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Advanced Large Area Deposition using Focused Beam Sources Surface Optics Corp SCCAVS May 15, 2012 Michael L. Fulton 1 Presentation Outline Introduction: Including a biographical synopsis Coating Processes: PVD and energetic (IAD)

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Advanced Large Area Deposition using Focused Beam Sources

Surface Optics Corp SCCAVS May 15, 2012 Michael L. Fulton

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Presentation Outline

 Introduction: Including a biographical

synopsis

 Coating Processes: PVD and energetic (IAD)  3.3 Meter Diameter Chamber  Kepler Primary Mirror Coating  Next Generation Large Chamber  Filtered Cathodic Arc

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Brief Biography

 Optical Coating Laboratory Inc. (OCLI): 1973 to 1989

– Process Engineering; First end-Hall ion source in production

 PSI Max Optics Inc. 1989 to 1990

– Developed DWDM coating system—OCA / Corning Prototype

 Boeing High Technology Center: 1990 to 1993

– World Record Space Solar Cell; IAD Development

 Avimo Singapore Ltd. 1993 to 1997

– Filter Cathodic Arc; IAD; Night Vision; Center of Excellence

 ZC&R Coatings for Optics Inc. 1997 to 2000

– High Out Put IAD; IFCAD; Space Station Window Program

 Rockwell Science Center 2000 to 2003

– Laser Eye Protection; Mars Reconnaissance Orbiter

 Ion Beam Optics Inc. 2003 to 2010

– SBIR Phase II Radiation Hardening of Space Solar Cell Covers

 Surface Optics Corp. 2010 to Present

– Kepler Primary Mirror; Band Pass Filters for Hyperspectral Imaging; Membrane filters for Space Antennaes

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SOC Chambers for Vacuum Deposited Coatings

Small R&D chamber (0.6 meter) 1.8 meter (roll-to-roll, or motion 5 meter (roll-to-roll, e-beam IAD) 3.3 meter (motion controlled e-beam IAD) 1.2 meter (Optical Controlled e-beam IAD) Monitoring, planetary) For Coating Development

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ISIS Surveillance Blimp Program: Thermal Control Coating

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Membrane Coatings

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Macro Filter Array for Hyperspectral Cameras

  • Mosaic of narrow bandpass filters
  • Vacuum deposit bandpass filters on wafer substrate
  • Dice to size
  • Assemble into mosaic filter array

Optical Filter Array, 16-Bands Filter Response Data

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High-Energy Deposition Techniques Offer Advantages

 Ion Assisted Deposition (IAD) e-beam / thermal  Plasma Assisted Deposition (PAD) Technology  Magnetron Sputtering  Improve the physical qualities of optical coatings: Densify microstructure Reduce defect density Produce stiochiometrically correct

compositions with stable optical properties – Index – Low k values

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SainTech Source: Ion-Assisted- Deposition (IAD)

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Ion Beam in Ion-Assisted-Deposition (IAD)

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Thornton Film Growth Model (1974)

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TiO2 PVD Film Deposited at 300o C.

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TiO2 IAD Film Deposited at 50o C.

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  • λ (nm)

n k

  • 300

2.85 .003

  • 400

2.76 .005

  • 500

2.55 .0003

  • 600

2.47

  • 700

2.42

  • 800

2.41

  • 1000

2.40

  • PVD Process = 2.35 @ 500nm

TiO2 Optical Constants using IAD

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TiO2 Optical Constants using IAD

Ion Beam Optics

10 20 30 40 50 60 70 80 90 100

400 450 500 550 600 650 700 750 800 850 900 950 1000

IAD TiO2 (Ambient) vs PVD TiO2 (300 deg. C.)

% Transmittance Wavelength (nm)

IAD PVD

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SiO2 IAD Film Deposited at 50o C.

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Al2O3 IAD Film Deposited at 50o C.

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Si3N4 IAD Film Deposited at 50o C.

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  • Temperature: Second Order Effect
  • Mechanical Properties: Improved Adhesion & Durability
  • Optical Performance: Refractive Index Stability
  • Manufacturing: Repeatability
  • Temperature Sensitive Substrates
  • Pulsed IAD: Fluoride Deposition at

Ambient Substrate Temperature

Ion Assisted Deposition Summary

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CloudSat (JPL)

SOC Heritage…Spaceflight Reflectors

WMAP (NASA-Goddard) Commercial Telecom Satellite (Boeing)

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Typical Reflector Requirements

2.8m CloudSat Primary Reflector Materials Aluminum, Silicon Oxide (SiOx or SiO2) Thickness 20,000Å +/- 2,000Å Size 1m < Diameter < 3m

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Satellite Program to Monitor Climate and Weather from Space

CLOUDSAT: CLIMATE SURVAYOR

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3.3m Diameter Vacuum Chamber Commissioned (2001)

Fixture Diameter - 120 inches

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Animation of motion system

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Moving Into Optical Coatings… NASA need: Space Qualified Silver

 Improvements in Thickness feedback and control  Ion Assisted Deposition (IAD) was added for greater material & process versatility

Reflectance R > 95%, 360nm to 2,000nm Stress Compatible w. lightweight substrate Space Environment Radiation, thermal cycling Ground Environment Humidity, T/C, cleaning, adhesion Size (dia.) Up to 2.5m, or multiple segments up to 1.5m

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 Design developed &

verified at LLNL.

 LLNL created nitride layers

by sputtering NiCr and Si in presence of N+ ions.

 SOC developed process to

produce nitride layers by

  • IAD. (SBIR funding)

 NiCrN highly absorbing in

blue/ UV. Want to apply minimum thickness only.

L-Oxide

Reflection Enhancement Layers

H-Oxide L-Oxide H-Oxide L-Oxide

Si3N4 Basic Protected Ag Ni-CrNx Ag Ni-CrNx Substrate

LLNL Protected Silver Design

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Why LLNL protection works?

 NiCrNx

– Prevents Ag from reaction with S+ – Promotes adhesion between Si3N4 and Ag

 Si3N4

– Protects Ag from S+ and other chemical attack – Protects Ag from O+ during oxide deposition

 SiO2/ Ta2O5 pairs

– Protect surface from scratching – Tailor to enhance reflectance in blue/ UV

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Effect of NiCrN thickness on Ag reflectance

  • Lower Reflectance
  • Greater Durability &

Adhesion

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LLNL Processing Challenges for Silver on Large Optics (Kepler)

 Precise deposition of 5Å of NiCrNx

difficult

  • ver large areas.

 N+ bombardment of NiCr to make NiCrNx

removes NiCr (had to compensate by adding extra NiCr to outer radial positions).

 Si3N4 easily contaminated with background

gas (requires exceptional vacuum). Need for UHV slows cycle time between runs.

 Si3N4 has high index that reduces Ag

reflectance.

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Processing Challenges for Large Optics (Kepler): Uniformity

 Deposition Uniformity of 5Å of NiCrNx

difficult over large areas: e-beam / IAD plume control a huge challenge

 Si3N4 uniformity was also a challenge; Ag

and the dielectrics were less troublesome

 General uniformity constraints: precision of

translation stage movement; confinement

  • f e-beam and resistance source plumes;

center position sensitivity; and process repeatability.

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Processing Challenges for Large Optics (Kepler): Uniformity

300 325 350 375 400 425 450 475 500 525 10 20 30 40 50 60 70 80 90

Radial Position (cm) Coating Thickness (nm)

Measured Thickness

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Processing Challenges for Large Optics (Kepler): Durability

 Durability requirements were driven primarily by

the terrestrial exposure prior to launch

 The humidity test consisted of a 24-hour

exposure at 50°C and 95% RH. The coating was thermally cycled 30 times from -80°C to + 35°C and the reflectance was measured before and after each exposure test. Following environmental exposures, the coating passed MIL-13508C adhesion and moderate abrasion tests.

 Protected Ag Coating with Five-Layer HL

Interference Coating; Passed Environmental Testing: Next Slide

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Processing Challenges for Large Optics (Kepler): Durability

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Processing Challenges for Large Optics (Kepler): Computer Control Improvements

 Old program ran on text files with relevant

automation data; new version includes ability to generate text files from an updateable material data base.

 Program allows coating to deposit from the

  • utside to inside (or, visa versa): thin layer rate

is more controlable when source is already on.

 Others: Limit switches for home and start

positions; run log file has overshoot data; computer control for translation stage stepper motor results in < 1% run-off across part.

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Kepler Mission

The Milky Way, showing our sun about 25,000 light years from the galaxy's centre. The yellow cone illustrates the region or 'starfield' in which Kepler hunts for habitable planets

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Kepler Spacecraft

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Discovery of First 5 Planets reported January, 2010

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Surface Optics Corporation Kepler Primary Mirror (1.4 m dia.)

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Surface Optics Corporation Kepler Primary Mirror

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Surface Optics Corporation Kepler Primary Mirror

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Surface Optics Corporation Kepler Primary Mirror

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Surface Optics Corporation Kepler Primary Mirror

10 20 30 40 50 60 70 80 90 100 300 400 500 600 700 800 900 1000

METAL HIGH REFLECTORS (KEPLER)

% Reflectance Wavelength (nm) Ag Kepler

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AR Window For NIF at LLNL

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Ta2O5 / SiO2 4 LAYER AR LLNL Completed on 5/27/10

0.0 0.5 1.0 1.5 2.0 2.5 3.0 3.5 4.0 4.5 5.0 400 450 500 550 600 650 700

AR on BK7 450 to 650nm

% Reflectance Wavelength (nm) 0 Deg. 30 Deg. BK7

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Ta2O5 / SiO2 4 LAYER AR

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Ta2O5 / SiO2 4 LAYER AR

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NEW 4-5 Meter Diameter Chamber

 Needed for Coating Larger Diameter Optical

Elements (Customer driven requirement)

 Multiple Depositions Platforms

  • 1. Multiple Sources: E-beam; Thermal; Ion

Assisted Deposition; Magnetron Sputtering; Filtered Cathodic Arc

  • 2. Designed to increase useable deposition

area

  • 3. Designed to increase deposition rate
  • 4. Designed to coating uniformity
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  • A low DC voltage-high

current supply is used to generate an arc on a water cooled target.

  • The arc vaporizes the target

material generating high energy ions, neutral atoms and particles.

  • The ions are steered by the

magnetic and electrical fields through a curved duct.

  • Particles and neutrals are

filtered by the non-line -of- sight path.

The Filtered Cathodic Arc Process

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  • The plasma beam is scanned at

the exit of the duct by an electromagnet.

  • Ions can be accelerated by a

substrate bias, permitting well adhered coatings

  • Deposition rate ~ 5 nm/s per in2

for carbon

  • The addition of an End-Hall

Ion Source to the Arc Process positively modifies the thin-film properties, increasing adhesion and converting the evaporation material to an oxide, nitride, etc.

  • Ambient Temperature Depositions

Ion-Assisted-Deposition (IAD)

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Freestanding 90° filter (A. Anders)

Freestanding coil ⇒ – High current required (e.g. arc current in series) – Openings allow macroparticles to leave the filter volume From: A. Anders,

  • Surf. & Coat.
  • Technol. 93 (1997)

158-167

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Freestanding S-filter (A. Anders)

 Here: arc source is operated with graphite cathode

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Ion-Assisted Filter Cathodic Arc Deposition (IFCAD)

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IFCAD: Front of Chamber with Control Panel

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IFCAD: Metal Arc Source with IAD Source: Movie

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IFCAD: Carbon Source Attached to Chamber

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IFCAD: Carbon Ion Beam Entering Chamber

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IFCAD: Chamber with Door Open: Drum View

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Amorphous-DLC Properties

Property Nat. Diam ond CVD DLC DLC ( a:CH) FCA ( t:aC) Hardness GPa 100 80 - 100 10 - 50 70 - 100 Density g/cm3 3.5 3.2 – 3.4 1.7 – 2.2 3.0 – 3.3 Friction Coeff. 0.1 0.1 (polished) 0.1 0.1 Film Roughness N/A 3μm Optically Smooth Optically Smooth Adhesion N/A Low Moderate High Process T oC N/A >600 20 – 325 20 - 150 Structure Crystalline Sp3Crystalline Sp3 Amorphous mostly Sp2 Amorphous mostly Sp3 Reactive Gas N/A Yes Yes None Transform T oC N/A >600 250 – 350 >500

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Optical Performance

20 40 60 80 100 200 300 400 500 600 700 800 900 1000

  • A-DLC (single layer) exhibits a sharp cut-off in the UV

Transmission (%) Wavelength (nm)

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IR Performance

  • A-DLC films are highly transparent in the long wavelength

region (1.5µm to 20µm) without any absorption peaks caused by C-H bonds (no hydrogen required during deposition)

Absorption Wavenumber (cm-1)

0.07 0.09 0.11 0.13 0.15 6500 5500 4500 3500 2500 1500 500

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  • Al2O3

clear film of high hardness

  • Ta2O5
  • ptical coating material (2.1n)
  • TiO2

high index optical coating material (>2.6 n)

  • AlN

purple decorative film

  • TiN

hard reddish gold wear resistant film

  • TiCN

dark gray and hard wearing

  • CrN

dull gray with low coefficient of friction

  • ZrN

brass colored film with good corrosion resistance

  • ITO

transparent conductive thin-film

  • C3N3

material exhibiting extreme hardness (potentially)

Other IFCAD Materials

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TiO2: Produced by Energetic Processes (P. Martin)

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TiO2: X-Ray Diffraction vs Substrate Bias Voltage (P. Martin)

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Out-of-Plane, Double-Bend Filter

 Out-of-plane S-filter from Nanyang

Technical University

 Commercial version:

– Hard Disk Drives – Reading Heads: – Samples

 Nanofilm Technologies

International Pte. Ltd.

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  • Lunar-Mars Proposal (January 14, 2004) CHANGED
  • Moon used as a Temporary Stop for Voyages to Mars
  • Lightweight Deployable Structures for Space Power
  • Space-Based Depositions for Large Area Telescopes
  • Lunar Vacuum: 5.0 X 10-13 Torr
  • Low Earth Orbit: Not Suitable for Metal Film

Depositions

  • (LEO) Atomic Oxygen Fluence: 2.3 X 1020 atoms/cm2
  • Filtered Cathodic Arc: Simple Process for High

Quality Thin-Film Deposition

Future Outlook for Space-Based Deposition Technology

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Light-Weight Pulsed CA Source

PULSED cathodic arc can readily be miniaturized, for example

as “microthruster,” used to correct the orbit of satellites

Use of low voltage and inductive energy storage 12-24 V input from solar panel bus system

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Weight Reduction of the Deposition System

 Weight of arc source, filter, and power

supply < 300 g (!)

 Vacuum is “free”  Cathodic arc does not need any process gas

~ 500 kg ~ 100 g

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  • No Free Lunch: the price of miniaturization is

relatively slow deposition speed for large areas. This is OK!

  • Robotic Control Design for In-Vacuum Large

Area Terrestrial Depositions—time of deposition is not a critical. Vacuum is Free in Space.

  • Design and Testing of miniaturized FCA source

with continuous source material feed: Teaming with LBNL to develop this enabling technology for future space missions.

  • NASA had announced plans to send man

missions to the far side of the moon: this technology could play a vital part in the future of space exploration.

Future Work on Space-Based FCAD Technology

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Technology will be best used on the Lunar Surface

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Mars Laser Communications Demonstration Project

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Mars Laser Communications Demonstration Project

10 20 30 40 50 60 70 80 90 100

400 600 800 1000 1200 1400 1600 1800 2000 2200 2400

NASA 3 Meter Chamber 1550-1570nm

% Transmittance Wavelength (nm)

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Large Area Reflector on Polymeric Substrates

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Thirty Meter Telescope Project

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Surface Optics Corp: Future Work

 SOC is continually developing coating capabilities

for advanced optical coatings on temperature- sensitive substrates and large scale optical applications.

 Uniformity across large area substrates is being

improved by upgrades in the computer control and thickness monitoring system for the translating deposition platform.

 Plans to Build an Even Larger Chamber (4-5 meter)

with more Powerful Deposition Capability: incorporating FCA and Sputtering

 SOC is working to improve the polymeric coating

process for new flexible space power systems.

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Surface Optics Corp.

Thank you for your attention! More inform ation available at: surfaceoptics.com and ionbeam optics.com Michael L. Fulton m fulton@surfaceoptics.com

  • R. “Sam ” Dum m er

sdum m er@surfaceoptics.com