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Study of efficiency and noise of fine pitch planar pixel detector for ATLAS ITk upgrade Koji Nakamura (KEK) On behalf of ATLAS Japan Pixel group and Hamamatsu Photonics K.K. 13th Dec 2019 Pixe 2018 1 Introduction High Luminosity LHC


  1. Study of efficiency and noise of fine pitch planar pixel detector for ATLAS ITk upgrade Koji Nakamura (KEK) On behalf of ATLAS Japan Pixel group and Hamamatsu Photonics K.K. 13th Dec 2019 Pixe 2018 1

  2. Introduction • High Luminosity LHC (HL-LHC) – Start around 2026- with new crab cavity in the interaction region. – Target : 𝒕 =14TeV L=5x10 34 𝑴𝒆𝒖 =3000fb -1 – Physics program focus the precise measurement of the Higgs coupling (e.g. Y τ , Y b and λ HHH ) and BSM searches. • Tracking detector is key element – To keep B/ τ -tagging performance up to μ =200 pileup in an event. – Mitigation for the pileup effect for MET calculation can be done by tracking from primary vertex. • Development of middle-outer pixel layer – Planar type Pixel detector (For ATLAS phase II upgrade : ITK pixel) – n+-in-p sensor with Pixel size : 50um x 50um (or 25um x 100um) – Radiation tolerance : up to 3x10 15 n eq /cm 2 Sensor performance of 50um x 50um planar pixel detector is presented. 13th Dec 2019 Pixe 2018 2

  3. Bias structure and efficiency loss Bump • For n+-in-p sensor, negative Poly-Si Bias-rail Al bias to backside and ground at all pixels. n + n+ e - SiO 2 • Need to set all pixels to ground P-stop h e - B h e - P-bulk h potential for testing I-V property before Bump bonding. Typical efficiency drop -V (Bias structure) Bias rail & bias resistor Punch through – Bias rail & bias resistor (BR) – Punch through (PT) • Two important feature – Higher noise observed for pixels with BR structure. – Typical Efficiency drop at under bias structure observed. K. Nakamura et al 2015 JINST 10 C06008 13th Dec 2019 Pixe 2018 3

  4. Available Read out ASICs • For sensor performance evaluation, used FE-I4, FE65p2 and RD53A. • FE65p2 is small prototype ASIC for RD53A and have lower noise than FE-I4. FE-I4 (2012) FE65p2 (2016) RD53A (Nov. 2017) ASIC demention 3mm 20mm 20mm 17mm 4mm 11.8mm CMOS process 130nm 65nm 65nm Pixel size 50um x 250um 50um x 50um 50um x 50um (25um x 500um) (25um x 100um) (25um x 100um) Pixel matrix 336 x 80 64 x 64 400 x 192 Max data output rate 160Mbps 160Mbps 1.28Gbps x 4 stable threshold ~1500 e - 500 e - 500 e - (2000-3000 e - ) (700 e - ) (typical threshold) 13th Dec 2019 Pixe 2018 4

  5. Available Read out ASICs • For sensor performance evaluation, used FE-I4, FE65p2 and RD53A. • FE65p2 is small prototype ASIC for RD53A and have lower noise than FE-I4. FE-I4 (2012) FE65p2 (2016) RD53A (Nov. 2017) ASIC demention 3mm 20mm 20mm 17mm 4mm 11.8mm CMOS process 130nm 65nm 65nm Pixel size 50um x 250um 50um x 50um 50um x 50um (25um x 500um) (25um x 100um) (25um x 100um) Pixel matrix 336 x 80 64 x 64 400 x 192 Max data output rate 160Mbps 160Mbps 1.28Gbps x 4 stable threshold ~1500 e - 500 e - 500 e - (2000-3000 e - ) (700 e - ) (typical threshold) 13th Dec 2019 Pixe 2018 5

  6. 6th sensor mask by HPK/KEK FE-I4/FE65p2 type RD53A type n+ p+ p+ P-bulk FE-I4/FE65p2 RD53A compatible Comment compatible n+ size (gap) 28um(22um) 39.5(10.5um)/31.5um(18.5um) To improve efficiency SiO2 over p-stop 400nm 400nm / 800nm To improve efficiency Poly-si resistivity 560k Ω 2.0M Ω (660K Ω -6M Ω ) Larger resistivity Al size (gap) 39.5um(10.5um) 45.5um(4.5um) / small Large/small C intpix SiO2 on Poly-Si 100nm 100nm / 500nm Smaller C polysi-Al 13th Dec 2019 Pixe 2018 6

  7. 6th sensor mask by HPK/KEK Reticle 44mm HPK 6 th mask Single chip sensor double chip sensor 10 (2type x 5) sensor / wafer 32 (4type x8) sensor / wafer 13th Dec 2019 Pixe 2018 7

  8. Irradiation Facility in Japan • CYRIC@Tohoku Univ. is a irradiation facility with 70MeV proton beam (~1 μ A). – This allows 5-6 pixel module with back Al plain at the same time(3% E loss/pixel). – Operated at -15 ℃ temprature with dry N 2 gas. • Programmable X- Y stage and “push - pull” mechanism are implemented to the machine. – choose one or a few target samples in max 15 pre-installed samples. • Scanning over full pixel range during irradiation. • Actual Fluence difference relative to the target fluence is within ~10%. Target Sample Evacuated Samples 13th Dec 2019 Pixe 2018 8

  9. Testbeam at CERN SPS H6A/B • To evaluate efficiency in pixel, performed testbeam before/after irradiation. – CERN H6 beam line • 120GeV pion beam • 7 testbeams in 2016-2018 at CERN (and Fermilab) – Typical CERN TB Irrad module • 6 layer of telescope • 3-5um pointing resolution • DUTs are in the cooling box tel3 tel4 tel5 tel0 tel1 tel2 HPK Reference RD53a 13th Dec 2019 Pixe 2018 9

  10. Noise increase by Biasing structure • Higher noise in the pixel with BR observed – Depends on the FE circuit • FE65p2 : 90e RD53A : 215e effect • Under investigation with chip designer. – Depends on resistivity of poly-si and capacitance between poly-si/Al 400x192 pix prototype First 65nm CMOS analog FE (RD53A) testing chip (FE65p2) ~36e Al Poly-si ~80e ~100e No BR ~230e No BR n+ p+ p+ w/ BR Bias -20V Large N+ w/ BR P-bulk 13th Dec 2019 Pixe 2018 10

  11. Noise measurement for RD53A module – Compared top Al size • Smaller Al have smaller noise Affected by Capacitance between Poly-si and Al STD Al Small Al No BR n+ n+ p+ p+ p+ w/ BR p+ Bias -20V P-bulk P-bulk 13th Dec 2019 Pixe 2018 11

  12. Noise measurement for RD53A module • SiO2 thickness comparison – Compared SiO2 thickness btw Poly-si and Al • Thicker SiO2 have smaller noise – Compared SiO2 thickness btw Poly-si and n+ • No visible difference Affected by Capacitance between Poly-si and Al SiO2 btw Poly-si and Al No BR n+ p+ w/ BR p+ Bias -20V SiO2 btw Poly-si and n+ P-bulk 13th Dec 2019 Pixe 2018 12

  13. Noise measurement for RD53A module • Poly-si resistivity comparison – Compare 0.67M Ω , 2M Ω , 6M Ω • Larger resistivity have smaller noise Highly affected by poli-si resistivity No BR w/ BR No bias supplied n+ p+ p+ Increase resistivity P-bulk 13th Dec 2019 Pixe 2018 13

  14. Noise measurement for RD53A module • Noise is affected by poly-si resistivity and capacitor btw poly- si and Al – Tested Smaller top Al & thicker SiO2 & higher poly-si resistivity • Indeed the condition is the best, resistivity is highest contribution 70e 170e n+ p+ p+ +150e by quadrature P-bulk 13th Dec 2019 Pixe 2018 14

  15. Poly-si resistivity after Irradiation • Measurement done using TEG with the same poly-si resister pattern. – Compared various sheet resister target wafers. – Tested 0.6M Ω , 2M Ω , 4M Ω , 6M Ω – Can achieve >5M Ω 16 Resistivity (M Ω ) Type7 6M Ω target Type7 6M Ω target 14 12 10 Type6 4M Ω target Type6 4M Ω target 8 6 Type1 2M Ω target 4 Type1 2M Ω target 2 Type5 0.6M Ω target Type5 0.6M Ω target 0 0 5E+15 1E+16 1.5E+16 1 1 5 5 6 6 7 7 Fluence [n eq /cm 2 ] 13th Dec 2019 Pixe 2018 15

  16. Noise measurement after irradiation • For default type : – Compared before and after irradiation • Smaller noise after irradiation due to high resistivity after 3x10 15 n eq /cm 2 irradiation n+ p+ p+ P-bulk 13th Dec 2019 Pixe 2018 16

  17. Efficiency loss due to charge sharing • Charge sharing effect – After proton irradiation, about 8k electron-hole 2ke 2ke pair created by ionizing loss of MIP particle in 150um thick sensor. 2ke 2ke – At the corner of pixel, charge is splitting to 4 e - pixels (2ke each). e - h e - h – Efficiency loss occur if the comparator threshold 8ke e - h h of readout ASIC is >2ke. – In case of 50um x 250um pixel efficiency loss Type2 : are ~1% to overall efficiency @ 2400e. w/ BR Structure(600V) • Finer pixel size (50um x 50um) – expected to 5 times larger effect than 50um x 250um pixels. – Lower noise ASICs than FE-I4 helped to improve efficiency i.e. FE65p2 and/or RD53A • No visible efficiency drop for FE65p2 but there was issue for the absolute value of efficiency K.Nakamur akamura et. al. NIM M A: doi.org/10. 0.10 1016/ 16/j.ni nima. ma.20 2018. 18.09 09.015 15 Tested RD53A modules 13th Dec 2019 Pixe 2018 17

  18. Efficiency results (non-irrad) • Results with 2000e thresholds. – Efficiency is over 99% for all types. • Still checking the proper mask has been applied. • No visible efficiency drop at the corner of pixel. – 20V is already enough voltage to have 99% efficiency. Default type Bias -100V Overall efficiency 13th Dec 2019 Pixe 2018 18

  19. Efficiency result (irrad 3x10 15 n eq /cm 2 ) • Efficiency results of HV scan 200-800V have been evaluated. – Analyzed both 1500e and 2400e threshold data for different types. – All types have over 98% efficiency at 600V. • 1500e threshold results have over 99% efficiency. • Small n+ w/ BR have low efficiency at 200V th2400 th1500 w/o BR Large n+ w/ BR Small n+ w/ BR n+ n+ p+ p+ p+ p+ P-bulk P-bulk 13th Dec 2019 Pixe 2018 19

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