S13 , S14} & {S41, S42, S43 , S44}.
Sub-region Monitored Max Thickness Cd Cd ≤θ Next Action Critical Non-Critical S11 85 72, 74, 79 6 Yes Quadrisect S12 78 63, 65, 60 13 No Retain S13 81 70, 68, 66 11 No Retain S14 93 79, 77, 75 16 No Retain Sub-region Monitored Max Thickness Cd Cd ≤θ Next Action Critical Non-Critical S41 94 82, 78, 87 7 Yes Quadrisect S42 88 75, 73, 67 13 No Retain S43 84 71, 66, 69 11 No Retain S44 89 86, 81, 78 3 Yes Quadrisect
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Clustering based on minimum thickness variations in sub-regions.
HAQ Approach PCC Approach
sensitivity inside sub-regions
Stage-1 4 Stage-2 10 Stage-3 19
variations for clustering
working model
Stage-1 4 Stage-2 16 Stage-3 64
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Experiments simulated –
Yield evaluated for three cases of correlation –
where = {2, 3, 4} and - distance between centres of different tiles.
Simulation Inputs –
Mean thickness value – 0.3580 µm Upper thickness limit – 0.4580 µm Lower thickness limit – 0.2580 µm Standard deviation – 0.02 µm
9958 . ) 10 (
5
+ × −
− x
α x α
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Correlation Equation: Initial seed = 5
5 +
− x
Monte Carlo Run Times
6165 6191 6158 6516 6518 6472 5900 6000 6100 6200 6300 6400 6500 6600 Case 1 - α = 2 Case 1 - α = 3 Case 1 - α = 4 Correlation Cases CP U Run Tim e (sec) MC without OPCA MC with OPCA
Monte Carlo Yield Values
60% 60% 60% 76% 74% 71% 0% 10% 20% 30% 40% 50% 60% 70% 80% Case 1 - α = 2 Case 1 - α = 3 Case 1 - α = 4 COrrelation Cases Y ield MC without OPCA MC with OPCA
PCC Simulations - Yield Values
89% 88% 86% 90% 88% 87% 84% 85% 86% 87% 88% 89% 90% 91% Case 1 - α = 2 Case 1 - α = 3 Case 1 - α = 4 Correlation Cases Yield PCC Size - 150 µm PCC Size - 250 µm
PCC SImulations - Run Times
2242 2238 2214 1636 1619 1649 500 1000 1500 2000 2500 Case 1 - α = 2 Case 1 - α = 3 Case 1 - α = 4 Correlation Cases CPU Run Time (sec) PCC Size - 150 µm PCC Size - 250 µm
Correlation Equation PCC Size
150 µm 250 µm 431/435 305/310 150 µm 250 µm 432/427 305/310 150 µm 250 µm 429/425 307/308
9958 . 10 2
5
+ × −
− x
9958 . 10 4
5
+ × −
− x
9958 . 10 3
5
+ × −
− x
OPCA Simulations - Yield Values
77% 76% 73% 78% 77% 74% 70% 71% 72% 73% 74% 75% 76% 77% 78% 79% Case 1 - α = 2 Case 1 - α = 3 Case 1 - α = 4 Correlation Cases Y ie ld After OPCA - 300 Variables After OPCA - 200 Variables
OPCA Simulations - CPU Run Times
481 482 476 470 469 463 450 455 460 465 470 475 480 485 Case 1 - α = 2 Case 1 - α = 3 Case 1 - α = 4 Correlation Cases C P U R u n T im e (s e c ) After OPCA - 300 Variables After OPCA - 200 Variables
HAQ Simulations - Yield Values
80% 77% 75% 82% 79% 76% 70% 72% 74% 76% 78% 80% 82% 84% Case 1 - α = 2 Case 1 - α = 3 Case 1 - α = 4 Correlation Cases Yield θ = 0.09 µm θ = 0.075 µm
HAQ Simulations - CPU Run Times
372 239 361 312 221 316 50 100 150 200 250 300 350 400 Case 1 - α = 2 Case 1 - α = 3 Case 1 - α = 4 Correlation Cases CPU Run Time (sec) θ = 0.09 µm θ = 0.075 µm
Correlation Equation θ
0.09 µm 0.075 µm 175/178 153/155 0.09 µm 0.075 µm 80/79 61/61 0.09 µm 0.075 µm 172/170 148/143
9958 . 10 2
5
+ × −
− x
9958 . 10 4
5
+ × −
− x
9958 . 10 3
5
+ × −
− x
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Monte Carlo without OPCA –
Neglecting correlation under-estimates yield.
OPCA –
Less variable reduction better accuracy, yield is closer to Monte Carlo.
PCC –
Larger PCC sizes more reduction over-estimated yield value Smaller PCC sizes improves accuracy in yield longer run time
HAQ –
Higher threshold values less reduction (fine-grained grid) improved accuracy Smaller threshold values over-estimated yield
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Comparing yield accuracy and algorithm run time -
Correlation Equation Method Yield Error Speedup
PCC OPCA HAQ 18.9% 2.7% 4.1% 1x 4.6x 9.4x PCC OPCA HAQ 21.1% 2.8% 5.6% 1x 4.7x 6.2x PCC OPCA HAQ 17.1% 1.3% 5.3% 1x 4.7x 6x
5 +
− x
5 +
− x
5 +
− x
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Yield prediction is complex -
New methods used in yield prediction –
Both reduce complexity & have less impact on Yield Accuracy.
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