Revealing shapes – particle morphology hints impurity rejection capability during API crystallization
Jochen Schöll
Technobis webinar on 24 SEP 2020
WAG
XLab
particle morphology hints impurity rejection capability during API - - PowerPoint PPT Presentation
Revealing shapes particle morphology hints impurity rejection capability during API crystallization Jochen Schll Technobis webinar on 24 SEP 2020 WAG XLab MSD Werthenstein BioPharma in Schachen Lucerne Medicine is for the people.
Jochen Schöll
Technobis webinar on 24 SEP 2020
WAG
XLab
3
“Medicine is for the people. It is not for the profits.” George W. Merck (1950)
4
Process:
5
and 3 ways to make most out of it: Miniaturization Parallelization Data-rich experimentation
6
Miniaturization Parallelization Data-rich experimentation
Unmilled API
7
(EtOAC → Toluene) successfully rejected impurities but failed controlling solid form
MeOH/Water was needed to control the crystal form
spiral jet milling yielded 1.5 kg API
Quantiles [µm] x10 1.4 x50 4.1 x90 8.1
Jet-milled API
Quantiles [µm] x10 40.2 x50 78.0 x90 152.6
8
Solvent Selection Average [mg/ml] Solvent Selection Average [mg/ml] Solvent Selection Average [mg/ml] Acetone 90.14 50:50 EtOH:H2O 0.46 2:1 DMF:H2O 8.24 MeCN 50.41 25:75 EtOH:H2O 0.06 1:1 DMF:H2O 1.10 EtOH 9.87 8:1 EtOH:H2O 10.20 1:1 DMF:MeOH
>100
H2O 0.00 2:1 EtOH:H2O 3.33 2:1 DMAc:H2O
9.06
Toluene 3.87 95:5 IPA:H2O 9.45 1:1 DMAc:H2O 0.91 THF >100 90:10 IPA:H2O 10.27 2:1 NMP:H2O
16.93
Heptane 0.00 80:20 IPA:H2O 9.01 1:1 NMP:H2O 1.38 IPAc
22.46
50:50 IPA:H2O 0.12 1:1 Toluene:MeOH 52.46 DMF >100 25:75 IPA:H2O 0.15 1:1 Toluene:MeCN
73.57
NMP >100 2:1 IPA:H2O 4.75 1:1 Toluene:EtOH
31.25
MeOH 17.95 8:1 IPA:H2O 10.61 1:1 Toluene:IPA 22.83 2-methylTHF 60.72 95:5 THF:H2O >100 1:1 IPAc:MeOH
37.36
DCM 49.77 90:10 THF:H2O >100 1:1 MeCN:EtOH 54.20 DMAc >100 80:20 THF:H2O >100 1:1 2-methylTHF:Heptane 1.40 DMSO >100 50:50 THF:H2O 0.69 1:1 THF:MTBE
32.77
EtOAc 49.83 25:75 THF:H2O 0.09 1:1 Toluene:MTBE 5.50 IPA 5.90 2:1 THF:H2O 36.07 1:1 IPAc:MTBE
13.46
MTBE 3.58 8:1 THF:H2O >100 1:1 IPA:MTBE
7.86
2-butanol 4.59 90:10 Acetone:H2O >100 2:1 Acetone:Water 60.48 MEtOAc 76.10 80:20 Acetone:H2O 0.11 1:1 Acetone:Water 15.85 n-propanol 6.85 50:50 Acetone:H2O 0.07 1:1 EtOH:Heptane 8.32 Hexane 0.00 25:75 Acetone:H2O 0.07 1:1 THF:Heptane 2.85 90:10 MeCN:H2O 68.43 2:1 Acetone:H2O 0.08 2:1 THF:Heptane 0.30 80:20 MeCN:H2O 45.79 8:1 Acetone:H2O 49.13 9:1 THF:Heptane 81.30 50:50 MeCN:H2O 0.84 95:5 MeOH:H2O 10.17 1:1 IPA:Heptane 3.63 25:75 MeCN:H2O 0.08 90:10 MeOH:H2O 8.75 1:1 Toluene:Heptane 0.37 95:5 EtOH:H2O 11.79 50:50 MeOH:H2O 0.17 2:1 IPAc:Heptane 7.81 90:10 EtOH:H2O 11.59 2:1 MeOH:H2O 0.98 1:1 IPAc:Heptane 3.01 80:20 EtOH:H2O 7.50 8:1 MeOH:H2O 8.74 1:1 MTBE:Heptane 0.22 1:1 DCM:Heptane 0.00
data provides a first set of potential solvent systems: ➢ Good solvents ➢ Good antisolvents ➢ Risky systems
9
systems successfully generated the desired Form 2 at lab scale
supersaturation control expected to yield desired form
Form 2 Form 1 EtOAc/Heptane MeCN/Water
10
Apolar solvent systems Polar solvent system
EtOAc/Heptane IPAc/Heptane MeCN/Water
11
Dichloromethane Ethanol
12
Apolar solvent systems Polar solvent system
EtOAc/Heptane 2-MeTHF/Heptane MeCN/Water EtOAc/Heptane 2MeTHF/Heptane MeCN/Water API purity 99.9% LCAP 99.9% LCAP <99.0% LCAP Form control X ✓ ✓ Color rejection insufficient insufficient insufficient
13
Yield ≈ 96 %
Cycle time ≈ 18 h
Form impurity (rods)
Temperature
14
Hot reactor walls induce “creeping”: Cool reactor walls avoid “creeping”, but still on probes & stirrer:
15
Pure API Crude API
Crystallization + Activated carbon
16
cost by 40x
due to improved impurity rejection
seed mass was compensated by extended seed age)
crystallization yield of +13%
Quantiles [µm] x10 1.4 x50 4.1 x90 8.1
Jet-milled API
17
reverse additions have been performed in MeCN/Water and EtOAc/Heptane API crystallization process
yielded mix of forms
seeded reverse addition
18
Thank you!
differences (lower aspect ratio correlates with higher purity)
allowed for an optimized process design regarding impurity rejection, form control, de-coloring, and process yield
Acknowledgements