TEMPO: Fast Mask Topography Effect Modeling with Deep Learning Wei - PowerPoint PPT Presentation

TEMPO: Fast Mask Topography Effect Modeling with Deep Learning Wei Ye 1 , Mohamed Baker Alawieh 1 , Yuki Watanabe 2 , Shigeki Nojima 2 , Yibo Lin 3 , David Z. Pan 1 1 ECE Department, University of Texas at Austin 2 Kioxia Corporation 3 CS Department, Peking University

Bottleneck in IC Manufacturing: Lithography ⧫ Moore’s law brings increasing manufacturing cost and challenges ⧫ Need to make sure design is manufacturable with high yield Light source Design target Wafer Lens Photomask Projection lens What you see (at design) ≠ what you get (at fab) Wafer 2

Mask Topography Effects in Advanced Lithography Source Condenser Mask Pupils Near-field Near-field Lens Pupils Resist Aerial image Aerial image Substrate Thin mask approximation (Kirchhoff) Thick mask approximation 3

Aerial Image Generation Resist Post Optical model processing model Mask Layout Aerial Image Slicing Threshold Resist Pattern h = 120 nm Intensity h = 110 nm . . . Optical model y (thin/thick mask) h = 70 nm x h = 60 nm 2D aerial image at . . . certain resist height h = 10 nm h = 0 nm 4

Image-to-Image Translation Problems Semantic labeling [Long et al. 15’] Image colorization [Zhang et al. 16’] Boundary detection [Xie and Tu. 15’] Super-resolution [Johnson et al. 16’] Computer Graphics & Computer Vision & Computational Photography Machine Learning [“On Image-to-Image Translation”, Jun-Yan Zhu]

Image-to-Image Translation In Lithography Fake/Real ILT Generator Engine Discriminator GAN-OPC [Yang+, DAC’18] Real Diff Mask pattern Aerial image Threshold Resist pattern Contour Encoder Decoder Optical Resist . processing model model Fake Generator . LithoGAN Input LithoGAN [Ye+, DAC’19] GAN-SRAF [Alawieh+, DAC’19] These applications are all single-domain transfer 6

Cast as Multi-Domain Image-to-Image Translation ⧫ Facial image translation (facial attributes/expressions) › Bidirectional translation: original domain ⇔ target domain ⧫ Single mask pattern to multiple resist heights › Unidirectional translation: original domain ⇒ target domain Input h = 0 nm h = 10 nm h = 20 nm h = 90 nm h = 100 nm h = 110 nm h = 120 nm . . . 7

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