SLIDE 1
Single mask technology implementation Piotr Bielwka 10 th RD51 Stony - - PowerPoint PPT Presentation
Single mask technology implementation Piotr Bielwka 10 th RD51 Stony - - PowerPoint PPT Presentation
Single mask technology implementation Piotr Bielwka 10 th RD51 Stony Brook Single mask technology implementation a) New machinery: Old Kapton etching machine New Kapton etching machine 10 th RD51 Stony Brook Single mask technology
SLIDE 2
SLIDE 3
Old developing and etching set New developer New Cu etcher
10th RD51 Stony Brook
a) New machinery Single mask technology implementation
SLIDE 4
Current optic microscopes set. Additional optic microscope. Single mask technology implementation a) New machinery
10th RD51 Stony Brook
SLIDE 5
b) Preliminary „Single side” Kapton etching test : Problems caused by:
- Cleaning procedure
- High etching reagents concentration
Single mask technology implementation
10th RD51 Stony Brook
SLIDE 6
Single mask technology implementation Plans for future:
- Implementing a new set of PCB machines, dedicated
to single mask GEM technology – beginning of 2013.
- Automatization of electrical testing position
- Testing, tuning, work – until production starts