Reliability and Lifetime
- f Electronics in the cold :
Reliability and Lifetime of Electronics in the cold : past, present - - PowerPoint PPT Presentation
Reliability and Lifetime of Electronics in the cold : past, present and future Veljko Radeka radeka@bnl.gov DUNE CE Workshop 07/16 18/2018 Outline 1. CE before cold CMOS: JFETs, discrete and hybrid circuits, from the first JFET (1963) until
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It all started with: Single cold JFET with Ge detectors (1965‐8)
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– JFET preamplifiers in LKr: 13,212 channels; surface mounted components – Operated at 5 kV; HV caps had to be realized in PCBs – Failures
1998
1998,
– Always kept at LKr temperature since 1998 – Operation:
>20 years 15 tons
– 182,468 readout channels
– EMB has ~110,000 detector channels read out by 896x128-ch FEBs – 960 Mother Boards (MB) – 7,168 Summing Boards (SB) – 20,480 resistor network chips, 0.1% – ~110,000 protection diodes on MBs/SBs
2004 – Operation: 14 years so far – MB/SB will remain in operation without upgrade for super LHC
05/10/2011
~0.02% since 2008 EMB Mid/Back MB+SB Assembly EMB Wheel C
– HEC has ~5,600 detector channels read out by 48x128‐ch FEBs – 320 PSBs installed on HEC wheels, 5 different types – Total ~35,000 cold preamplifier channels, each preamplifier ASIC has 8 channels
– Operation: 14 years so far – HEC cold electronics will remain in operation; no upgrade required
HEC Type C PSB HEC Rear Wheel
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MicroBooNE publication
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Analysis by: Brian Kirby
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hole pair, , resulting in impact ionization. Electrons proceed to the drain. The holes drift to the substrate. The substrate current is expressed as
create an interface state at the Si‐SiO2 interface, , for electrons (~4.6eV for holes).
hot electrons that have enough energy to surmount Si ‐ SiO2 barrier (3.1eV) and break the silicon‐hydrogen bond (0.3eV ) generating a trivalent silicon atom (interface state) and a hydrogen atom like
1.3
i
eV
1
i m
q E sub ds
I C I e
q = electron charge λ=electron mean free path Em= electric field Ids= drain‐source current W= channel width C1, C2 ‐ constants
dsat ds m
V V E 3.7
it
eV
If the silicon recombines with the hydrogen, no interface state will appear. If the hydrogen atom diffuses away from the interface, interface state will be generated. The total barrier for hot electrons to inject can be calculated as φit = 3.1eV + 0.3eV = 3.4eV, close to the experimental result (~ 3.7eV ‐ 4.1eV).
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IVCC drops 1% as degradation criteria
3.6V, 150 years
Reduced VDS results in making HCE negligible and a very long extrapolated life time. (005) 5.25V, 800 hours is estimated
The lifetime is given by, Electrons in the MOS channel reach energies well above thermal both at 300K and at 77K . However the mean electron energy, , at the electric field in the range Em ≥100kV/cm. At 77K it is slightly higher, Only a tiny fraction of “hot” electrons reaches the much higher energy required to create an interface state. This makes the exponent in the relation for the lifetime very large, Since , the ratio of lifetimes for two slightly different values of Vds is given by,
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he m
q E meV
77 300
1.06
he K he K
3.7
it
eV 40 4
it it he m
q E
2
1 1
it he it he
ds ds
C e e I W I W
2 1 2 1
it ds he ds
2 1 1 2
1.06 10
ds ds
V for V
m ds
E V
approach to Reliability, assumes a random process, where the failure rate is constant and the distribution of time intervals between failures is given by Poisson statistics. It can be controlled by the design, choice of components, and various quality control tools.
circuit, subsystem, or entire system) will operate, as specified, over a given time without failure. In terms of Failure Rate, or MTBF, it is given by,
failure, or wear/aging, uniform and understood for a given class of components.
the design and the operating conditions.
t t MTBF
(only input stage is shown).
protection circuit.
accurate Cc calculations
CC>4 nF.
amplifier therefore impacts signal to noise ratio. For example, if CC=2.2nF, ~8% of signal charge is not measured by the amplifier. ∆
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effective in removing ripples in the bias power supply.
the current flowing through the bias network in case of a shorted sense wire.
transparency in the region covered by this wire group, choose R1<<Rb.
CwRin~ 10 ns to minimize wire‐to‐wire crosstalk. RbCc time constant >~25 x electron drift time, to make any undershoot due to ac coupling small and easily correctable: RbCc=50Mx4.7nF~=230 ms
Detector LAr calo Capacita nce [nF] C77/C300 Dielectric WVDC Vop Number of units Failures/ time ISR/ Impacto meter 100 ~1 Reconstit . mica 3.5 kV 2 kV ~100 0/6 years HELIOS EM, H calo 50 ~1/3 Ceramic 5 kV 2 kV ~574 0/5 years ATLAS FW calo 12 nF ~1 Ceramic NPO 500 V 1 kV 250 V 500 V 7671 10^9Hz/cm^2 0/10 years 0.5Grad MicroBo
5 ~1 Ceramic NPO 1 kV 440 V ~5000 0/3 years
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