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Principles of VLSI Design Technology CMPE 413/CMSC 711 ITRS International Technology Roadmap for Semiconductors The unique factor that has made the semiconductor industry successful: Decreases in feature size have provided improved


  1. Principles of VLSI Design Technology CMPE 413/CMSC 711 ITRS International Technology Roadmap for Semiconductors The unique factor that has made the semiconductor industry successful: “ Decreases in feature size have provided improved functionality at a reduced cost ”. Traditional scaling to Equivalent scaling : Traditional scaling is starting to be effected by fundamental limits of the materials constituting the building blocks of the planar CMOS process. • Extending the limit will be achieved through the assimilation of new materials for next 5-10 years. • New devices needed in 10-15 years (alternative to planar CMOS). Performance improvements of 2x every 2 years will be difficult to maintain. Need innovations in circuit and system design, particularly for Perfor- mance System-on-a-Chip ( P-SoC ): • Integration of multiple silicon technologies on same chip. • Closer integration of package and silicon technology. L A N R Y D UMBC A B M A L F T U M B C I O M Y O T R 1 (November 26, 2000 6:00 pm) I E S R C E O V U I N N U T Y 1 6 9 6

  2. Principles of VLSI Design Technology CMPE 413/CMSC 711 ITRS Feature scaling enables improvements to the following trends: Trend Example Functionality Nonvolatile memory Integration Level Components/chip (Moore’s Law) Compactness Components/cm 2 Speed Microprocessor clock Power Laptop or cell phone battery life Cost Cost-per-function (decreases at >25%/year. Most of these trends have been exponential. DRAM 1/2 pitches of six roadmap “technology nodes”: Year 1999 2002 2005 2008 2011 2014 Tech node 180 130 100 70 50 35 Each node is approximately 70% of the previous node. L A N R Y D UMBC A B M A L F T U M B C I O M Y O T R 2 (November 26, 2000 6:00 pm) I E S R C E O V U I N N U T Y 1 6 9 6

  3. Principles of VLSI Design Technology CMPE 413/CMSC 711 System-on-a-Chip (SoC): Often mixed-technology designs incorporating: • Embedded DRAM • High-performance or low-power logic • Analog components • RF components • Plus possibly Micro-ElectroMechanical Systems ( MEMS ) and optical input/output. For cost and time-to-market reasons, specific “programmable” SoC architec- tures will emerge and products will be developed from them. Software, FPGAs, Flash, etc. will be used to configure these programmable platforms. Hot research topics: Design tools are needed to assemble, verify and program them. L A N R Y D UMBC A B M A L F T U M B C I O M Y O T R 3 (November 26, 2000 6:00 pm) I E S R C E O V U I N N U T Y 1 6 9 6

  4. Principles of VLSI Design Technology CMPE 413/CMSC 711 Design and Test Complexity Issues Design complexity is increasing super-exponentially: • Increased density. • Increased number of transistors. • Increased design heterogeneity (SoC). • Increasing number of factors that design tools and methods must consider with smaller feature sizes and higher levels of integration. Design and test complexity issues: • Silicon complexity increased: With larger number of interacting devices and interconnects. With impact of new technologies. With impact of new logic families to meet performance goals. With effects of power and current requirements. • System complexity increased: With increased system size. Diversity of SoC design styles, integrated passive components and embedded software. L A N R Y D UMBC A B M A L F T U M B C I O M Y O T R 4 (November 26, 2000 6:00 pm) I E S R C E O V U I N N U T Y 1 6 9 6

  5. Principles of VLSI Design Technology CMPE 413/CMSC 711 Design and Test Complexity Issues Design and test complexity issues (cont.): • Design procedure complexity increased: With growing interaction between design levels. With difficulties in the predictability of the design process. With increases in size and dispersion of design teams. • Verification complexity increased: With need to validate core-based and mixed-technology designs, timing and function together. With the need to validate behavior at the system level. • Test complexity increased: With higher speeds. With higher levels of integration. With greater design heterogeneity. With reduced external access ( test-through-pins less viable). L A N R Y D UMBC A B M A L F T U M B C I O M Y O T R 5 (November 26, 2000 6:00 pm) I E S R C E O V U I N N U T Y 1 6 9 6

  6. Principles of VLSI Design Technology CMPE 413/CMSC 711 Test Issues Basic requirements: • High test reliability Lower yield loss and field failure rates (higher device quality). • Low test costs. New test requirements needed now (for technology > 100nm): • The ability to test for new failure modes, such as cross-talk induced fail- ures caused by high density interconnect. • Testing embedded mixed analog/digital circuits. • Use of Design-for-Test (DFT) for testing high-speed devices using both low-cost and low-speed testers. BIST offers potential solution for the latter two problems. L A N R Y D UMBC A B M A L F T U M B C I O M Y O T R 6 (November 26, 2000 6:00 pm) I E S R C E O V U I N N U T Y 1 6 9 6

  7. Principles of VLSI Design Technology CMPE 413/CMSC 711 Process Integration Issues: Further scaling of MOSFETs for higher performance and minimum variation in product specification may require: For technologies > 100nm: • Halo doping (as a channel formation technology). • High-mobility silicon-germanium epitaxial layer . For technologies < 50nm: • Novel switching devices such as quantum-dot or single-electron transis- tors. • New storage devices such as ferroelectric RAMs (FeRAMs) and MRAMs. For analog and mixed-signal devices, noise problems must be addressed for V DD s of 2.0-1.5V. L A N R Y D UMBC A B M A L F T U M B C I O M Y O T R 7 (November 26, 2000 6:00 pm) I E S R C E O V U I N N U T Y 1 6 9 6

  8. Principles of VLSI Design Technology CMPE 413/CMSC 711 Process Integration Issues: Other challenges include: • Building high capacitance structures Solution: high dielectric materials. • Minimizing parasitic capacitance: Solutions: • Low dielectric materials. • Copper interconnect. • SOI substrates. • 3-dimensional structures. For SoC: Mixing embedded memory, logic and analog circuit creates noise prob- lems that must be dealt with. Processes that support the large number of steps for mixed technology and provide excellent cost-performance are needed. L A N R Y D UMBC A B M A L F T U M B C I O M Y O T R 8 (November 26, 2000 6:00 pm) I E S R C E O V U I N N U T Y 1 6 9 6

  9. Principles of VLSI Design Technology CMPE 413/CMSC 711 Process Integration Issues: L A N R Y D UMBC A B M A L F T U M B C I O M Y O T R 9 (November 26, 2000 6:00 pm) I E S R C E O V U I N N U T Y 1 6 9 6

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