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Characterization of On-Chip Inductors Overview basic physics loss mechanisms eddy currents in substrate / effect of ground shield ohmic loss, skin and proximity effects in metal conductors optimization criteria quality


  1. Characterization of On-Chip Inductors Overview • basic physics • loss mechanisms • eddy currents in substrate / effect of ground shield • ohmic loss, skin and proximity effects in metal conductors • optimization criteria • quality factor Q(f), f(Q max ), self-resonant frequency f sr , • simulation examples with Ansoft HFSS (FEM-tool) CL TD SIM Prof. Dr. R. Liebmann May 3 rd 2003 Page 1 Characterization of on-chip inductors PDF created with FinePrint pdfFactory trial version http://www.fineprint.com

  2. Maxwell equations for time harmonic fields E = - j ω A - ∇φ Fields: B = ∇ × A Assumptions: • linear and isotropic metal and substrate conductors • Coulomb gauge ∇ · A = 0 ∇ 2 A = µ [j ωσ A - ω 2 ε A + ( σ + j ωε ) ∇Φ - J ] term #: (1) (2) (3) (4) (1) magnetically induced eddy currents in metal and substrate conductors (2) dynamic radiation current (can be neglected here) (3) electrically induced conductive and displacement currents (4) impressed current in the metal conductors CL TD SIM Prof. Dr. R. Liebmann May 3 rd 2003 Page 2 Characterization of on-chip inductors PDF created with FinePrint pdfFactory trial version http://www.fineprint.com

  3. losses by currents (induced) in metal coil (I) • ohmic loss (trivial) • skin effect (inhomogenous current density due to magnetic field of single conductors, increases resistance) from www.stanford.edu/~narya CL TD SIM Prof. Dr. R. Liebmann May 3 rd 2003 Page 3 Characterization of on-chip inductors PDF created with FinePrint pdfFactory trial version http://www.fineprint.com

  4. losses by currents (induced) in metal coil (II) • proximity effect: similar to skin effect, but due to field from adjacent conductors) from www.stanford.edu/~narya CL TD SIM Prof. Dr. R. Liebmann May 3 rd 2003 Page 4 Characterization of on-chip inductors PDF created with FinePrint pdfFactory trial version http://www.fineprint.com

  5. losses by currents induced in substrate from Niknejad & Meyer, IEEE Trans. MTT 2001 magn. ind. currents : image currents, reduce inductance, cause ohmic loss electr. ind. currents: through capacitive coupling to coil, also cause loss, and reduce self-resonance frequency (where Q = 0) CL TD SIM Prof. Dr. R. Liebmann May 3 rd 2003 Page 5 Characterization of on-chip inductors PDF created with FinePrint pdfFactory trial version http://www.fineprint.com

  6. effect of patterned ground shield from www.stanford.edu/~narya With optimized ground shield the substrate loss can be reduced substantially, thus increasing Q, with little change in inductance L and f sr CL TD SIM Prof. Dr. R. Liebmann May 3 rd 2003 Page 6 Characterization of on-chip inductors PDF created with FinePrint pdfFactory trial version http://www.fineprint.com

  7. Patterned Ground Shields From: Seong-Mo Yim, Tong Chen, Kenneth K.O., Bipolar/BiCMOS Circuits & Techn. Meeting, 2000 CL TD SIM Prof. Dr. R. Liebmann May 3 rd 2003 Page 7 Characterization of on-chip inductors PDF created with FinePrint pdfFactory trial version http://www.fineprint.com

  8. spiral inductor circuit models π -equivalent circuit for two-port network For inductors used differentially (i.e. not one side grounded), S-parameters transformed to Y, then inductance L is defined as from Bunch, IEEE Microwave magazine June 2002 general spiral inductor lumped circuit model,  1/Y 12  transformer models magnetically induced L = Im  ------  substrate eddy currents  2 π f  CL TD SIM Prof. Dr. R. Liebmann May 3 rd 2003 Page 8 Characterization of on-chip inductors PDF created with FinePrint pdfFactory trial version http://www.fineprint.com

  9. Optimization criteria Quality factor Q(f) measures ratio of maximum stored energy to energy loss during one cycle Q ∝ ω L / R coil for low frequencies Q = 0, ( ω sr ) 2 ∝ C / L at self-resonant frequency f sr : for differentially used inductors: Im(1/Y 12 ) Q = ________ Re(1/Y 12 ) CL TD SIM Prof. Dr. R. Liebmann May 3 rd 2003 Page 9 Characterization of on-chip inductors PDF created with FinePrint pdfFactory trial version http://www.fineprint.com

  10. effect of doping (substrate resistance) on Q(f) from www.stanford.edu/~narya Lower doping: increases substrate resistance, reduces eddy currents and loss CL TD SIM Prof. Dr. R. Liebmann May 3 rd 2003 Page 10 Characterization of on-chip inductors PDF created with FinePrint pdfFactory trial version http://www.fineprint.com

  11. Simulation with Ansoft / HFSS (I) Q11 25 20 500Ohmcm 18.5 Ohm-cm Remark: 15 Q Ansoft / HFSS 10 is a full 3D FEM Maxwell eq. solver 5 0 0.0E+00 2.0E+09 4.0E+09 6.0E+09 8.0E+09 1.0E+10 1.2E+10 1.4E+10 F[Hz] Internal report from R. Strasser, IFX (CL TD SIM) Influence of substrate resistivity CL TD SIM Prof. Dr. R. Liebmann May 3 rd 2003 Page 11 Characterization of on-chip inductors PDF created with FinePrint pdfFactory trial version http://www.fineprint.com

  12. Simulation with Ansoft / HFSS (II) Meas. 500 Ohm-cm 40 Meas. 18.5 Ohm-cm Sim. 1000 Ohm-cm 35 Sim. 500 Ohm-cm Sim. 18.5 Ohm-cm 30 1000 Ohm-cm, 25um M3 500 Ohm-cm,Si3N4 Ideal Q(L,Rs) 25 Q 20 15 10 5 0 0.0E+00 5.0E+09 1.0E+10 1.5E+10 F[Hz] Internal report from R. Strasser, IFX (CL TD SIM) Comparison simulation / experiment CL TD SIM Prof. Dr. R. Liebmann May 3 rd 2003 Page 12 Characterization of on-chip inductors PDF created with FinePrint pdfFactory trial version http://www.fineprint.com

  13. Simulation with Ansoft / HFSS (III) Internal report from R. Strasser, IFX (CL TD SIM) Current density at 2 GHz shows strong proximity effect CL TD SIM Prof. Dr. R. Liebmann May 3 rd 2003 Page 13 Characterization of on-chip inductors PDF created with FinePrint pdfFactory trial version http://www.fineprint.com

  14. Simulation with Ansoft / HFSS (IV) Internal report from R. Strasser, IFX (CL TD SIM) Relation between magnetic field and current density at 8 GHz. Current crowding at cental hole (left) is strongest. CL TD SIM Prof. Dr. R. Liebmann May 3 rd 2003 Page 14 Characterization of on-chip inductors PDF created with FinePrint pdfFactory trial version http://www.fineprint.com

  15. Final remarks some difficulties: • FEM solver needs considerable CPU time due to extremely small aspect ratio of typical on-chip inductors: width some 300 µ m, metal thickness 1 to 3 µ m (large mesh necessary) • simulation accuracy at high frequencies for high resistance substrates not yet satisfactory (not well understood), there also deembedding of the measured devices is difficult. big advantage (!): • simulation of on-chip inductors saves lots of time and money in development, good enough for optimization; only small final corrections are necessary CL TD SIM Prof. Dr. R. Liebmann May 3 rd 2003 Page 15 Characterization of on-chip inductors PDF created with FinePrint pdfFactory trial version http://www.fineprint.com

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