Single mask technology implementation Piotr Bielwka 10 th RD51 Stony - - PowerPoint PPT Presentation

single mask technology implementation piotr biel wka
SMART_READER_LITE
LIVE PREVIEW

Single mask technology implementation Piotr Bielwka 10 th RD51 Stony - - PowerPoint PPT Presentation

Single mask technology implementation Piotr Bielwka 10 th RD51 Stony Brook Single mask technology implementation a) New machinery: Old Kapton etching machine New Kapton etching machine 10 th RD51 Stony Brook Single mask technology


slide-1
SLIDE 1

Single mask technology implementation Piotr Bielówka

10th RD51 Stony Brook

slide-2
SLIDE 2

Single mask technology implementation a) New machinery: Old Kapton etching machine New Kapton etching machine

10th RD51 Stony Brook

slide-3
SLIDE 3

Old developing and etching set New developer New Cu etcher

10th RD51 Stony Brook

a) New machinery Single mask technology implementation

slide-4
SLIDE 4

Current optic microscopes set. Additional optic microscope. Single mask technology implementation a) New machinery

10th RD51 Stony Brook

slide-5
SLIDE 5

b) Preliminary „Single side” Kapton etching test : Problems caused by:

  • Cleaning procedure
  • High etching reagents concentration

Single mask technology implementation

10th RD51 Stony Brook

slide-6
SLIDE 6

Single mask technology implementation Plans for future:

  • Implementing a new set of PCB machines, dedicated

to single mask GEM technology – beginning of 2013.

  • Automatization of electrical testing position
  • Testing, tuning, work – until production starts

10th RD51 Stony Brook