Towards Research 4.0 ENRIS2019, University of Twente Christian - - PowerPoint PPT Presentation

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Towards Research 4.0

ENRIS2019, University of Twente

Christian Kjelde, Polyteknik AS

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• Polyteknik AS
• Flextura PVD Platform
• Towards research 4.0 (Material science and research)
• Research 4.0 as a term
• Case: Flextura Cluster system for University of Oslo

Outline

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We are a local company working globally

• Established in 1995 by Mr. Jens William Larsen
• State-of-the-art 2000m2 facility located close to

Aalborg, in the northern part of Denmark

• Class 1000 clean room
• Material characterisation lab for thin film analysis
• Highly qualified teams of scientists, process and

mechanical engineers (25-30 employee)

Denmark

Polyteknik AS

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Polyteknik AS Ferries to Norway Ferries to Sweden Aalborg - AAL airport to rest of world Copenhagen CPH Airport

We are a local company working globally

• Established in 1995 by Mr. Jens William Larsen
• State-of-the-art 2000m2 facility located close to

Aalborg, in the northern part of Denmark

• Class 1000 clean room
• Material characterisation lab for thin film analysis
• Highly qualified teams of scientists, process and

mechanical engineers (25-30 employee)

More than 20 years of excellence

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Business Areas

Design, Manufacture, Software Process, Service & Maintenaince Consumables & spare parts Coating service for general industry Coating development & Proof-of-concept Supply chain sourcing Accellerators & Syncrotrons Fusion Energy

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Tornado Discovery Flextura Cluster

Our standard PVD system platforms

Flextura Module

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FLEXTURA PVD – THE MOST FLEXIBLE 200mm PLATFORM

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PROCESS COMBINATIONS OF THE FLEXTURA PVD PLATFORM

Sputtering processes

• DC, pulsed DC, Bipolar, RF, HIPIMS
• Metals, alloys, oxides, nitrides.
• Epitaxial growth of thin films by sputtering

E-beam processes

• Generic E-beam configuration
• GLAD Glancing Angle Deposition – OAD Oblique Angle

Deposition

• High Rate Si deposition with 1000 °C substrate temperature
• Epitaxial growth of Si by E-beam deposition

Thermal processes

• Heating of substrates up to 1000 °C under deposition or as thermal

pre- or post processing

• Robotic handling of substrates with temperatures up to 500 °C

Organic deposition

• Low temp Knudsen cell type

Analysis/characterization

• RHEED
• UPS/ARUPS
• LEED

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WWW.POLYTEKNIK.COM Full-automatic single wafer processing via load lock Manual Loading Full-automatic processing cassette to casette

MODULARITY

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Our unique and user-friendly Cryosoft3 control software increases the quality, throughput and value

• f your research or production by full data logging and

recipe based deposition developments. The system is based on a strong Beckhoff PLC.  System can run in fully automatic or manual mode.  Software can contain up to 100 recipes.  Multi-layer programming integrated in the software.  Push-button in software for manual start of deposition, after automatic pump down cycles.  High up-time and user-friendly also with multiple users.  Remote access for system observation and control (vacuum pressure, valves, mass flow control, pumps, gas control, shutters, RF and DC generators, etc.

Polyteknik software - Cryosoft3

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A RGA provides an essential and valuable picture of the global gas composition within the process chamber. Software integrated feedback loop in Cryosoft3 utilise these data for:

• Base pressure quality control - Footprint
• In-situ dynamic regulation of process for stable and

repeatable depositions in reactive processes.

• Wide pressure working range up to 10-2 mbar range.

Used for process and quality control, fault detection.

RGA for process control

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Dynamic Plasma Emission Control

Dynamic reactive magnetron sputtering by integration

• f feedback for control of gas flow and power into our

Cryosoft3 control software to give:

• Stabile plasma composition
• Stabile deposition rate
• Stabile stoichiometry

EMICON MC system incl.

• spectrometer channels (1 per target)
• Spectral analysis software

Used for process and quality control, fault detection, plasma process diagnostics.

Precise controlled reactive sputtering with PEM

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System status, material consumption etc.

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Towards Research 4.0

Research 4.0

Open Science 4.0

Science 4.0

Research & Development 4.0

SMART RESEARCH!

Google: About 14.000.000 results Google: less than 200.000 results

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Towards Research 4.0

Ref: Prof. Dr. Dr. h.c. mult. August-Wilhelm Scheer, Scheer GmbH; AWS Institut für digitale Produkte und Prozesse, Saarbrücken

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Towards Research 4.0 (Material Science)

Source: Research and Development 4.0, PWC Strategy& analysis

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FLEXTURA PVD CLUSTER a research 4.0 enabler

University of Oslo – www.norfab.no Purpose: Epitaxial growth and analysis of semiconducting oxides First discussions started in 2016 Installed Q1 2019 Delivery time slightly above 1 year Specialities:

• +1000 °C substrate temperatures
• Thermal treatment with N2, O2, H2 and

”Metal” atmosphere

• Remote Plasma Sputtering
• DC,RF, HiPIMS (also with remote plasma)
• In-system analysis

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Remote plasma sputtering DC, RF, HiPIMS Substrate: 1000 °C <E-8 mbar Sputtering with PEM DC, RF, HiPIMS Substrate: 1000 °C <E-8 mbar Load lock, custom cassette 10 pcs and GB (detachable) Thermal pre/post treatment Substrate: 1000 °C <E-8 mbar Analysis/characterisation LEED & UPS/ARUPS Upgradeable with XPS <E-9 mbar Central Transfer Chamber Brooks MAG7S robot E-8 mbar

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Process and transfer modules

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Analysis Module

10 pcs carriers or wafers with a size of 100mm Fully automated substrate handling – x, rot, tilt Two analysis positions - LEED & UPS Base pressure < E-9mbar

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WWW.POLYTEKNIK.COM WHEN THIN FILM MATTERS 21 As an example:

• Load cassette of 10 or 25 samples in the load lock
• Apply individual process recipes for each sample
• The system is processing
• The system is data-logging the process
• The system is characterising
• Pick samples including extensive process datalogs

and characterisation data. Outcome:

• Increased R&D throughput, reliability, quality
• Smarter and faster research & development
• Fast process parameter scanning and tuning
• More reliable and repeatable experiments
• More time to plan, discuss, collaborate and interact

with colleagues and other research groups

• Bridging process development to volume production

Why research 4.0? Why automating research?

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THANK YOU! QUESTIONS?