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slide-1
SLIDE 1

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SLIDE 2

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First reported in 2014.

  • T. Fujiwara, et al., IEEE NSS/MIC 2014

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Takeshi Fujiwara

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SLIDE 3

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  • Takeshi Fujiwara
slide-4
SLIDE 4

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  • 1. Glass Substrate
  • 2. UV exposure (1st_exp)
  • 4. Via etching

(Hydrogen Fluoride wet etching)

  • 3. Crystal formation

(heat treatment)

Crystal portion (Li2OSiO2) Photo Mask Via HF etching Cr sputter Grinder Metallize Cu (inside via also) Remove Cr in surface (remains in via)

  • 5. Poison Metallization
  • 6. Remove metal except in via
  • 7. Metallization process II (Cu)
  • 8. Selectively etch metal in via

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Takeshi Fujiwara

slide-5
SLIDE 5

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Etching machine UV exposure machine DC sputtering machine for Cr Laser microscope Plating machine DC sputtering machine for Cu Polishing machine

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Takeshi Fujiwara

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SLIDE 6

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Takeshi Fujiwara

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SLIDE 7

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Takeshi Fujiwara

slide-8
SLIDE 8

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8 Smooth electrode: Uniformity of the electric field improves, and the GEM’s stability improves

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Takeshi Fujiwara

slide-9
SLIDE 9

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Takeshi Fujiwara

9

  • Fig. 2 Gas gain curve

Operation voltage decreased from the past process Fig.1 Pulse height spectra of 5.9 keV Energy resolution 19%, gas gain 10,000

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slide-10
SLIDE 10

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electron multiplication in gas volume Gas scintillation

Gas molecular

X-ray

Ar + CF4 is known as a good scintillation gas. Firstly reported by Fraga in 1999[6]

Large amount of scintillation photons would be produced during Glass GEM’s high gain avalanche process

Gas scintillation can optically readout with CMOS camera

4000 3000 2000 1000

Intensity

800 700 600 500 400 300 200

Wavelength (nm)

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Takeshi Fujiwara

slide-11
SLIDE 11

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slide-12
SLIDE 12

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12

Outlook of the detector

Takeshi Fujiwara

slide-13
SLIDE 13
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Takeshi Fujiwara

13 Glass GEM (100×100mm) dark box Scintillating gas filled chamber X-ray tube

20 kV, 100 uA

CMOS Camera

10 sec integration

mirror Gas scintillation Rotating stage Object (a hornet)

  • DAQ and control PC

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slide-14
SLIDE 14
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14

Drift gap 5 mm Drift gap 1 mm

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Takeshi Fujiwara

slide-15
SLIDE 15
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▶ Reconstructed

with 360 X-ray images taken with Glass GEM

▶ 2 sec exposure time ▶ Took 20 minutes ▶ Filtered back projection method ▶ GEMs can easily amplify small

signals with gains of up to 104.

▶ This feature of GEMs is highly

advantageous for large-area soft- X-ray imaging.

Takeshi Fujiwara

16

slide-16
SLIDE 16

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Takeshi Fujiwara