Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
FET Based Sensors
Lecture 8
1
FET Based Sensors Lecture 8 U-Tokyo Special Lectures Biosensors - - PowerPoint PPT Presentation
1 FET Based Sensors Lecture 8 U-Tokyo Special Lectures Biosensors and Instrumentation Stewart Smith 2 Summary Ion Sensitive Field Effect Transistors Theory of operation, pH sensitivity Instrumentation and CMOS integration The
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
1
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
2
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
3 E = E0 + RT nF ln ✓ai1 ai2 ◆
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
Solution Source Encapsulation Vref Reference Electrode p−Si Drain SiO2 n−Si n−Si
4
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
5 IDS = β ✓ (VGS − VT )VDS − V 2
DS
2 ◆ β = µCox W L VT = VF B + QB Cox + 2φF VF B = ΦMS − Qf + Qox Cox
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
6 VF B = Eref + Ψ0 + χsol − ΦSi − Qf + Qox Cox
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
7
Si Si Si O O Oxide Surface Solution O− proton donor OH2+ OH proton acceptor neutral site
SiOH ⇔ SiO− + H+
B
SiOH+
2 ⇔ SiOH + H+ B
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
8 δΨ0 δpHB = −2.3kT q α
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
9 α = 1
2.3kT Cdl q2βint
+ 1
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
10
+ − − − − − + + + + − − − − + + + + − − − − + + + + Electrode Surface Helmholtz Layer Diffuse Layer
CH Cd
1 Cdl = 1 CH + 1 Cd
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
11
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
response becomes more Nernstian
and a sensitivity of –58 mV pH–1
12
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
concentration
affect an ISFET
that Cdif doesn’t matter
13
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
14 VF B = Eref + Ψ0 + χsol − ΦSi − Qf + Qox Cox δVT δpHB = −2.3kT q α
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
15 IDS = β ✓ (VGS − VT )VDS − V 2
DS
2 ◆ β = µCox W L
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
16
− + D S ISFET + − R
V V
1 in 2
R R
3
V+ VDS = V− = V+ VR3 = VR1 = VinR1 R1 + R2 V+ = VR2 = VinR2 R1 + R2 IDS = VR3R3
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
17
− + D S ISFET + − R
V V
1 in 2
R R
3
V+ IDS = VR3R3 VDS = VR2
δVT δpHB = −2.3kT q α δVout δpHB = 2.3kT q α
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
18
− + D S ISFET + − R
V V
1 in 2
R R
3
V+ δVout δpHB = 2.3kT q α −1.3V < Vout < 3V
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
19
D S ISFET
− + − + − + R R R R
2 2 3 3
Vout R1
Vdd
R1 RDS − +
ref
V Rout RS Iin I f
VDS = IinRDS δVS = IfRS IDS controlled by feedback Vout = IfRout = δVs Rout RS Vout = −δVT Rout RS
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
20
D S ISFET
− + − + − + R R R R
2 2 3 3
Vout R1
Vdd
R1 RDS − +
ref
V Rout RS Iin I f
At pH=7 set Vref to give Vout=0V Vout ∝ δpH Set Rout for desired pH sensitivity
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
aligned” process
requires the polysilicon or metal gate as a mask
integrated ISFET production 21
e e te - self-aligned. e - self-aligned.
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
available in CMOS
the surface of IC
is typically silicon nitride
layer 22
S S D D G G G
p-type silicon substrate n-well Inter-Layer Dielectric Metallisation Silicon Nitride Membrane pH Sensing Region Oxide
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
23
VT = VF B + 2φF + p 2εsqNa(2φF + VBS) Cox
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
24
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
25
ISFET
Pseudo
REFET +
Amp. Reference Electrode
V=f(pH,VPRE) V=f(VPRE) V=f(pH)
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
26
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
27
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
28 ID = ID0 exp ✓q(VGS − VT ) nkT ◆ h 1 − exp ⇣ −VDS q kT ⌘i ID = ID0 exp q nkT (VGS − γ − 2.3αkT q pH)
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
29
S D B Vref Cd CH CH Cpass solution device floating gate
n = 1 + Cdep Ceff 1 Ceff = 1 Cd + 1 CH + 1 Cpass + 1 Cox
S S D D G G G
p-type silicon substrate Inter-Layer Dielectric Metallisation Oxy-Nitride Passivation Oxide n+ source-drain regions
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
30
Georgiou, P ., & Toumazou, C. (2009). Sensors & Actuators: B. Chemical, 143(1), 211–217. doi:10.1016/j.snb.2009.09.018
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
ChemFET
sensitive to other ions (K+, Ca2+, F–, etc.)
that is sensitive to a non-ionic chemical
produce a change in charge for FET sensing
31
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
32
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
33
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
34
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
35
S D B D CPass CP Cov1 Si3N4 SiO2 M1 M2 M4 . . . Cov2 CP
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
interface.
ISFET
response 36 ∆Vout = ∆VTn ✓ 1 √a1 − 1 √a2 ◆
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
37
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
38
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
39
436
B.-IC Sohn, C,-S. gim / Sensors and Actuators B34 (1996)435--440
A
141Ol
ion sensing get
A'
Vrs
. . . . . . ] !ocal pH
Vrs-O.65V ~ / change
LJ--~LIT--~ i °-- i ~
Fig, 1, Cross-~ction and layout of a sensor (1, source; 2, substrate; 3, Pt working electrode; 4, drain; not to real scale).
such as cathode material, electrolyte pH, pretreatment and aging of the cathode surface. An electrochemical current flows between the two electrodes, giving current output related to the dissolved
gen sensor determines dissolved oxygen concentration by measuring this electrochemical current. A pH change by the generation of hydroxyl ions (OH-) as well as a current flow occurs simultaneously and this pH change is of im- portance in the proposed sensor. A working electrode surrounding a pH-sensing gate of a pH-ISFET electro- lyzes dissolved oxygen, resulting in a pH variation due to
gate as shown in Fig. 1. The pH-ISFET, a well-known pH sensor, then detects this pH variation that is logarithmi- cally proportional to the oxygen content. This can be used as either a pH sensor or a dissolved oxygen sensor. Such a device structure including a noble metal electrode has also been used for application to a ISFET-based titration system [10-12] although the subject treated in these pa- pers is different from oxygen sensing. The accumulation of hydroxyl ions near the cathode has been treated by many researchers [ 13-15]. Their work focused on the effect of accumulation of the reaction products on the iinearity, sensitivity and transient charac- teristics of the amperometric signal. The transport of the neutral oxygen molecules to the cathode is a well known diffusion-limited process, which results in a zero oxygen concentration at the cathode surface and a limiting diffu- sion current determined by the concentration gradient. Hale et al. [ 13] treated the transport of hydroxyl ions from the cathode as diffusion from a continuous point source
tions for a membrane-covered probe. His simple calcula- tion showed that the concentration of hydroxyl ions at the
sponds to pH 12.4 in an initially neutral and unbuffered solution, after the establishment of a steady-state current in an air-saturated sample. Without the permeable mem- brane, this pH change is expected to diminish since the hydroxyl ions can diffuse away from the cathode surface to the bulk solution more easily.
The ISFET was fabricated by a conventional CMOS process and the gate material consisted of 50 nm thick SiO2 and 50 nm thick Si3N4. A 15 nm thick titanium glue layer and a 150 nm thick platinum layer were sputtered
exposed working electrode area after encapsulation was 0.056 mm 2.
rent (/ds = 150MA) and constant drain voltage (Vds = 3 V)
reference electrode used was not an integrated one but a sleeve type single junction electrode (ORION model 900100) and the counter electrode was placed on the backside of the sensor probe. The measurement technique is based on the chroaoamperometric method [16] in which a stepwise potential pulse is imposed on the work- ing electrode. The working electrode potential (Vw) is changed from a rest value (ground potential) where the reduction of oxygen can hardly occur to a predetermined reduction potential chosen in a voltammogram. In the chronoamperometric method, there is an initial current
Vw
+v
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
40
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
41
Pad opening for FIB deposited platinum
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
42
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
FET based sensor
conduction in NW
volume ratio
43
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
fabrication
substrate
catalyst
CVD process to grow wires
length and diameter
44
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
from growth substrate
fabricate S/D electrodes
can be used to align NWs 45
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
substrate
layer
produce nanowires
nano-scale lithography
46
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
47
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
48
lithography
etch with TMAH
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
spacers in advanced CMOS technologies
polysilicon deposition
leave nanowires
49
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
50
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
51
Mu, L. et al., (2014), Nano Letters, 14(9), 5315–5322. doi:10.1021/nl502366e
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
52
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
53
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
54
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
wire process
(PNA) probe
silicon nano-wires
binding causes change in conductance 55
images of fabricated Si-NWs. (a) 2-wire Si-NW device. (b) 16-wire Si-NW devic
De, A.,et al., (2013) The Analyst, 138(11), 3221–3229. doi:10.1039/C3AN36586G
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
reduces common mode effects
with lock-in-amplifier to reduce noise
the reference sensor may remain 56
De, A.,et al., (2013) The Analyst, 138(11), 3221–3229. doi:10.1039/C3AN36586G
Stewart Smith Biosensors and Instrumentation U-Tokyo Special Lectures
57