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IEEE EDS Japan Chapter 14:00-14:30 IEEE EDS Japan Chapter Annual Meeting (2011 Fiscal Year) 14:30-17:05 February 1, 2012 14:00-17:05 Sanjo Conference Hall, The University of 2011 IEDM Reports Tokyo, Hongo Campus February 1, 2012


  1. IEEE EDS Japan Chapter 14:00-14:30 IEEE EDS Japan Chapter Annual Meeting (2011 Fiscal Year) 14:30-17:05 ■ February 1, 2012 14:00-17:05 ■ Sanjo Conference Hall, The University of 2011 IEDM Reports Tokyo, Hongo Campus February 1, 2012

  2. IEEE EDS Japan Chapter Annual Meeting (2011 Fiscal Year) Agenda * Greeting, EDS Japan Chapter Chair * EDS Committee Members in 2012 * Reports on 2011 Activities and Plans for 2012 * EDS Japan Chapter Student Award Presentation

  3. Executive Committee Members, 2011 Tenure : From January 1 to December 31, 2011 Chair Shin’ichiro Kimura ( Hitachi ) Vice-Chair Akira Toriumi ( Unv. Tokyo ) Secretary Kazuyoshi Torii ( Hitachi ) Treasurer Koji Kita ( Unv. Tokyo )

  4. Executive Committee Members, 2012 Tenure : From January 1 to December 31, 2012 Chair Akira Toriumi ( Unv. Tokyo ) Vice-Chair Toru Mogami ( NEC ) Secretary Koji Kita ( Unv. Tokyo ) Treasurer Meishoku Masahara ( AIST * ) * AIST ; National Institute of Advanced Industrial Science and Technology

  5. Reports on Activities in 2011

  6. Reports on Activities in 2011 Meeting sponsored by EDS Japan Chapter Annual Meeting and IEDM 2010 Report Meeting January 27th University of Tokyo, Hongo Campus Attendees; 70

  7. Reports on Activities in 2011 IEEE EDS Japan Chapter 2010 IEDM Report Meeting (1) Summary Norikatsu Takaura ( LEAP ) (2) CMOS ( AIST ) Meishoku Masahara (3) Memory Yoshitaka Sasago ( Hitachi ) Break (4) Power Device Toshihide Yoshikawa ( Fujitsu ) (5) Nano Device ( Toshiba ) Atsuhiro Kinoshita Kiyoshi Takeuchi ( Renesas ) (6) Reliability

  8. Reports on Activities in 2011 IEEE EDS Japan Chapter 9 th Student Award 2010 受賞者: Naotoshi Kadotani 角谷 直哉 (東京工業大学 , Tokyo Institute of Technology ) “ Anomalous Electron Mobility in Extremely-Thin SOI (ETSOI) Diffusion Layers with SOI Thickness of Less Than 10 nm and High Doping Concentration of Greater Than 1x1018cm-3” (2010 IEDM) 受賞者: Sang Hyeon Kim 金 相賢(東京大学 , The University of Tokyo ) “ Self-aligned Metal Source/Drain InxGa1-xAs n-MOSFETs Using Ni-InGaAs Alloy” (2010 IEDM) 受賞者: Choong Hyun Lee 李 忠賢 (東京大学 , The University of Tokyo ) “ Ge MOSFETs Performance: Impact of Ge Interface Passivation” (2010 IEDM) 受賞者: Xiaowei Song 宋 驍嵬 (東京大学 , The University of Tokyo ) “ Impact of DIBL Variability on SRAM Static Noise Margin Analyzed by DMA SRAM TEG” (2010 IEDM) 受賞者: Makoto Suzuki 鈴木 誠 (東京大学 , The University of Tokyo ) “ Direct Measurements, Analysis, and Post-Fabrication Improvement of Noise Margins in SRAM Cells Utilizing DMA SRAM TEG” (2010 Symp. on VLSI Technology) 受賞者: Kiichi Tachi 舘 喜一 (東京工業大学 , , Tokyo Institute of Technology ) “ Experimental Study on Carrier Transport Limiting Phenomena in 10 nm Width Nanowire CMOS Transistors” (2010 IEDM) 受賞者: Keita Yamaguchi 山口 慶太 (筑波大学 , Tsukuba University ) “ Universal Guiding Principle for the Fabrication of Highly Scalable MONOS-Type Memories -Atomistic Recipes Based on Designing Interface Oxygen Chemical Potential-” (2010 IEDM)

  9. Sponsored & co-sponsored meetings Reports on Activities in 2011 Meeting Name Date Attendees International Electron Devices Meeting 2010 January 27, 2011 70 IEEE EDS Distinguished Lecture February 16, 30 Prof. John Robertson (Engineering Department, 2011 Cambridge University, Cambridge, UK) ” Electronic properties of Germanium : oxide interfaces for future CMOS” WIMNACT 26 (Workshop and IEEE EDS Mini- February 9, 2011 35 colloquium on Nanometer CMOS Technology) IEEE EDS Distinguished Lecture June 17, 2011 25 Dr. Simon Deleonibus, Chief Scientist & Director of Leti, Grenoble France “CMOS Nanoelectronics scaling and Technology Diversifications” IEEE EDS Distinguished Lecture August 26, 2011 25 Dr. Prof. Xing Zhou, Chiar, IEEE EDS SRC-AP (Region 10) “Unification of MOS Compact Models with the Unified Regional Modeling Approach”

  10. Sponsored & co-sponsored meetings Reports on Activities in 2011 Meeting Name Date Attendees IEEE EDS Distinguished Lecture September 21, 20 Prof. Enrique Miranda, Universitat Autònoma de 2011 Barcelona, Spain “Failure analysis of MOS devices using spatial statistics” IEEE EDS Minicolloquium on Advanced Hybrid October 4-5, 2011 200 Nano Devices IEEE EDS Distinguished Lecture November 11, 32 Professor of Electrical Engineering, Material 2011 Science and Engineering, Director of Research, Center for Integrated Systems, Stanford University, USA " Challenges in Nanoelectronic Devices and Integrations on Silicon Platform Today and Tomorrow" IEEE EDS Distinguished Lecture November 17, Professor Kenji Shiraishi, Tsukuba University 2011 “Interface Physics and Its Approach to Modern Devices -A Computational Physics Approach-”

  11. Reports on Activities in 2011 Sending Information to Members * EDS News Letter * Use of Japan Council Mailing List * EDS Japan Chapter Homepage http://www.ieee-jp.org/japancouncil/chapter/ED-15/

  12. Activity Plan for 2012

  13. Activities in 2012 * Annual Meeting & 2011 IEDM Report Meeting * Sponsorship of DL Meeting, MQ and Workshop * Co-sponsorship and backup of Meetings * Student Award Presentation * Information Sending Use of Mailing List and HP http://www.ieee-jp.org/japancouncil/chapter/ED-15

  14. IEEE Electron Devices Society Membership http:/www.ieee.org IEEE Membership Grade Fellow Senior Member Member Student Member Promotion to Senior Member First Step to Fellow Anyone with 10 years in the profession

  15. IEEE EDS Japan Chapter 2011 10th Student Award Presentation From this year, award name is changed from previous IEEE EDS Japan Chapter Student Award to new IEEE EDS Japan Chapter Student Award (VLSI) IEEE EDS Japan Chapter Student Award (IEDM).

  16. IEEE EDS Japan Chapter Student Award (VLSI) 受賞者: Rui Zhang (東京大学 , The University of Tokyo ) “High Mobility Ge pMOSFETs with ~1nm Thin EOT Using Al2O3/GeOx/Ge Gate Stacks Fabricated by Plasma Post Oxidation” 受賞者: SangHyeon Kim (東京大学 , The University of Tokyo ) “High Performance Extremely-Thin Body III-V-On-Insulator MOSFETs on a Si Substrate with Ni-InGaAs Metal S/D and MOS Interface Buffer Engineering” 受賞者: Yasuhiro Nakajima (東京大学 , The University of Tokyo ) “Phase Transformation Kinetics of HfO2 Polymorphs in Ultra-Thin Region” IEEE EDS Japan Chapter Student Award (IEDM) 受賞者: Yoshiharu Yonai (東京工業大学 , Tokyo Institute of Technology ) “High drain current (>2A/mm) InGaAs channel MOSFET at VD=0.5V with shrinkage of channel length by InP” 受賞者: Teruyuki Ohashi (東京工業大学 , Tokyo Institute of Technology ) “Experimental Evidence of Increased Deformation Potential at MOS Interface and Its Impact on Characteristics of ETSOI FETs” 受賞者: Tsunaki Takahashi (東京工業大学 , Tokyo Institute of Technology ) “Thermal-Aware Device Design of Nanoscale Bulk/SOI FinFETs: Suppression of Operation Temperature and Its Variability” 受賞者: Tomoyuki Yokota (東京大学 , The university of Tokyo ) “Sheet-type Organic Active Matrix Amplifier System using Vth-Tunable, Pseudo-CMOS Circuits with Floating-gate Structure”

  17. IEEE EDS Japan Chapter 2011 IEDM Report Meeting ( 14:30-17:05) (1) Summary 高浦則克氏( Asian Chair ) ( 超低電圧デバイス技術研究組合 ) 14:30-14:45 (2) CMOS 昌原明植氏( CIRCUIT AND DEVICE INTERACTION ) ( 産業技術総合研究所 ) 14:45-15:10 ( 3) Memory 福住嘉晃氏( MEMORY TECHNOLOGY ) ( 東芝 ) 15:10-15:35 休憩 15:35-15:50 (4) Display and Sensor 糸長 総一郎氏( DISPLAYS, SENSORS AND MEMS ) ( ソニー ) 15:50-16:15 (5) Nano Device 高柳万里子氏( NANO DEVICE TECHNOLOGY ) ( 東芝 ) 16:15-16:40 (6) Powe Device 宮本恭幸氏( QUANTUM, POWER, AND COMPOUND SEMICONDUCTOR ) ( 東工大 ) 16:40-17:05

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