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Development of low-temperature thick-film materials for - - PowerPoint PPT Presentation

Development of low-temperature thick-film materials for piezoresistive sensors C. Jacq, T. Maeder, S. Menot-Vionnet, and P. Ryser EPFL - LPM Lausanne, Switzerland lpmwww.epfl.ch August 29, 2005 Sintering 2005 Grenoble page : 1


slide-1
SLIDE 1

page : 1 Sintering 2005 – Grenoble August 29, 2005

Development of low-temperature thick-film materials for piezoresistive sensors

  • C. Jacq, T. Maeder, S. Menot-Vionnet, and P. Ryser

EPFL - LPM Lausanne, Switzerland lpmwww.epfl.ch

slide-2
SLIDE 2

page : 2 Sintering 2005 – Grenoble August 29, 2005

Objective High temperature thick-film system low temperature thick-film system

Substrate Dielectric Resistor

Conductor Conductor

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SLIDE 3

page : 3 Sintering 2005 – Grenoble August 29, 2005

Issues with low-temperature thick-films

Compatibility of thermal expansion Dielectric-resistor compatibility Adhesion Stability of the resulting circuits

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SLIDE 4

page : 4 Sintering 2005 – Grenoble August 29, 2005

3 Temperature Ranges

75% PbO + 10% B2O3 + 15% SiO2 + 2% Al2O3

System Firing Temperature

575…650°C 500…550°C 850°C Austenitic & ferritic steels Commercial dielectrics & Du 2041 resistor

85% PbO + 10% B2O3 + 5% SiO2 + 2% Al2O3

Dielectrics Based on V6 glass Dielectrics & Resistor Based on V8 glass Alumina, Austenitic & ferritic steels & ESL 3114 Resistor

slide-5
SLIDE 5

page : 5 Sintering 2005 – Grenoble August 29, 2005

TCE of tested Substrates

5 10 15 20

Austenitic steel 1.4435 Ferritic steel 1.4016 Alumina

(ppm/K)

slide-6
SLIDE 6

page : 6 Sintering 2005 – Grenoble August 29, 2005

Studied dielectric compositions

  • Steels

~12 ~500

40

~3

quartz

V8 V8Q40 ~7-8 ~7-8 ~10-11 ~8 ~9

TCE (ppm/K)

  • ~3

~1 ~1

Grain Size (µ m)

  • Alumina
  • Steels

850

  • (ESL

4916) +ESL 4924

  • Alumina
  • Steels

850

  • (ESL

4916) +Her GPA

  • Steels

~600

50 quartz

V6 V6Q50

. Steels

~600

40 Al2O3

V6 V6A40

  • Steels

~500

40 Al2O3

V8 V8A40

Substrate screen-printed Tf (°C) % filler powder Filler glass Deno- mination

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SLIDE 7

page : 7 Sintering 2005 – Grenoble August 29, 2005

Dielectrics & resistor Compositions

Dielectric composition Resistor composition

  • 400 nm
  • Firing temperature 500°C
slide-8
SLIDE 8

page : 8 Sintering 2005 – Grenoble August 29, 2005

Paste preparation

Mixing powder SiO2, B2O3, PbO, Al2O3 Milling, sieving of glass powder Mixing glass powder –filler powder Al2O3 or SiO2 powder Organic vehicle Mixing in the tri-cylinder Dielectric paste melting

slide-9
SLIDE 9

page : 9 Sintering 2005 – Grenoble August 29, 2005

Screen-printing sequence

Substrate Dielectric Resistor

Conductor Conductor

Basic structure

40µm

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SLIDE 10

page : 10 Sintering 2005 – Grenoble August 29, 2005

Samples for characterisation

TCR measurement Gauge Factor measurement

Longitudinal resistors Transverse resistors

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SLIDE 11

page : 11 Sintering 2005 – Grenoble August 29, 2005

Adhesion & Crack problems

Non adherence on non-oxidised substrates

Adhesion Crack problems Oxidation 1h @ 900°C Match TCE

slide-12
SLIDE 12

page : 12 Sintering 2005 – Grenoble August 29, 2005

Dissolution of SiO2 powder in glass

Effect on resistors…

glass + SiO2 SiO2 - rich glass SiO2 particles & low-temp. glass

625°C 600 °C Dissolution Temperature

  • f SiO2 (10% filled)

V6 glass V8 glass

slide-13
SLIDE 13

page : 13 Sintering 2005 – Grenoble August 29, 2005

Results: Alumina & Steel Substrates

Low Temperature range

Alumina V8 glass + 40% alumina on 1.4016 V8 glass + 40% alumina on 1.4435 V8 glass + 40% quartz on 1.4016 V8 glass + 40% quartz on 1.4435

20'000 40'000 60'000 80'000 100'000 120'000 140'000 160'000 500 525 550

Firing Temperature (°C) Sheet Resistance (Ohms)

  • 200
  • 150
  • 100
  • 50

500 525 550

Firing Temperature (°C) HTCR (ppm/K)

slide-14
SLIDE 14

page : 14 Sintering 2005 – Grenoble August 29, 2005

Intermediate Temperature range

5000 10000 15000 20000 25000 30000 35000 40000 45000

Dielectric Firing Temperature (°C)

Sheet Resistance (Ohms)

Alumina V6 glass + 40% alumina on 1.4016 V6 glass + 40% alumina on 1.4435 V6 glass + 50% quartz on 1.4016 V6 glass + 50% quartz on 1.4435

  • 225
  • 175
  • 125
  • 75
  • 25

25 75

Dielectric Firing Temperature (°C)

TCR (ppm/K)

575°C 600°C 575°C 575°C

Results: Alumina & Steel Substrates

slide-15
SLIDE 15

page : 15 Sintering 2005 – Grenoble August 29, 2005

High Temperature range

Alumina 1.4016 850°C 1.4435 850°C

5000 10000 15000 20000 25000 (alumina) GPA 98-029 4924

Dielectric

Sheet resistance (Ohms)

50 100 150 200 250 300 (alumina) GPA 98-029 4924

Dielectric

TCR (ppm/K)

Results: Alumina & Steel Substrates

slide-16
SLIDE 16

page : 16 Sintering 2005 – Grenoble August 29, 2005

6

  • 41

25.9 1.4435 6

  • 139

31.7

550

1.4016

12 V8Q40

  • 103

88.7 1.4435 6

  • 158

81.0

525 V8 Resistor

1.4016

9 V8A40

  • 124

26.1

575 ESL 3114

1.4016

8 V6A40

  • 178

24.9

600

1.4016

10-11 V6Q50

10.6 104 17.6 1.4016

  • 218

20.7 1.4435 38 19.9 Alumina

~7-8

ESL 4924 (+ ESL 4916 as under-layer on steel)

9.9 136 19.3 1.4016 1.4435 Alumina 1.4435 1.4435

Substrate

Her GPA (+ ESL 4916 as under-layer on steel)

Insulting Dielectric

850

System Firing Temp.(°C)

Du 2041

Resistor paste

~7-8

Dielectric TCE (ppm/K)

12.1 243 22.2 12.4 39 14.6

  • 53

39.8

  • 73

34.5

GF TCR (ppm/K) Sheet resistance (kOhms)

Electrical results

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SLIDE 17

page : 17 Sintering 2005 – Grenoble August 29, 2005

2 4 6 8 10 Alumina 1.4016 - V8A40 525°C 1.4016 - V8Q40 500°C 1.4016 - V8A40 525°C 1.4016 - V8A40 550°C 1.4435 - V8A40 525°C 1.4435 - V8Q40 500°C 1.4435 - V8A40 525°C 1.4435 - V8A40 550°C

Dielectrics

Gauge Factor

Transverse Longitudinal

Gauge factor results

Similar gauge factors

slide-18
SLIDE 18

page : 18 Sintering 2005 – Grenoble August 29, 2005

Conclusions

Dielectric – resistor chemical compatibility Very low processing temperature achieved Compatible with wide range of substrates Matching of thermal expansion is critical

slide-19
SLIDE 19

page : 19 Sintering 2005 – Grenoble August 29, 2005

CTE range: glass + SiO2

  • Little reaction: very wide range of CTE values possible

due to different forms of SiO2

  • Fully reacted: OK for alumina, float glass & Ti
slide-20
SLIDE 20

page : 20 Sintering 2005 – Grenoble August 29, 2005

Outlook

Fillers: improve stability and

reproducibility of dielectrics

Control of TCR of our resistors through

additives (CuO, NiO, TiO2, Sb2O3)

Materials without Pb or precious metals