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Towards Zero Defects Outline 1. Introduction of Teknek 2. Line - PowerPoint PPT Presentation

Towards Zero Defects Outline 1. Introduction of Teknek 2. Line Cleaner 3. Ultra Clean Static control 4. Total Cleaning solution British ~Embassy Tokyo 2 2015 Who are we? Company formed 1984 Acquired by ITW (Illinois Tool Works)


  1. Towards Zero Defects

  2. Outline 1. Introduction of Teknek 2. Line Cleaner 3. Ultra Clean Static control 4. Total Cleaning solution British ~Embassy Tokyo 2 2015

  3. Who are we? • Company formed 1984 • Acquired by ITW (Illinois Tool Works) in July 2011. - $18billion sales • Inventors & world leaders in the manufacture & design of roller contact cleaning systems • Global footprint – sales and service across Europe, Asia and Americas • Over 20,000 machines manufactured and delivered to diverse range of industries • Produces its own cleaning rollers & adhesives – 10,000 cleaning rollers per year – Design and Produce in UK, adhesive centres in UK, USA & UK – Use around 1.2 million sq. metres of adhesive product per year British ~Embassy Tokyo 2015 3

  4. PPT 7 / 21 Contact Cleaning Technology The Teknek Cleaning Core British ~Embassy Tokyo 2015 4

  5. Example Sectors • PCB • Web – Flex and Rigid – Optical Films – HDI – Security Films – FCCL • PCBA – Plastic Electronics – Medical – Medical packaging – Auto – Ultra High Vacuum – Display • Display – Military – Consumer – BLU – TFT • Glass – TCO – Automotive – Architectural British ~Embassy Tokyo 2015 5

  6. Research Collaboration • Fraunhofer (Germany) – PEDOT cleaning • DuPont/Plastic Logic/Teknek – High Quality Surfaces for Displays • Holst Institute & Partners ‘Clean4Yield ’ – OPV/OLED defect removal – Cleaning in High Vavuum British ~Embassy Tokyo 6 2015

  7. Teknek Performance ⚫ Our solutions deliver:- ⚫ Particles removal from 5mm to 20nm ⚫ R2R cleaning up to 4 metres, at speeds up to 600mtrs/min ⚫ Sheet Cleaning as small as 15mm x 10mm and big as 2mtrs x 4mtrs ⚫ Cleaning substrates as thin as 9 micron. (R2R and Sheet) ⚫ Silicone Free cleaning solution ⚫ Certified for use in High Vacuum British ~Embassy Tokyo 7 2015

  8. New Focus • Other technologies to reduce defects and help our customers achieve zero defects British ~Embassy Tokyo 8 2015

  9. Major Causes of Defects – Contamination • Particles • Organic and other contamination – Surface Quality • Surface Energy • Adhesion – Scratches 9

  10. Big Picture • Substrate - Teknek Contact Cleaning • Environment – Clean rooms • PROCESS British ~Embassy Tokyo 10 2015

  11. INITIAL ANALYSIS 11

  12. Test Coating Line • Coating Lines – Many rollers – In accessible – Some rollers are hot – inside ovens – Hard to clean – High downtime to manually clean 12

  13. Testing • Test Location – Holst Centre, Holland – Coatema Coating Line , Slot Die – Coating PET Film with PEDOT and other combinations • Contamination Measurement – Particles collected from each roller with PMC (particle Measure Card), data taken from full face of rollers. – Particles counted using Partsens Particle Counter British ~Embassy Tokyo 13 2015

  14. Particle Measurement Card • Test Location – Holst Centre, Holland – Coatema Coating Line , Slot Die – Coating PET Film with PEDOT and other combinations • Process Roller Contamination Measurement – Particles collected from each roller with PMC (particle Measure Card), data taken from full face of rollers. – Particles counted using Partsens Particle Counter 14

  15. Initial Results • Substrate – Ave 3750 particles per m ² • Environment – Adds 260 particles per m² per pass • Process – Adds 1800 particles per m² per pass British ~Embassy Tokyo 15 2015

  16. PROCESS ROLLERS 16

  17. Process Rollers • Coating Lines – Many rollers – In accessible – Some rollers are hot – inside ovens – Hard to clean – High downtime to manually clean 17

  18. Cleanliness of Rollers British ~Embassy Tokyo 18 2015

  19. Impact of Cleaning British ~Embassy Tokyo 19 2015

  20. Roller to Film Correlation 20

  21. Roller Cleaning Solution • What is it? – Proven Teknek cleaning polymer produced as a sheet – Attached to the web – Travels down the web and cleans each roller – Removed at rewind – Cleaned and reused – lasts for around 1 month British ~Embassy Tokyo 21 2015

  22. How it works British ~Embassy Tokyo 22 2015

  23. Line Cleaner - Results • How effective is Teknek Line Cleaner? Location Uncleaned After PRC Cleaning sheet 6 F/S after Unwind 324 7 F/S after Corona 70 7 F/S under Coater 362 3 Nip roller 94 2 F/S after Splice 64 4 F/S before Rewind 81 2 23

  24. Summary • Process rollers get gradually contaminated • Contamination can transfer to the substrate • Cleaning the process rollers is essential • Elastomer cleaning is a proven concept • The new Line Cleaner is an easy, very cost effective way of reducing defects. British ~Embassy Tokyo 24 2015

  25. STATIC BARS 25

  26. Issues • Standard bars problems – Emitter Pins • Pins slowly erode and shed particles • Removes static but adds contamination – Field Strength • Gaps between emitter pins results in varying field strength • This causes striping on coating – Particularly with thin, low viscosity coatings 26

  27. Test Protocol • No.1 Pin based bars • Bar placed in HEPA chamber • Measure particles ≥10 -9 m • Particle count over time using Condensing Nucleus Counter • Measure regularly over 5 days • 4 bars – 2 x Standard pins Pulsed DC – 1 x Standard pins Pulsed AC – 1 x Single Crystal emitter pins- 5635 (ITW) • No.2 Wire based bar 5710 (ITW) • 6 months in HEPA Chamber • Laser Particle Counter ≥100 -9 m 27

  28. Results – Emitter Pins Particle Count Conventional Metallic Pin 62,495 Single Crystal Silicon Pin 195 28

  29. Results – Wire Bar 29

  30. Summary 1. Conventional bars emit many particles – Single Crystal bars meet ISO 14644 Class 1 Extended – ultra clean 2. Conventional emitter pin designs produce non linear fields across the web – Wire bar meets ISO 14644 Class 1- ultra clean – Does not cause striping 30

  31. TOTAL CLEANING

  32. Particle Issues • Major cause of coating defects • Can cause scratching of substrate • Affects functionality • Causes repeat defects at rewind British ~Embassy Tokyo 32 2015

  33. Organics Issues • Variation in wettability- over time and within a roll • Increasing issue for thin coatings • Increasing issue for low viscosity coatings • Organics can cause point delamination – – Pin holes • Medical applications – sterile is best • Removing biologicals is an advantage 33

  34. Total Cleen Functions • Three main functions – Cleaning , Organics and Particles • Surface contamination can affect contact angle – Activation • Creates reactive groups. Prepares surface for functionalisation – Functionalisation • Adding gases and pre cursors to modify surface chemistry 34

  35. Total Film Cleaning What is it? • In-line volume process • Sealed Chamber • Has Teknek at entry and exit of chamber – UTF™ at entry – High Particle Removal – Nanocleen™ at exit – High particle removal, Dyne Neutral • New O 2 free DDBD Plasma (Dual Dielectric Barrier Discharge) – Atmospheric – Low temperature – High controlled low gas consumption – Long life electrodes – Can add gases, precursors etc. 35

  36. Total Film Cleaning 36

  37. DDBD Process Atmospheric Plasma Discharge ( ) OH OH OH OH OH OH O OH O COOH O OH Virgin Polymer Film Surface Chemical Activation Surface Chemical Substrate Reaction Reaction ▪ Removal of weak (Specific) (Non specific) boundary layers. ▪ Generation/bonding ▪ Generation/bonding of ▪ Oxidation of uppermost of polar groups. polar groups. atomic layer ▪ Unspecific reactions ▪ Specific reactions ▪ Bond-breaking, cross- when only inert when defined reactive process gas used in process gases used in linking of surface presence of humid controlled molecules. air. atmosphere. Conventional Atmospheric PD Controlled Atmosphere PD 37

  38. TFC - Testing • Tests performed by Eastman – XPS performed by Material Interface Inc. • Substrate – Polyethylene – Contains fast migrating Oleamide, typical Film Additive • Measured Surface Chemistry with XPS – Before and after TFC • Measured Contact Angle across web width • DDBD Parameters – 43watt minutes/m 2 – 100% Nitrogen 38

  39. TFC – Test Results Sample Spectrum C N O Na S Cl K Ca 1 89.8 0.9 6.3 1.4 0.1 0.3 0.6 0.2 Bare PE 2 83.8 2.2 13 0.1 - - - - Treated PE Carbon as: Nitrogen as: Oxygen as: Sulfur as Cl as Ca as NO/ Ionic Na Ionic K Sulfate Chloride Carbonate Sample C-C, H C-O C=O O-C=O Organic Quarternary =O C-O Nitride Untreated PE 82.9 4.3 1.7 1 0.1 0.7 0.1 0 2.3 1.4 0.1 0.3 0.6 0.2 Treated PE 70.4 7.9 3.1 2.3 1.7 0.5 0.3 7.7 0.1 - - - - Analysis of Polyethylene Samples as Obtained by XPS. Data Normalized Atomic % of Elements Above Atomic Number 2 within 40Ǻ of the Surface • Change in Surface Chemistry indicates elimination of Oleamide 39

  40. TFC Test Results 2 Contact Angle - Cross (Transverse) Direction Sample Dynes/cm Zone 1 Zone 2 Zone 3 Zone 4 Zone 5 32 97° Untreated PE 97° 97° 98° 98° 44 50° Treated PE 50° 49° 50° 49° • Homogenous change across full web width • 50% reduction in Contact Angle 90 to 50 40

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