prototype for It-fab Lorenza Ferrario, FBK and It-fab Summary - - PowerPoint PPT Presentation

How to support the access of new users in distributed research infrastructures: a first prototype for It-fab

Lorenza Ferrario, FBK and It-fab

• It-fab – outline of the ENL Italian network
• Building the It-fab technology and know-how repository
• Virtual access to It-fab – a demo tool

Summary

• Data management according to FAIR principles
• Conclusions and future work

Italian network implementing the ENL Italian node

Microfabrication 0.8 micron “CMOS like” cleanroom, 500 sq. meters Si-MEMS cleanroom, 100 sq. meters package area Nanofabrication by e- beam lithography Testing Electrical and functional (optic, gas, solar efficiency) on wafer testing, manual and automatic probes Material characterization SIMS ToF-SIMS PTR-MS XPS XRD, XRF SEM+EDX AFM RAMAN

Strengthening Nanofabrication – FESR investments ISO 9001-9015 Certification

The Micro and Nano Facility FBK

http://mnf.fbk.eu http://cmm.fbk.eu

RF-MEMS Microheaters (for gas sensing) Microresonators

Devices developed at MNF

Silicon Photomultipliers Single and Double Side Microstrip

• Several thousands of sqm of cleanrooms
• Advanced sensor and material technologies
• Excellence in nanomaterials, analysis, characterization
• Several hundreds of users: reserachers, technicians,

Students, PhDs, post-doc, ERCs

• ENL benchmarking: in progress
• Interaction with RTOs, Universities and Companies

(i) establishment of harmonized rules, for clean room management and access policies, IP rules, external costs and reporting; (ii) harmonization and sharing of design and simulation software, service contracts, management of professional services; (iii) definition of joint best practices for reciprocal support and backup, complementarities, standardization of clean room practices, interoperability and data exchange formats; (iv) definition of common information system for know-how, projects and equipment databases;

Acting as an attractive open research infrastructure, coherent with ENL aims

• Let people know what It-fab can do
• Access rules, tariffs
• Training schema (safety, quality)
• Supporting users during process requirement

definition

• Better communication and coordination among

partners

Management execution system

Management execution system

external users Optimized decisions about new equipment Resources DB: Technology Equipment Access and training policies Tariffs Processing: Sensor process flow It-fab partners Temporary backup

Some interactions with It-fab

A single It-fab entry point  Structuring questions and answers  pre-processing users requests  addressing the requests according to Information sharing Personal contacts web pages Schools, conferences, workshops

Technology Equipment Materials Processes State of the resources Policies Access rules costs ISO class Compatibility rules

Information groups

Relational DB prototype

Equipment DB Material DB Access Policies Query tool DB direct access Laboratories DB Operation required: Adding/removing/patterning/mea suring/thermal process Starting from: Blank wafer/Processed wafer/Other item (sample, wafer quarter,…) Item history: what seen before? What on the top?

It-fab virtual infrastructure In progress sw tool

DEMO

DEMO

DEMO

DEMO

DEMO

DEMO

DEMO

DEMO

DEMO

AppProcessComposer

Fab

Deposition Processes Modification Processes

Lithographics Mask

emulator

FAIR , OpenData, OpenScience Findable Accessible Interoperable Reusable FAIR principles

• Associated to unique identifier
• Well structured
• Findable by common and open protocols – http, ftp
• Consistent
• Suited to reuse, and machine processing
• …..

http://www.go-fair.org

Protein archives

http://www.uniprot.org/uniprot/P98161

URI

An exampple: XML equipment description

equipmentId equipmentName processGroup handling forbiddenMaterials furtherInformation state decontaminationProcedures parameters P001L001E003 RTP atmospheric thermal process 4 Au,Cu,Fe,Na,K https://www.bo.imm.cnr.it/unit/articles/clean-room 1 none P001L002E001 Alcatel DRIE DRIE 4 Au,Cu,Fe,Na,K https://www.bo.imm.cnr.it/unit/articles/clean-room 1 ashing P002L001E001 AMS200 DRIE DRIE 6 Au,Cu,Fe,Na,K https://mnf.fbk.eu/infrastructure Available gases: O2, SF6, C4F8, CH4, Ar Pressure ~10E-2 mbar Flows: O2 0-200 sccm; C4F8 0-400sccm; SF6 0-1000 sccm; He 0-200sccm, Ar 0-200 sccm, N2 0-1000 sccm, CH40-100 sccm Source generator 0-3000 W Bias power 0-300 W Chuck temperature -12 - +20 ºC P002L001E002 Tegal903 plasma sample,4,6 https://mnf.fbk.eu/infrastructure 0 chamber and handling cleaning P002L001E003 SPTS PECVD plasma sample,4,6 https://mnf.fbk.eu/infrastructure 1 chamber and handling cleaning P002L001E004 Eclispe MRC IV PVD 6 Au,Cu,Fe,Na,K https://mnf.fbk.eu/infrastructure 1 P002L001E005 Centrotherm OX3 atmospheric thermal process 4,6 Au,Cu,Fe,Na,K https://mnf.fbk.eu/infrastructure 1 P002L001E006 Centrotherm LPCVD TEOS LPCVD 4,6 Au,Cu,Fe,Na,K https://mnf.fbk.eu/infrastructure 1 P002L001E007 Track SVG 8600 coating and developing 6 https://mnf.fbk.eu/infrastructure 2

Table format

<it-fabDB xmlsl=https://www.it-fab.org/equipment/….> <id> P002L001E001</id> <equipment> <equipmentUniqueId>P002L001E001</ equipmentUniqueId > <equipmentName>AMS200 DRIE</equipmentName> <equipmentProcessGroup>DRIE</equipmentProcessGroup> <equipmentHandling>6</equipmentHandling> <forbiddenMaterials>Au,Cu,K</forbiddenMaterials> <exendedInfo>mnf.fbk.eu</extendedInfo> <equipmentState>1</equipmentState> <equipmentCleaningProcedures>ashing</equipmentCleaningProcedure> <equipmentParameters> <processGas>O2, SF6, C4F8, CH4, Ar</processGas> <chamberPressure unit=”mBar”> 10e-2</chamberPressure> <sourceGeneratorPowerMin unit=”W”>0</sourceGeneratorPowerMin> <sourceGeneratorPowerMax unit=”W”>3000</sourceGeneratorPowerMax> <biasPowerMin unit=”W”>0</biasPowerMin> <biasPowerMax unit=”W”>300</biasPowerMax> <chuckTemperatureMin unit=”oC”>-12</chuckTemperatureMin> <chuckTemperatureMax unit=”oC”>20</chuckTemperatureMax> </equipmentParameters> </equipment>

Conclusions Future work on the virtual process sw:

• Keep developing: adding etching, doping and patterning

to the process validators

• Enhancing the checking algorithms to better address

process flow building

• Further work on the FAIR data analysis

It-fab as Open RI Documentation and tools to enable more and better use of the infrastructure Feedback and inputs from outside It-fab

Thanks for your attention!

Lorenza Ferrario, ferrario@fbk.eu