MTLE-6120: Advanced Electronic Properties of Materials Semiconductor p-n junction diodes
Reading:
◮ Kasap 6.1 - 6.5, 6.9 - 6.12
MTLE-6120: Advanced Electronic Properties of Materials Semiconductor - - PowerPoint PPT Presentation
1 MTLE-6120: Advanced Electronic Properties of Materials Semiconductor p-n junction diodes Reading: Kasap 6.1 - 6.5, 6.9 - 6.12 2 Metal-semiconductor contact potential p -type n -type p -type n -type Same semiconductor on both sides,
◮ Kasap 6.1 - 6.5, 6.9 - 6.12
◮ Same semiconductor on both sides, different doping ◮ Bands line up perfectly, but Fermi level does not ◮ Bands bend to line up Fermi level ◮ Equal doping Na = Nd ⇒ symmetric bending ◮ In general, contact potential shared between both sides ◮ Extreme limits: one side p+ or n+, ∼ Schottky junction
◮ Far from junction, EF = EF 0
◮ Approaching junction, EF first deviates ∼ kBT from EF 0:
◮ Once EF more than few kBT away from EF 0 (towards center of gap):
◮ Across junction, EF has to cross almost entire gap ≫ kBT ◮ Therefore, depleted width ≫ width where Debye screening applicable ◮ Assume ρ = +eNd for width wn on n-side,
◮ Neutrality of junction ⇒
◮ Solve for electric filed using ∇ ·
◮ Solving from left, E(x) = −eNa(wp + x)/ǫ for x > −wp (0 otherwise) ◮ Solving from right, E(x) = −eNd(wn − x)/ǫ for x < wn (0 otherwise) ◮ Peak field E(0) = −eNawp/ǫ = −eNdwn/ǫ ◮ Solve for potential using ∇φ = φ′(x)ˆ
2ǫ
eNaw2
p
2ǫ
2ǫ
p-type n-type p-type n-type p-type n-type
◮ Total width w0 ≡ wp + wn; Nawp = Ndwn ⇒ wp = w0Nd Na+Nd , wn = w0Na Na+Nd ◮ Total potential across region:
p
n)
◮ But total potential is the contact potential:
i ◮ Therefore depletion region width:
i ◮ When will depletion region width be set by λD?
◮ Barriers for e− from n → p and holes from p → n: e(V0 − V ) ◮ Corresponding ‘diffusion’ current: j2 exp −e(V0−V ) kBT ◮ Junction field drives ‘drift current’: j1 ◮ Must be balanced at V = 0 ⇒ j1 = j2 exp −eV0 kBT ≡ j0 ◮ Therefore j = j0
eV kBT − 1
◮ So far IV -characteristics exactly like Schottky diode ◮ For Schottky diode, we found j0 ∝ exp −ΦB kBT
◮ For pn-junction diode at zero bias: equal drift and diffusion currents = j0 ◮ Minority carrier diffusion current driven by concentration gradient ◮ In uniform n-semiconductor ˙
◮ In non-uniform semiconductor: ˙
◮ Therefore in steady-state: Dh∇2p = (p − p0)/τ ⇒
◮ Diffusion current jh = −eDhp′(x) ∼ eDhp0 Lh
i
LhNd ◮ Total minority diffusion current
i
i
◮ Therefore current significant for V > Eg/e
p-type n-type ◮ In n-depletion region, potential changes from neutral value by
◮ Assume symmetric doping, potential changes by (V0 − V )/2 ◮ Hole concentration at junction
◮ Hole recombination rate ∼ pM τh · wn 2 (averaged over region)
◮ Current due to recombination of both e and h:
◮ Previous IV accounted for e and h transport separately, but not this
◮ Net current density therefore:
◮ Ideal diode: no recombination ⇒ η = 1
◮ Space charge layer generation
◮ Reverse bias increases junction potential ◮ Higher field in space charge layer (depletion region) ◮ e and h in equilibrium: thermal generation vs recombination ◮ Field sweeps carriers away before they recombine ⇒ current ◮ Linearly increasing reverse current instead of saturated −j0
◮ Avalanche breakdown
◮ Depletion region: large field, few carriers ◮ If eEλ > Eg, carriers can excite additional e-h pairs ◮ Cascade process leading to sudden increase in current
◮ Zener breakdown
◮ Highly doped junctions ⇒ narrow depletion regions ◮ Potential larger than Eg: direct band-to-band tunneling ◮ Design sharp breakdown at specific potential (Zener diodes)
◮ Charge stored = eNawp = eNdwn = ew0NaNd/(Na + Nd) (per unit area) ◮ Substituting for width of depletion region:
◮ Therefore differential capacitance:
◮ Typical value for Si, Na = Nd = 1017 cm3, C ∼ 0.1 µF/cm2 p-type n-type p-type n-type p-type n-type
◮ Basic design: just a p-n junction, but in direct band-gap material ◮ Current density → recombination near junction ◮ Fraction of recombination is radiative ⇒ light ◮ Spontaneous emission: light is incoherent and in random direction ◮ Efficiency: η = Plight/(IV ) (can be > 10% for direct semiconductors) ◮ Typically use asymmetric junctions: pn+ or np+: why?
◮ Minimum photon energy: Eg ◮ Peak photon energy ∼ Eg + kBT ◮ Spectral width ∼ 3kBT ◮ Due to distribution of both hole and electron energies ◮ For GaAs, Eg = 1.42 eV, λ = 870 nm (IR) ◮ ∆(hc/λ) ∼ 0.08 eV ⇒ ∆λ ∼ 50 nm ◮ Light emitted by LED can be absorbed by semiconductor ◮ Circumvent in hetero-junction LEDs
◮ Very similar to LED at the junction level ◮ Key difference: optical cavity using reflecting surfaces ◮ Start with spontaneous emission, sharpened by cavity resonance ◮ Stimulated emission builds up intensity in specific mode ◮ Require population inversion: e-h pairs waiting to recombine ◮ Population inversion achieved by bias: electrical pumping! ◮ Cavity resonance + laser amplification, ∆λ ∼ 0.1 nm ≪ kBT
◮ LED in reverse? ◮ Not quite, can use indirect band gap materials ◮ Absorption still occurs right at band gap (how?) ◮ eh-pairs created in depletion region swept across by field ◮ Loss: recombination (radiative or non-radiative) ◮ Modified device characteristic
◮ Photodiode: operated in reverse bias: why?