Anna Mukhortova The University of Chicago VIII RASA Conference - PowerPoint PPT Presentation

Anna Mukhortova The University of Chicago VIII RASA Conference Chicago November 5, 2017

State-of-the-art fabrication facility for academic research and industrial R&D Eckhardt Research Center at the University of Chicago A quantum dot fabricated in the PNF 2

ISO 5 (class 100) – 100 or fewer particles >5 micron/cubic foot of air In the gowning room 3

Bay and chase design 10,000 square feet 6 5 4 3 2 1 4

 Sputtering  Deep Si etcher  Electron-beam (Deep Reactive Ion evaporation Etching)  Thermal evaporation  Chlorine ICP  Atomic layer deposition (Inductively coupled  Chemical vapor plasma) etcher deposition (PECVD,  Fluorine ICP Etcher HDPCVD, LPCVD)  O 2 plasma cleaners  High temperature oxidation 5

AJA Orion Sputtering System Fluorine ICP Etcher 6

Etch of 200nm Nb on Si 2µm wide gold electrodes Deep Si etching – 117µm (CF 4 , CHF 3 , and Ar) 7

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 Contact aligner  Autostepper  Direct write lithography Patterned Si wafer  Electron beam lithography  Solvent Benches  Photoresist Benches Direct Write Lithographer  Developer Benches 1.5µm lines and spaces 9

7.45 nm lines produced by electron beam lithographer E-beam Lithographer 10

 Scanning Electron Microscope  Atomic Force Microscope  Stylus Profilometer  Spectroscopic Ellipsometer  4-point measurement system Scanning Electron Microscope FEI Quanta 650 Horiba Uvisel 2 Ellipsometer

Gold under 392230x magnification Lithography with the SEM – 20nm lines 12

 HF/TMAH Bench  Acid/Base Bench  Toxic/Corrosive Bench  RCA Cleaning Bench 13

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pnf.uchicago.edu amu@uchicago.edu 15