Laser assisted micro/nanoscale material processing and in situ - - PowerPoint PPT Presentation

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Laser assisted micro/nanoscale material processing and in situ - - PowerPoint PPT Presentation

Laser assisted micro/nanoscale material processing and in situ diagnostics David J. Jae Seok Hwang 1 , Costas P. Grigoropoulos 2 1 Department of Mechanical Engineering, State University of New York, Stony Brook, NY, USA 2 Department of


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SLIDE 1

Laser‐assisted micro/nanoscale material processing and in‐situ diagnostics

David J. Jae‐Seok Hwang1, Costas P. Grigoropoulos2

1Department of Mechanical Engineering, State University of New York, Stony Brook, NY, USA 2Department of Mechanical Engineering, University of California, Berkeley, CA, USA

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SLIDE 2

Introduction to optical near-field

D.J. Hwang, S.G. Ryu, N. Misra, H.J. Jeon, and C.P. Grigoropoulos, Applied Physics A (2009). A.Chimmalgi, C. P. Grigoropoulos, and K. Komvopoulos, J. Appl. Phys. 97, 104319 (2005).

  • A. Chimmalgi, Choi, T.–Y., Grigoropoulos, C.P., and Komvopoulos, K., 2003, Applied Physics Letters, Vol. 82, pp. 1146–1148.

D.J. Hwang, Chimmalgi A., Grigoropoulos C. P., J. Appl. Phys. 99(4), 044905, 2006. C.P. Grigoropoulos, and D.J. Hwang, in Nanomanufacturing (Chapter 9), ed. by Chen, American Scientific Publishers, In-press, 2009. C.P. Grigoropoulos, A. Chimmalgi, D.J. Hwang, in Laser ablation and its applications (Chapter 19), Springer Series in optical sciences, New York, 2007. C.P. Grigoropoulos, D.J. Hwang, A. Chimmalgi, MRS Bulletin (32) January Issue. (2007).

Coupling of laser (light) illumination onto the sharp tip structures for sub-diffraction limit confinement Apertureless NSOM Apertured Fiber Coupled NSOM

Quartz Au (100nm thick) 1.56 m x (nm) 1.56 m

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SLIDE 3

Use of Microsphere Array as Array of NSOM Probe

Scalable Nanomanufacturing by Optical Near-Field

Collaboration with Prof. Bauerle, Univ. of Linz, Austria

 D.J. Hwang and C.P. Grigoropoulos, “Arbitrary pattern direct nanostructure fabrication methods and system,” US20110318695 A1 (2011)  H. Pan, D.J. Hwang, C.P. Grigoropoulos et. al., Small, 2010

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SLIDE 4

Laser Based Scalable Nanow ire Grow th

Nanofabrication by Tips coupled with Lasers

(Main PI: Prof. Grigoropoulos, UC Berkeley), Funded by Darpa, MTO

CVD Gases Laser Laser

Voltage Bias Tip Height Control (z)

  • Comb-drive
  • Piezoelectric

Piezo-Scanner Control (x-y)

Processing Scheme

Nanoindentation

  • Tunneling Current
  • Conductance
  • Electron Emission

(Laser Enhanced)

  • Photoluminescence
  • Electroluminescence

In-situ Monitoring Scheme

Optical lever sensing Piezoresistive sensing In-situ SEM & FIB Monitoring In-situ Repair & Sharpening of Worn Tips

Demonstrated Localized Si & Ge Nanowire Synthesis

Single catalyst Selectivity Heterogeneous growth

Metal-Organic Gas For catalyst Deposition Processing Laser Beam from side (Scheme A) Processing Laser Beam from top (Scheme B) Written Metal Catalysts

  • r Quantum dots

Parallel Processing Overall Configuration

Subsequent Nanowire Growth Metal-Organic Gas For catalyst Deposition Processing Laser Beam from side (Scheme A) Processing Laser Beam from top (Scheme B) Written Metal Catalysts

  • r Quantum dots

Parallel Processing Overall Configuration

Subsequent Nanowire Growth

Parallel Processing Overall Configuration

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SLIDE 5

Sintered / crystallized Ni NP’s Sample Optical near- field Probe

532nm

In-situ monitoring of laser processing in TEM

Optical near-field simulation Achievement of Single Crystal Si by in-situ laser crystallization in TEM In-situ laser sintering process

  • B. Xiang, D. J. Hwang, J. B. In, S.‐G. Ryu, J.‐H. Yoo, O. Dubon, A. M. Minor, and C. P. Grigoropoulos, "In Situ TEM Near‐Field Optical

Probing of Nanoscale Silicon Crystallization," Nano Letters, vol. 12, pp. 2524‐2529 (2012).

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SLIDE 6

Sub-diffraction limit feature by optical far-field

Selective protein adhesion spot by fs laser

peg (cell protecting) film on glass wafer (cell adhesive)

10µm

AFM images after laser process step Confocal microscope images

  • f adsorbed protein

H.J. Jeon, R. Schmidt, J.E. Barton, D.J. Hwang, L.J. Gamble, D.J. Castner, C.P. Grigoropoulos, and K.E. Healy, JACS 133(16), 6138 (2011)

 Sub-diffraction limit sized features

MPA process : Ik Laser spot (1/e2) Gaussian profile Processing threshold Feature size I

Sub-diffraction limit Feature size

Electron avalanche

Multi-Photon Absorption Process