- L. Pavesi
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Silicio nanocristallino: potenzialita’ e promesse
- L. Pavesi
Silicio nanocristallino: potenzialita e promesse L. Pavesi L. - - PowerPoint PPT Presentation
Silicio nanocristallino: potenzialita e promesse L. Pavesi L. Pavesi 28-11-10 Nanoscience Laboratory Oleksiy Anopchenko Minhaz Hossein(*) Stefano Prezioso (*) Zhizhong Yuan (Ryan) (*) Fabrizio Sgrignuoli Alessandro Marconi APP FBK
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Nanoscience Laboratory Oleksiy Anopchenko Minhaz Hossein(*) Stefano Prezioso (*) Zhizhong Yuan (Ryan) (*) Fabrizio Sgrignuoli Alessandro Marconi APP FBK Georg Pucker Yoann Jestin MTLab FBK Pierluigi Bellutti Lorenza Ferrario
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28-11-10 “Courtesy of the National Renewable Energy Laboratory, Golden, Colorado.
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Solar Cells 2010 Market Share Estimate
0% 10% 20% 30% 40% 50% Type Market Share
SEMI PV Group March 2009 from source Yole Development
>90%
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– Broad spectral absorption range – High carrier mobility
– Most of photon energy is wasted as heat – Require expensive manufacturing technologies
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– Amorphous silicon – Polycrystalline silicon
– Cadmium Telluride (CdTe)
– Low material cost – Reduced mass
– Toxic material (Cd), – Scarce material (Te)
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qV
Lattice thermalisation loss
Junction loss Recombination loss Contact loss Sub bandgap loss
Energy
Sub bandgap and Lattice thermalisation losses acount for more than
50% of the total loss
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Photon electron energy conversion 32.9% Unabsorbed energy loss 18.7% Heat loss 46.8% Other losses 1.6%
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"Energy & Nano" - Top Master Symposium in Nanoscience 2009
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"Energy & Nano" - Top Master Symposium in Nanoscience 2009
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2
Si gap gap
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1. Abundant and nontoxic 2. CMOS fabrication compatible 3. Band gap adjustable and higher than that of Si
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550 650 750 850 950
PDS-1 PDS-2
PL intensity (a.u.) Wavelength (nm) (c) (a) (b)
400 500 600 700
25 50
Absorbance (%) 2E
Si g
1 10
PL intensity (a.u.)
Monitoring PL band at 800 nm
Stokes shift between absorption and emission
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SiO2
Si-nc
p-Si n-Si
Hole
F-N tunneling Direct tunneling BH
IDD
BH: Barrier height IDD: Inter-dot distance
n-Si p-Si D 1.Reduce D 2.Improve
wave function
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28-11-10 Fowler-Nordheim Tunneling Direct Tunneling Position
>3V <3V Energy Position Oxide nc-Si
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1 2 3 1E-10 1E-9 1E-8 1E-7 1E-6 1E-5 1E-4 1E-3 0,01
Current Density (A/cm
2)
Electric Field (MV/cm)
Single layer = large current Multilayer= large field Larger Electric Field to achieve the same Current Density, i.e. reduced the leakage current
Single layer Multilayer
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Increase of EL due to more effective injection into the Si-nc
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1 2 3
Electric Field (MV/cm)
10 10
1
10
2
10
3
10
4
10
5
Elettroluminescence density (a.u.)
Single layer Multilayer Same injected current
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10
10
10
1 10
1
0.01 0.1 1
(2 nm SiO2 / 3 nm SRO) Graded energy gap (2 nm SiO2 / 4 nm SRO)
Optical power density (W / cm
2)
Current density (mA / cm
2)
10
10
10
1
0.0 0.1 0.2 Power efficiency (%) Current density (mA / cm
2)
Active Si-NC n-type poly- silicon 100 nm p-type silicon wafer +
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Bulk band alignments between crystallinc silicon and its carbide, nitride and oxide.
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adjacent Si-ncs.
*
Si Si Si Si Si Si
SiO2 Si3N4 SiC The wave function of an electron confined to a spherical dot penetrates into the surrounding materials, decaying approximately as exp(-r/Ld)/r, where r is the distance from the centre of the dot.
Ld, decay length.
Matrix SiO2 Si3N4 SiC ∆E(Si-Matrix) 3.2 eV 1.9 eV 0.5 eV m0 0.86 0.05-0.13 0.24
Inter-dot distance for significant wavefunction overlap: 1-2 nm for SiO2 and 4 nm fro SiC
Eun-Chel Cho, et al., Advances in Optoelectronics. 2007, 1-11
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400 500 600 700 800 1E-4 1E-3 0.01 Q2-SRO/SiO2=3/1 Q7-SRN/SiO2=3/1 Q8-SRO/Si3N4=3/1 Q9-SRN/Si3N4=3/1
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"Energy & Nano" - Top Master Symposium in Nanoscience 2009
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"Energy & Nano" - Top Master Symposium in Nanoscience 2009
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"Energy & Nano" - Top Master Symposium in Nanoscience 2009
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Schematic of three-cell and two-cell tandem solar cell with an Si bottom cell.
Eun-Chel Cho, et al., Advances in Optoelectronics. 2007, 1-11
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Ryan, Anopchenko, Marconi – APP FBK
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Silicon nanocrystals Ryan, Anopchenko, Marconi – APP FBK
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300 400 500 600 700 800 900 0,1 1
1 2
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Ryan, Anopchenko, Marconi – APP FBK
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400 500 600 700 0.0 0.2 0.4 0.6 0.8 1.0 Optical function Wavelength (nm) TSRO RSRO ASRO
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400 500 600 700 0.0 0.2 0.4 0.6 0.8 1.0 Optical function Wavelength (nm) TSRO RSRO ASRO 0.0 0.1 0.2 0.3 Photoresponsivity (A/W) PR PRARC (b) PDS-2
PL+ARC
PR
ARC
PR
ARC
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A maximum enhancement of the internal quantum efficiency of 14%
400 500 600 700 0.0 0.2 0.4 0.6 0.8 1.0 Optical function Wavelength (nm) TSRO RSRO ASRO 0.0 0.1 0.2 0.3 Photoresponsivity (A/W) Internal quantum efficiency enhancement PR PRARC INT (b) PDS-2
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Ryan, Anopchenko, Marconi – APP FBK - Minhaz
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Al (1%Si) 500 nm P-type Si substrate Si-rich Oxide 50 nm SiO2 (TEOS) 120 nm LPCVD Si3N4 50 nm n-type Poly-Si 30 nm Al (1%Si) 500 nm LOCOS 500 nm LOCOS 500 nm Al (1%Si) 500 nm Ryan, Anopchenko, Marconi – APP FBK - Minhaz
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Al (1%Si) 500 nm P-type Si substrate Si-rich Oxide 50 nm SiO2 (TEOS) 120 nm LPCVD Si3N4 50 nm n-type Poly-Si 30 nm Al (1%Si) 500 nm LOCOS 500 nm LOCOS 500 nm Al (1%Si) 500 nm absorption Ryan, Anopchenko, Marconi – APP FBK - Minhaz
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Al (1%Si) 500 nm P-type Si substrate Si-rich Oxide 50 nm SiO2 (TEOS) 120 nm LPCVD Si3N4 50 nm n-type Poly-Si 30 nm Al (1%Si) 500 nm LOCOS 500 nm LOCOS 500 nm Al (1%Si) 500 nm absorption multiplication Ryan, Anopchenko, Marconi – APP FBK - Minhaz
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400 600 800 1000 0.0 0.5 1.0 1.5 2.0 2.5
1400 1500 1600 0.5 1.0 1.5 2.0 2.5
Below the band gap of both Si and nc-Si Nitrogen related states
* at the reverse bias of 5 V
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0.2 0.4 0.6 0.8 1.0
dark 1310 nm, 6 mW
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0.0 0.5 1.0
> 1200 nm
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0.0 0.5 1.0 Voc= 500 mV
633 nm 488 nm > 1200 nm
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0.0 0.5 1.0 Voc= 500 mV
633 nm + 1200 nm 488 nm + 1200 nm > 1200 nm
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0.0 0.5 1.0 Voc= 500 mV
633 nm + 1200 nm 488 nm + 1200 nm > 1200 nm
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Secondary carrier generation Ryan, Anopchenko, Marconi – APP FBK - Minhaz
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0.0 0.2 0.4 1E-12 1E-11 1E-10 1E-9 1E-8 1E-7 1E-6 1E-5 1E-4
SRO/SiO2 SRO a-Si/SiO2
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400 500 600 700 800 10
10
10
Q1(SRO/SiO2=2nm/1nm) Q2(SRO/SiO2=3nm/1nm) Q3(SRO) Q5(-Si/SiO2=3nm/1nm) Q7(SRN/SiO2=3nm/1nm)
Photoresponsivity (A/W) Wavelength (nm)
Q5
between 400 and 470 nm (due to enhanced absorption of nanostructures).
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0.00 0.05 0.10 0.15 0.20 1 2 3 4 5 6 7
3.4 A 120 mV FF: 30.2 Isc: 6 ± 1 A Voc: 220 ± 1 mV Pmax: 40.8 W/cm
2
Rserial = 23.6 kΩ Rshunt = 51.2 kΩ Rserial = 6.41 kΩ Rshunt = 54.1 kΩ Lambert W function Conversion efficiency 0.41 %
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