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Electro ElectroScan Scan
Electro Scan Electro Scan Environmental Scanning Electron - - PowerPoint PPT Presentation
Electro Scan Electro Scan Electro Scan Electro Scan Environmental Scanning Electron Environmental Scanning Electron Microscopes Microscopes 1 1 Seeing Things Youve Never Seeing Things Youve Never Seen Before Seen Before Electro
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Electro ElectroScan Scan
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Uncoated Silicon Nitride Uncoated Silicon Nitride Dissolving Table Salt Dissolving Table Salt Living Aphid Living Aphid Oxidizing Iron 800º C Oxidizing Iron 800º C Crystallizing KCL 600º C Crystallizing KCL 600º C Oil and Water Droplets Oil and Water Droplets
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Mechanical Pump High Vacuum Pump Electron Source Wehnelt Anode Condenser Lenses Objective Aperture Scan Coils Objective Lens Sample Display CRT Magnification Control Detector Scan Signals Image Signal Sample Chamber Gun Chamber Mechanical Pump High Vacuum Pump Electron Source Wehnelt Anode Condenser Lenses Objective Aperture Scan Coils Objective Lens Sample Display CRT Magnification Control Detector Scan Signals Image Signal Sample Chamber Gun Chamber Mechanical Pump High Vacuum Pump Electron Source Wehnelt Anode Condenser Lenses Objective Aperture Scan Coils Objective Lens Sample Display CRT Magnification Control Detector Scan Signals Image Signal Sample Chamber Gun Chamber
An SEM forms an image by scanning a finely An SEM forms an image by scanning a finely focused beam of electrons over the sample surface. focused beam of electrons over the sample surface.
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Cathodoluminescence (light) Auger electrons Backscattered electrons Characteristic X-rays Bremsstrahlung Secondary electrons Primary beam Heat Elastically scattered electrons Transmitted electrons Specimen current X-rays Cathodoluminescence (light) Auger electrons Backscattered electrons Characteristic X-rays Bremsstrahlung Secondary electrons Primary beam Heat Elastically scattered electrons Transmitted electrons Specimen current X-rays Cathodoluminescence (light) Auger electrons Backscattered electrons Characteristic X-rays Bremsstrahlung Secondary electrons Primary beam Heat Elastically scattered electrons Transmitted electrons Specimen current X-rays
The beam electrons generate a variety of signals as they interact with sample atoms. The beam electrons generate a variety of signals as they interact with sample atoms.
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Electron Source (Crossover) Condenser Lens Objective Lens Aperture Image of Source Sample Image of Source Divergence Increased Excluded by Aperture (further demagnified) (demagnified) Divergence
Chromatic Aberration Spherical Aberration
Minimum Spot Size Slower electrons focus closer to lens wider angles Electrons at focus closer to lens
Column Optics Lens Aberrations
Electron Source (Crossover) Condenser Lens Objective Lens Aperture Image of Source Sample Image of Source Divergence Increased Excluded by Aperture (further demagnified) (demagnified) Divergence
Chromatic Aberration Spherical Aberration
Minimum Spot Size Slower electrons focus closer to lens wider angles Electrons at focus closer to lens
Column Optics Lens Aberrations
Electron Source (Crossover) Condenser Lens Objective Lens Aperture Image of Source Sample Image of Source Divergence Increased Excluded by Aperture (further demagnified) (demagnified) Divergence
Chromatic Aberration Spherical Aberration
Minimum Spot Size Slower electrons focus closer to lens wider angles Electrons at focus closer to lens
Column Optics Lens Aberrations
The electron optics of the column are designed to demagnify the image of the electron The electron optics of the column are designed to demagnify the image of the electron source, forming the smallest possible spot on the sample surface. source, forming the smallest possible spot on the sample surface. Lens aberrations limit the demagnification. Lens aberrations limit the demagnification.
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Convergence Angle Spot Diameter Convergence Angle Spot Diameter Convergence Angle Spot Diameter
SEM resolution is ultimately limited by the diameter of the spot SEM resolution is ultimately limited by the diameter of the spot formed by the beam on the sample surface. formed by the beam on the sample surface.
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backscattered electrons Source of Source of Source of electron-excited characteristic X-rays Primary electron beam Sample secondary electrons backscattered electrons Source of Source of Source of electron-excited characteristic X-rays Primary electron beam Sample secondary electrons backscattered electrons Source of Source of Source of electron-excited characteristic X-rays Primary electron beam Sample secondary electrons
Beam electrons generate signals throughout a region Beam electrons generate signals throughout a region known as the Volume of Interaction known as the Volume of Interaction
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Gold on Carbon Gold on Carbon Toner Toner Tungsten Carbide Tungsten Carbide
Resolution is dependent on sample type as well as signal type. Resolution is dependent on sample type as well as signal type.
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Electron Beam Plane of Best Sample surface Region in Effective Focus Focus Depth of Field Electron Beam Plane of Best Sample surface Region in Effective Focus Focus Depth of Field Electron Beam Plane of Best Sample surface Region in Effective Focus Focus Depth of Field
The small convergence angle of the beam in an SEM yields excellent depth of field. The small convergence angle of the beam in an SEM yields excellent depth of field.
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Inner Shell Electron Primary Electron Outer Shell Electron X-ray Photon M Line Lines L K Lines α β α α β γ Inner Shell Electron Primary Electron Outer Shell Electron X-ray Photon M Line Lines L K Lines α β α α β γ Inner Shell Electron Primary Electron Outer Shell Electron X-ray Photon M Line Lines L K Lines α β α α β γ
The energy of a characteristic X-ray is determined by The energy of a characteristic X-ray is determined by the atomic structure of the emitting element. the atomic structure of the emitting element.
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An X-ray spectrum shows the intensity of X-ray emissions An X-ray spectrum shows the intensity of X-ray emissions from various elements present in the sample. from various elements present in the sample.
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X-ray maps can show the spatial distribution of elements in the sample. X-ray maps can show the spatial distribution of elements in the sample.
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Wehnelt Cathode voltage (e.g. -30 kV) Wehnelt voltage (e.g -30.5 kV) Anode (0 V) Electron "crossover" electrons Filament Wehnelt Cathode voltage (e.g. -30 kV) Wehnelt voltage (e.g -30.5 kV) Anode (0 V) Electron "crossover" electrons Filament Wehnelt Cathode voltage (e.g. -30 kV) Wehnelt voltage (e.g -30.5 kV) Anode (0 V) Electron "crossover" electrons Filament
The high voltages used in an electron gun require a high vacuum. The high voltages used in an electron gun require a high vacuum.
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Electron Beam Collector grid Scintillator Light guide Photo-multiplier Secondary electrons (+300 V) (+12 kV) Secondary Electron Signal Out Electron Beam Collector grid Scintillator Light guide Photo-multiplier Secondary electrons (+300 V) (+12 kV) Secondary Electron Signal Out Electron Beam Collector grid Scintillator Light guide Photo-multiplier Secondary electrons (+300 V) (+12 kV) Secondary Electron Signal Out
The high voltages used in a conventional secondary electron detector The high voltages used in a conventional secondary electron detector require a high vacuum in the sample chamber. require a high vacuum in the sample chamber.
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Nonuniform Charge Balance Nonuniform Charge Balance at 1.7 kV at 1.7 kV Typical Charging Artifacts Typical Charging Artifacts at 20 kV at 20 kV
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Sample Chamber Gun Chamber High Vacuum Pump Mechanical Pump 10 Torr
Sample Chamber Gun Chamber High Vacuum Pump Mechanical Pump 10 Torr
Sample Chamber Gun Chamber High Vacuum Pump Mechanical Pump 10 Torr
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Manual Valve
G4 G1 G2 V2 V5 G3 V4 V3 V13 G5 V7 V8
Regulator Valve
V10 V9 V11
Auxiliary Gas Vent
V6 G7 Dif 1 Dif 2 RP1 RP2 RP3 V1 V12
Vent Water Vapor
Gauge Valve
Ion Pump
Sample Chamber 10 Torr EC1 10 Torr
EC2 10 Torr
Column 10 Torr
Gun Chamber 10 Torr
Manual Valve
G4 G1 G2 V2 V5 G3 V4 V3 V13 G5 V7 V8
Regulator Valve
V10 V9 V11
Auxiliary Gas Vent
V6 G7 Dif 1 Dif 2 RP1 RP2 RP3 V1 V12
Vent Water Vapor
Gauge Valve
Ion Pump
Sample Chamber 10 Torr EC1 10 Torr
EC2 10 Torr
Column 10 Torr
Gun Chamber 10 Torr
Manual Valve
G4 G1 G2 V2 V5 G3 V4 V3 V13 G5 V7 V8
Regulator Valve
V10 V9 V11
Auxiliary Gas Vent
V6 G7 Dif 1 Dif 2 RP1 RP2 RP3 V1 V12
Vent Water Vapor
Gauge Valve
Ion Pump
Sample Chamber 10 Torr EC1 10 Torr
EC2 10 Torr
Column 10 Torr
Gun Chamber 10 Torr
In the ESEM Multiple Pressure Limiting Apertures separate In the ESEM Multiple Pressure Limiting Apertures separate the column vacuum from the sample environment. the column vacuum from the sample environment.
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PLA 1 PLA 2
10 Torr 10 Torr
10 Torr
10 Torr
PLA 1 PLA 2
10 Torr 10 Torr
10 Torr
10 Torr
PLA 1 PLA 2
10 Torr 10 Torr
10 Torr
10 Torr
Multiple PLAs permit larger aperture diameters and shorter gas path lengths. Multiple PLAs permit larger aperture diameters and shorter gas path lengths.
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Minimal Scattering Scatter < 5% m < 0.05 Partial Scattering 5% to 95% Scatter m from = 0.05 to 3.0 Complete Scattering Scatter >95% m > 3.0 Minimal Scattering Scatter < 5% m < 0.05 Partial Scattering 5% to 95% Scatter m from = 0.05 to 3.0 Complete Scattering Scatter >95% m > 3.0 Minimal Scattering Scatter < 5% m < 0.05 Partial Scattering 5% to 95% Scatter m from = 0.05 to 3.0 Complete Scattering Scatter >95% m > 3.0
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Average Number of Scattering Events = 0.05
10 20 30 40 50 60 70 80 90 100 1 2 3 4 5 6 7 8 9 10
Number of Scattering Events % Probability
Average Number of Scattering Events = 0.7
10 20 30 40 50 60 70 80 90 100 1 2 3 4 5 6 7 8 9 10
Number of Scattering Events % Probability
Average Number of Scattering Events = 3
10 20 30 40 50 60 70 80 90 100 1 2 3 4 5 6 7 8 9 10
Number of Scattering Events % Probability
Average Number of Scattering Events = 0.05
10 20 30 40 50 60 70 80 90 100 1 2 3 4 5 6 7 8 9 10
Number of Scattering Events % Probability
Average Number of Scattering Events = 0.7
10 20 30 40 50 60 70 80 90 100 1 2 3 4 5 6 7 8 9 10
Number of Scattering Events % Probability
Average Number of Scattering Events = 3
10 20 30 40 50 60 70 80 90 100 1 2 3 4 5 6 7 8 9 10
Number of Scattering Events % Probability
Average Number of Scattering Events = 0.05
10 20 30 40 50 60 70 80 90 100 1 2 3 4 5 6 7 8 9 10
Number of Scattering Events % Probability
Average Number of Scattering Events = 0.7
10 20 30 40 50 60 70 80 90 100 1 2 3 4 5 6 7 8 9 10
Number of Scattering Events % Probability
Average Number of Scattering Events = 3
10 20 30 40 50 60 70 80 90 100 1 2 3 4 5 6 7 8 9 10
Number of Scattering Events % Probability
Even when the average number of scattering events is relatively high, Even when the average number of scattering events is relatively high, some fraction of electrons reach the sample without being scattered at all some fraction of electrons reach the sample without being scattered at all
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Minimal Scattering Regime Partial Scattering Regime Complete Scattering Regime Minimal Scattering Regime Partial Scattering Regime Complete Scattering Regime Minimal Scattering Regime Partial Scattering Regime Complete Scattering Regime
In the partial scattering regime, unscattered electrons remain focused In the partial scattering regime, unscattered electrons remain focused within the original spot on the sample surface. within the original spot on the sample surface.
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Environmental Environmental High Vacuum High Vacuum A gaseous environment does not necessarily degrade image resolution. A gaseous environment does not necessarily degrade image resolution.
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Beam Loss due to gas dispersion (at 20kV)
1% 10% 100% 5 10 15 20 25 30
Path length from Pressure Limiting Aperture to the sample (mm) Useful Imaging Beam Current
50%
10 Torr 5 Torr 2 Torr 1 Torr 0.5 Torr 0.2 Torr
Beam Loss due to gas dispersion (at 20kV)
1% 10% 100% 5 10 15 20 25 30
Path length from Pressure Limiting Aperture to the sample (mm) Useful Imaging Beam Current
50%
10 Torr 5 Torr 2 Torr 1 Torr 0.5 Torr 0.2 Torr
Beam Loss due to gas dispersion (at 20kV)
1% 10% 100% 5 10 15 20 25 30
Path length from Pressure Limiting Aperture to the sample (mm) Useful Imaging Beam Current
50%
10 Torr 5 Torr 2 Torr 1 Torr 0.5 Torr 0.2 Torr
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V + V
A
Gas Molecules Positive Ions Electrons
V + V
A
Gas Molecules Positive Ions Electrons
V + V
A
Gas Molecules Positive Ions Electrons
The ESD uses the gas in the environment to amplify the secondary electron signal The ESD uses the gas in the environment to amplify the secondary electron signal
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BSE Type III SE SE Objective Lens Insulator High Voltage Collection Electrode PLA1
ESD
Gas Tight Seal SE BSE Type III SE BSE Suppressor Electrode Suppressor Electrode Detector Ring
GSED
SE
SE BSE Type III SE SE Objective Lens Insulator High Voltage Collection Electrode PLA1
ESD
Gas Tight Seal SE BSE Type III SE BSE Suppressor Electrode Suppressor Electrode Detector Ring
GSED
SE
SE BSE Type III SE SE Objective Lens Insulator High Voltage Collection Electrode PLA1
ESD
Gas Tight Seal SE BSE Type III SE BSE Suppressor Electrode Suppressor Electrode Detector Ring
GSED
SE
SE
The GSED offers improved discrimination against BSEs and parasitic SEs The GSED offers improved discrimination against BSEs and parasitic SEs
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The improved signal discrimination of the GSED enhances image quality. The improved signal discrimination of the GSED enhances image quality.
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Gas ions, generated by the ESD and the beam, suppress charging artifacts. Gas ions, generated by the ESD and the beam, suppress charging artifacts.
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X-rays BSE BSE SE 15mm 10mm 5mm 20mm BGPL 30
X-rays BSE BSE SE 15mm 10mm 5mm 20mm BGPL 30
X-rays BSE BSE SE 15mm 10mm 5mm 20mm BGPL 30
A special version of the ESD permits efficient X-ray collection A special version of the ESD permits efficient X-ray collection while preserving a short beam gas path length. while preserving a short beam gas path length.
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20 kV 20 kV 1 kV 1 kV Accelerating Voltage Accelerating Voltage
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ESEM ESEM 5.0 Torr 5.0 Torr FE Gun FE Gun 15 kV 15 kV GSED GSED ESEM ESEM 4.9 Torr 4.9 Torr LaB6 Gun LaB6 Gun 20 kV 20 kV GSED GSED CSEM CSEM Hi Vac Hi Vac FE Gun FE Gun 2 kV 2 kV ETD ETD LV-CSEM LV-CSEM 1.4 Torr 1.4 Torr LaB6 Gun LaB6 Gun 20 kV 20 kV BSED BSED
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Vacuum in Torr
10 to 10
0.1 1 10 100 4.6 Torr (minimum for liquid water) 50 0.2 0.5 2 5 20
Secondary and Backscattered Electron Imaging
(1 Torr = 133 Pascal = 1.33 mBar)
Backscattered Imaging Only
ESEM LV-CSEM CSEM
SE and BSE SE and BSE SE and BSE
Vacuum in Torr
10 to 10
0.1 1 10 100 4.6 Torr (minimum for liquid water) 50 0.2 0.5 2 5 20
Secondary and Backscattered Electron Imaging
(1 Torr = 133 Pascal = 1.33 mBar)
Backscattered Imaging Only
ESEM LV-CSEM CSEM
SE and BSE SE and BSE SE and BSE
Vacuum in Torr
10 to 10
0.1 1 10 100 4.6 Torr (minimum for liquid water) 50 0.2 0.5 2 5 20
Secondary and Backscattered Electron Imaging
(1 Torr = 133 Pascal = 1.33 mBar)
Backscattered Imaging Only
ESEM LV-CSEM CSEM
SE and BSE SE and BSE SE and BSE
Only the ESEM offers secondary imaging in a low vacuum environment. Only the ESEM offers secondary imaging in a low vacuum environment. Only the ESEM permits chamber pressures sufficient to maintain wet samples. Only the ESEM permits chamber pressures sufficient to maintain wet samples.
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Sample Chamber Gun Chamber High Vacuum Pump Mechanical Pump 1 Torr Gas Flow Regulator Valve
1 Torr 10 Torr
PLA Single Sample Chamber Gun Chamber High Vacuum Pump Mechanical Pump 1 Torr Gas Flow Regulator Valve
1 Torr 10 Torr
PLA Single Sample Chamber Gun Chamber High Vacuum Pump Mechanical Pump 1 Torr Gas Flow Regulator Valve
1 Torr 10 Torr
PLA Single
LV-CSEMs are restricted to a single Pressure Limiting Aperture. LV-CSEMs are restricted to a single Pressure Limiting Aperture. It must be large enough to pass the beam and small enough to limit gas flow. It must be large enough to pass the beam and small enough to limit gas flow.
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Beam Gas Path Length
2 mm 15-20 mm
ESEM LV-CSEM
BSED
Beam Gas Path Length
2 mm 15-20 mm
ESEM LV-CSEM
BSED
Beam Gas Path Length
2 mm 15-20 mm
ESEM LV-CSEM
BSED
A single aperture at the rocking point of the beam results in a A single aperture at the rocking point of the beam results in a long beam gas path length and reduced imaging current. long beam gas path length and reduced imaging current.
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Imaging Current - Room Temperature, Water Vapor, 20 kV Pressure % of Primary Beam Current Torr Pascals ESEM LV-CSEM BGPL = 2 mm BGPL = 20 mm 40 5320 5% 20 2660 23% 10 1330 48% 0.1% 7 931 60% 0.6% 5 665 69% 2.5% 2 266 86% 23% 1 133 93% 48% 0.5 66.5 96% 69%
The long beam gas path length reduces the current The long beam gas path length reduces the current available for imaging in an LV-CSEM available for imaging in an LV-CSEM
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Relative Humidity Isobars
5 10 15 20 25 5 10 15 20 25 Temperature (°C) Pressure (Torr)
Liquid Phase Gas Phase
100% 60% 80% 40% 20%
LV-CSEM ESEM
Relative Humidity Isobars
5 10 15 20 25 5 10 15 20 25 Temperature (°C) Pressure (Torr)
Liquid Phase Gas Phase
100% 60% 80% 40% 20%
LV-CSEM ESEM
Relative Humidity Isobars
5 10 15 20 25 5 10 15 20 25 Temperature (°C) Pressure (Torr)
Liquid Phase Gas Phase
100% 60% 80% 40% 20%
LV-CSEM ESEM
The sample chamber pressure must be at least 4.6 Torr to sustain liquid water. The sample chamber pressure must be at least 4.6 Torr to sustain liquid water.
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ESEM Secondary Imaging ESEM Secondary Imaging LV Backscattered Imaging LV Backscattered Imaging High High Atomic Atomic Number Number Low Low Atomic Atomic Number Number
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Although less susceptible than secondary images, Although less susceptible than secondary images, backscattered images may also show charging artifacts. backscattered images may also show charging artifacts.
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2 mm
ESEM θ LV-CSEM
BSED
θ r
15-20 mm
r
Skirt Radius and Beam Gas Path Length
2 mm
ESEM θ LV-CSEM
BSED
θ r
15-20 mm
r
Skirt Radius and Beam Gas Path Length
2 mm
ESEM θ LV-CSEM
BSED
θ r
15-20 mm
r
Skirt Radius and Beam Gas Path Length
The long beam gas path length multiplies the diameter The long beam gas path length multiplies the diameter
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The long beam gas path length in an LV-CSEM generates a broad electron skirt. The long beam gas path length in an LV-CSEM generates a broad electron skirt. Skirt electrons can generate X-rays far from the analytical target. These spectra Skirt electrons can generate X-rays far from the analytical target. These spectra were acquired from a 900 micron crystal of Epsom salt secured to an aluminum were acquired from a 900 micron crystal of Epsom salt secured to an aluminum stub with carbon paint. The C and AL peaks in the LV-CSEM spectrum confirm stub with carbon paint. The C and AL peaks in the LV-CSEM spectrum confirm the presence of a large skirt. The peaks are absent from the ESEM spectrum. the presence of a large skirt. The peaks are absent from the ESEM spectrum.
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Crack Initiation and Propagation at the Fiber Matrix Interface of Silicon Carbide Reinforced Composite in a High Temperature Oxidizing Environment
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