Buonassisi (MIT) 2011
Charge Extraction
Lecture 9 – 10/06/2011 MIT Fundamentals of Photovoltaics 2.626/2.627 – Fall 2011
- Prof. Tonio Buonassisi
Charge Extraction Lecture 9 10/06/2011 MIT Fundamentals of - - PowerPoint PPT Presentation
Charge Extraction Lecture 9 10/06/2011 MIT Fundamentals of Photovoltaics 2.626/2.627 Fall 2011 Prof. Tonio Buonassisi Buonassisi (MIT) 2011 2.626/2.627 Roadmap You Are Here Buonassisi (MIT) 2011 2.626/2.627: Fundamentals Every
Buonassisi (MIT) 2011
Buonassisi (MIT) 2011
You Are Here
Buonassisi (MIT) 2011
Charge Excitation Charge Drift/Diff usion Charge Separation Light Absorption Charge Collection
Solar Spectrum
Buonassisi (MIT) 2011
Optoelectronics 97370 (2007)
Image by S. W. Glunz. License: CC-BY. Source: “High-Efficiency Crystalline Silicon Solar Cells.” Advances in OptoElectronics (2007).
Buonassisi (MIT) 2011
1. Describe the purpose of contacts, and their most common types. 2. Describe the impact of good and poor contacts on IV characteristics. 3. Sketch the IV characteristics of Schottky and Ohmic contacts. 4. Describe what fundamental material parameters determine the IV characteristics of a contact/semiconductor junction. 5. Sketch common band alignments (Types 1, 2, 3 junctions). 6. Sketch common solar cell device architectures.
Buonassisi (MIT) 2011
Buonassisi (MIT) 2011
Buonassisi (MIT) 2011
Transparency
1 3 2 1
Energy of light (eV)
6 2
Insulator Semi conductor Metal log (S/cm)
Quartz Glass Si Ge ITO Ag
Buonassisi (MIT) 2011
E3 = very small
EF CB VB
E1 = Large E2 = Large
E x
Buonassisi (MIT) 2011
1. Describe the purpose of contacts, and their most common types. 2. Describe the impact of good and poor contacts on IV characteristics. 3. Sketch the IV characteristics of Schottky and Ohmic contacts. 4. Describe what fundamental material parameters determine the IV characteristics of a contact/semiconductor junction. 5. Sketch common band alignments (Types 1, 2, 3 junctions). 6. Sketch common solar cell device architectures.
Buonassisi (MIT) 2011
Vja V J0
1.E-10 1.E-08 1.E-06 1.E-04 1.E-02 1.E+00 0.2 0.4 0.6 0.8 Current Density (mA/cm2) Voltage (V)
I-V Curve
0.E+00 2.E-01 4.E-01 6.E-01 8.E-01 1.E+00 0.2 0.4 0.6 0.8 Current Density (mA/cm2) Voltage (V)
I-V Curve Lin Scale Log Scale
Buonassisi (MIT) 2011
Vja V Rs J0
1.E-10 1.E-08 1.E-06 1.E-04 1.E-02 1.E+00 0.2 0.4 0.6 0.8 Current Density (mA/cm2) Voltage (V)
I-V Curve
0.E+00 1.E-02 2.E-02 3.E-02 4.E-02 5.E-02 0.2 0.4 0.6 0.8 Current Density (mA/cm2) Voltage (V)
I-V Curve
Buonassisi (MIT) 2011
J J0 exp q V JRs
kT 1 V JRs Rsh JL
1.E-10 1.E-08 1.E-06 1.E-04 1.E-02 1.E+00 0.5 1 Current Density (mA/cm2) Voltage (V)
I-V Curve
0.E+00 1.E-02 2.E-02 3.E-02 4.E-02 5.E-02 0.5 1 Current Density (mA/cm2) Voltage (V)
I-V Curve Vja V Rs Rsh J0
Buonassisi (MIT) 2011
J J0 exp q V JRs
kT 1 V JRs Rsh JL
Vja V Rs Rsh J0
Firing contacts? Three possibilities:
Si, large Rs.
deep into Si, low Rsh.
Courtesy of PVCDROM. Used with permission.
Buonassisi (MIT) 2011
1. Describe the purpose of contacts, and their most common types. 2. Describe the impact of good and poor contacts on IV characteristics. 3. Sketch the IV characteristics of Schottky and Ohmic contacts. 4. Describe what fundamental material parameters determine the IV characteristics of a contact/semiconductor junction. 5. Sketch common band alignments (Type 1, 2, 3, and 4 junctions). 6. Sketch common solar cell device architectures.
Buonassisi (MIT) 2011
– Linear I-V curve. – Typically used when charge separation is not a goal for metallization.
– Exponential I-V curve. – Used when charge separation is desired.
Current (a.u.) Voltage (a.u.)
Ohmic and Schottky Contacts
Schottky Ohmic
+
Buonassisi (MIT) 2011
1. Describe the purpose of contacts, and their most common types. 2. Describe the impact of good and poor contacts on IV characteristics. 3. Sketch the IV characteristics of Schottky and Ohmic contacts. 4. Describe what fundamental material parameters determine the IV characteristics of a contact/semiconductor junction. 5. Sketch common band alignments (Types 1, 2, 3 junctions). 6. Sketch common solar cell device architectures.
Buonassisi (MIT) 2011
Buonassisi (MIT) 2011
q fM q c EC EF EV Vacuum Semiconductor Metal E x
Buonassisi (MIT) 2011
q fM q c EC EF EV Vacuum Semiconductor Metal E x
Buonassisi (MIT) 2011
http://www.iue.tuwien.ac.at/phd/ayalew/node56.html
W 2s qND Vo
Courtesy of Tesfaye Ayalew. Used with permission.
Buonassisi (MIT) 2011
– Electron barrier height ≤ 0 (for n-type) – Linear I-V curve. – Typically used when charge separation is not a goal for metallization.
– Electron barrier height > 0 (for p-type) – Exponential I-V curve. – Used when charge separation is desired.
Current (a.u.) Voltage (a.u.)
Ohmic and Schottky Contacts
Schottky Ohmic
+
Buonassisi (MIT) 2011
http://www.iue.tuwien.ac.at/phd/ayalew/node56.html
Courtesy of Tesfaye Ayalew. Used with permission.
Buonassisi (MIT) 2011
– Orientation-dependent surface states. – Elemental nature of surface termination in binary compounds (e.g., A
– Interface dipoles. – and more…
http://www.iue.tuwien.ac.at/phd/ayalew/node56.html
Courtesy of Tesfaye Ayalew. Used with permission.
Buonassisi (MIT) 2011
D.K. Schroder, IEEE Trans. Electron Dev. 31, 637 (1984)
For related visuals, please see the lecture 9 video or the reference below.
Buonassisi (MIT) 2011
http://www.iue.tuwien.ac.at/phd/ayalew/node56.html
W 2s qND Vo
Courtesy of Tesfaye Ayalew. Used with permission.
Buonassisi (MIT) 2011
D.K. Schroder, IEEE Trans. Electron Dev. 31, 637 (1984)
For related visuals, please see the lecture 9 video or the reference below.
Buonassisi (MIT) 2011
https://web.archive.org/web/20130818214213/ http://www.siliconfareast.com/ohmic_table.htm
Buonassisi (MIT) 2011
1. Describe the purpose of contacts, and their most common types. 2. Describe the impact of good and poor contacts on IV characteristics. 3. Sketch the IV characteristics of Schottky and Ohmic contacts. 4. Describe what fundamental material parameters determine the IV characteristics of a contact/semiconductor junction. 5. Sketch common band alignments (Types 1, 2, 3 junctions). 6. Sketch common solar cell device architectures.
Buonassisi (MIT) 2011
Not always possible to dope a material both n- and p-type. Not always possible to find the perfect contact material. Need: heterojunction. (At least) three types of heterojunction: What junction will separate charge?
Buonassisi (MIT) 2011
Simplest case (analogy to Schottky band alignment for metal- semiconductor contacts): 1- Set chemical potential equal across entire device. 2- Then, align vacuum levels. 3- Note that VB and CB must follow vacuum levels. E x
Buonassisi (MIT) 2011
Simplest case (analogy to Schottky band alignment for metal- semiconductor contacts): 1- Set chemical potential equal across entire device. 2- Then, align vacuum levels. 3- Note that VB and CB must follow vacuum levels.
MIT OpenCourseWare http://ocw.mit.edu
2.627 / 2.626 Fundamentals of Photovoltaics
Fall 2013 For information about citing these materials or our Terms of Use, visit: http://ocw.mit.edu/terms.