28nm 8nm FDSOI DSOI Dig igit ital Desi esign Tut utorial
- rial
MPW Services Center for IC / MEMS Prototyping http://cmp.imag.fr Grenoble ‐ France
28nm 8nm FDSOI DSOI Dig igit ital Desi esign Tut utorial orial - - PowerPoint PPT Presentation
28nm 8nm FDSOI DSOI Dig igit ital Desi esign Tut utorial orial MPW Services Center for IC / MEMS Prototyping http://cmp.imag.fr Grenoble France Con Context & Motiv tivation tion Develop a digital design flow, based on standard
MPW Services Center for IC / MEMS Prototyping http://cmp.imag.fr Grenoble ‐ France
Develop a digital design flow, based on standard methodologies and CAD tools Detail each step of the digital flow: from RTL to GDSII Plug an play tutorial (scripts and testbenches are delivered) Provide a typical digital example (synchronous, sequential) Propose the flow on an advanced CMOS technology: 28nm FDSOI First version (1.4) sent in June 2015 to 166 institutions Design‐Kit: CMOS28FDSOI 10ML, PDK 2.5.d A new tutorial release is planned for Q1/Q2 2016 Design‐Kit: CMOS28FDSOI 10ML, PDK 2.5.f New functionalities: body biasing, LVS and DRC verifications, etc…
Verilog RTL GDSII layout
CMP annual users meeting, 4 Feb. 2016, PARIS
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Verilog RTL Gate‐level Verilog netlist SDF timing annotation RC or DC Synthesis RC or DC Synthesis RTL simulation RTL simulation Test‐bench Gate‐level simulation Gate‐level simulation EDI Place & Route EDI Place & Route GDSII Physical layout Verilog netlist SDF timing back‐ annotation Back annotated simulation Back annotated simulation Calibre DRC Calibre DRC Calibre LVS Calibre LVS Test‐bench Test‐bench
CAD tools used in the tutorial are:
Cadence Incisiv (NCSim) Synopsys Design Compiler (DC) Cadence RTL Compiler (RC) Cadence Encounter (EDI) Cadence Virtuoso, version 6.1.6 Mentor Graphics Calibre
F R O N T E N D B A C K E N D
CMP annual users meeting, 4 Feb. 2016, PARIS
DRC: Design Rules Checking LVS: Layout Versus Schematic
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clk reset load in[15:0] eq
TOP_FIR
clk reset load in[15:0]
FIR_0 clk reset load in[15:0]
FIR_15 clk reset load in[15:0] eq
eqc
circuit called “TOP_FIR” 16 FIR filters in parallel
Simulation results:
Coefficients loading Outputs calculation Reset
FIR: Finite Impulse Response
CMP annual users meeting, 4 Feb. 2016, PARIS
Testbench Gate level simulation Gate level simulation
Reset, loading and processing modes
CMP annual users meeting, 4 Feb. 2016, PARIS
Verilog RTL Gate level netlist RTL Compiler (Cadence)
Design Compiler (Synopsys) Synthesis 5
Encounter Digital Implementation EDI (Cadence) Place and route Gate level netlist (+ top cell “PAD_TOP_FIR”) Verilog netlist GDSII layout
IOs placement Floorplan generation Power‐plan Core cells placement Clock tree synthesis Power routing Final routing SDF (timing generation) Verilog netlist and GDS STA (back‐annotation)
SDF: Standard Delay Format STA: Static Timing Analysis
CMP annual users meeting, 4 Feb. 2016, PARIS
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Meet particular DRC/ERC rules:
(50µm spacing)
(OPC rules) Restricting the tool to use the 8 first metal layers to route signals, and the 2 top layers for power. Body biasing functionalities (detailed in next slide)
DRC: Design Rules Checking ERC: Electrical Rules Checking OPC: Optical Proximity Correcting
CMP annual users meeting, 4 Feb. 2016, PARIS
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Body bias Body bias
Body biasing on LVT (flip‐well) transistors: Body biasing in layout view: GNDS VDDS GND VDD
Filler tap cell with separated power and ground rails: VDD/VDDS and GND/GNDS FBB or RBB: speed or leakage optimization
FBB: Forward Body Biasing RBB: Reverse Body Biasing
CMP annual users meeting, 4 Feb. 2016, PARIS
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External VDDS and GNDS voltages to core cells: 1) External VDDS/GNDS I/O pads Specific library supporting FBB and RBB (‐1,8V to +1,8V supply voltage) 2) IO pads dedicated power rings 3) Power rings power stripes 4) Power stripes filler cells
Fillers row
GNDS VDDS
Each row of functional cells is supplied
VDDS GNDS GNDS VDDS
CMP annual users meeting, 4 Feb. 2016, PARIS
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FBB: Forward Body Biasing RBB: Reverse Body Biasing
GDSII and netlist imported under Cadence Virtuoso: as layout and schematic views LVS and DRC verifications (on Calibre from Mentor Graphics or PVS from Cadence)
DRC: Design Rules Checking LVS: Layout Versus Schematic
CMP annual users meeting, 4 Feb. 2016, PARIS
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166 institutions received in June 2015 a first version of the tutorial A new tutorial release is planned for Q1/Q2 2016, integrating new functionalities:
body biasing),
Already positive feedback from several designers ! Expected more digital designs in future MPW runs…
DRC: Design Rules Checking LVS: Layout Versus Schematic MPW: Multi‐Project Wafers
CMP annual users meeting, 4 Feb. 2016, PARIS
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