Whats next? - EUV - 3D [Intel web site; spectrum 01/12, 09/16 and - - PowerPoint PPT Presentation

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Whats next? - EUV - 3D [Intel web site; spectrum 01/12, 09/16 and - - PowerPoint PPT Presentation

Whats next? - EUV - 3D [Intel web site; spectrum 01/12, 09/16 and 06/19] Problems of EUV lithography [Spectrum, Aug 07] No powerful enough (~200 W) light sources available, and no sensitive enough (~ 5mJ/cm 2 ) photoresist available


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What’s next?

  • EUV
  • 3D

[Intel web site; spectrum 01/12, 09/16 and 06/19]

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Problems of EUV lithography [Spectrum, Aug 07]

 No powerful enough (~200 W) light sources available, and  no sensitive enough (~ 5mJ/cm2) photoresist available

  • > no way, at the moment, to have ~ 100 wafers per hour (acceptable

commercial throughput)

 Deployment is expected around 2018-2020

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Transistors could stop shrinking in 2021 [Spectrum, Sept 16]

After more than 50 years of miniaturization, the transistor could stop shrinking in just five years. That is the prediction of the 2015 International Technology Roadmap for Semiconductors (ITRS)

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Transistors could stop shrinking in 2021 [Spectrum, Sept 16]

 After 2021, the report forecasts, it will no longer be economically desirable

for companies to continue traditional transistor miniaturization in microprocessors.

 Instead, chip manufacturers will turn to other means of boosting density,

namely

 turning the transistor geometry from horizontal to vertical and  building multiple layers of circuitry, one on top of another  replacing traditional silicon channels by channels made with alternative

materials, namely silicon germanium, germanium, and III-V compounds

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The 5 nm node [Spectrum, June 2019]

 Taiwan Semiconductor Manufacturing Co. (TSMC) and Samsung: 5

nanometer manufacturing process is now in what’s called “risk production”

 the company believes it has finished the process, but initial customers

are taking a chance that it will work for their designs

 the 5 nm node is the first to be built from the start using EUV (l =13.5 nm)  the foundries are thought to be using 10 to 12 EUV steps

Please note: these are improvements

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The 5 nm node [Spectrum, June 2019]

 Photomasks that contain the patterns are very expensive and each

lithography machine itself is a US $100 million–plus investment

 both companies identified some likely early adopters, including suppliers that

make smartphone application processors and 5G infrastructure:

 high volume and a need for either speed or power efficiency

 GlobalFoundries gave up at 14 nm and Intel is years late with its rollout of an

equivalent to competitors’ 7 nm

 next step should be 3 nm, but foundries are expected to offer a variety of

technologies with incremental improvements that fill in the gaps

 indeed, both Samsung and TSMC are offering what they’re calling a 6

nm process