High charge yield from nanopatterned cathodes in S-band RF - - PowerPoint PPT Presentation

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High charge yield from nanopatterned cathodes in S-band RF - - PowerPoint PPT Presentation

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High charge yield from nanopatterned cathodes in S-band RF photoinjector P. Musumeci and R. K. Li UCLA Department of Physics and Astronomy PPP workshop 2012 Background To generate high average power beams, cathode yield and drive laser

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SLIDE 1

High charge yield from nanopatterned cathodes in S-band RF photoinjector

  • P. Musumeci and R. K. Li

UCLA Department of Physics and Astronomy PPP workshop 2012

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SLIDE 2
  • To generate high average power beams, cathode yield and drive laser power

is still a major limitation.

  • No need to struggle to get above work-function photons to initiate

photoemission.

  • Take advantage of the large charge yield from multiphoton photoemission.

– Ultrashort laser pulses on cathode naturally married with ‘blow-out’ regime. – Avoid lossy non linear frequency conversion.

  • How to enhance multiphoton photoemission?

– By modifying reflectivity – By optical field enhancement  Surface plasmon excitation (Padmore, PPP 2010)

Background

Musumeci et al. PRL,100:244801, 2010

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SLIDE 3

Outline

  • Nano-plasmonics inside an RF photoinjector
  • Reflectivity response
  • High charge yield from nanopatterned

cathodes tested in high gradient RF guns

  • Damage threshold and limitations
  • Nanopatterned beam dynamics
  • Conclusions
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SLIDE 4

Surface plasmon assisted photoemission

  • The reflectivity of a metal can be controlled by coupling incident linearly

polarized light with surface plasmon oscillations.

  • Kretschmann geometry requires back-illumination.
  • The coupling can also be done by using periodic nanostructures such grids
  • r arrays of holes.
  • Low reflectivity corresponds to optical electric field enhancement.

10 nm bandwidth FDTD simulations

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SLIDE 5

Nano-hole arrays using Focused Ion Beam technique

  • most nano-fabrication techniques/machines work on small

pieces (light, very thin, wafer-like)

  • larger pieces with FEI Nova 600 Dual-Beam FIB at UCLA
  • Target nanostructures directly onto the gun cathode
  • target dimensions:

d=765 nm h=244 +- 15 nm w=185 +- 15 nm

  • FDTD: ~0% at 800

nm, bandwidth 10 nm

  • variations due to

random orientation and sizes of the grains

5

test the operation parameters of the FIB (nA, passes)

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SLIDE 6

the final FIB-ed pattern

  • specify the hole coordinates with a script file (limited to 1000 points each pitch)
  • each pitch 25 um square, 5 × 5 pitches
  • 125 um square pattern finished in 30 minutes
  • ready for optical characterization and gun installation

6

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SLIDE 7

cathode IR

Reflectivity measurements of the FIB-ed cathode

  • Pattern visible to naked eyes
  • imaged at near normal incidence ( < 10 deg )
  • with room light / 800 nm laser

scattered room light reflected 800 nm laser reflectivity of the flat surface 88% reflectivity of the pattern 64%

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SLIDE 8

Effect of pattern non-uniformity: simulations

  • FDTD: ~0% at 800 nm with d=765 nm, h=244 nm, w=185 nm, identical Gaussian shape
  • large variations in the (test) fabricated structures
  • run FDTD again using some of the SEM measured dimensions

variation of the dimensions (cross section of the 3D model)

  • min. 22%@790 nm
  • wider bandwidth

8

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SLIDE 9

FIB is not the only way….

  • E-beam lithography (UCLA- CNSI)
  • UV lithography (Padmore group, LBNL)
  • Need to interface with cathode flange

Cathode plug engineering to be compatible with nanofabrication techniques and single crystal wafers

Successfully installed in RF gun! Exciting opportunity for cathode testing ahead…

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SLIDE 10

Single crystal samples

Measurement scheme

  • FIB optimized for 100 grain
  • rientation
  • Much more uniform
  • Measurements at LBNL
  • Benchmark and calibrate FDTD

simulations

  • 600 nm peak ?!
  • 840 nm peak (too long !)
  • Last iteration: 710 nm spacing

between nano-holes

300 400 500 600 700 800 900 1000 0.2 0.4 0.6 0.8 1 ypol ytilt -2deg ypol ytilt 0deg ypol ytilt 2deg ypol ytilt 4deg

Single crystal SEM image

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SLIDE 11
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SLIDE 12

‘Warm’ test of the FIB-ed cathode

  • Installation into the photocathode rf gun
  • RF tuning procedure (pulling the cathodes toward the back)
  • static vacuum 1e-9 torr
  • increase the rf power for surface conditioning
  • dark current (field emission) level comparable with regular flat cathode
  • Exciting moment: shine the laser and scan across the cathode…

12

e- beam from flat surface when laser hit the nanopattern

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SLIDE 13

Charge Yield map

  • virtual cathode: position and intensity
  • f the IR laser on the cathode
  • calibrated camera: e- beam charge

rf gun virtual cathode

IR BS M e- beam

calibrated camera

1.25 1.50 1.75 1.00 1.25 1.50 1.75

Y(m) X(m)

0.01000 0.2725 0.5350 0.7975 1.060 1.323 1.585 1.847 2.110

<0.01

Laser spot 125 um x 125 um

x / mm

y / mm

  • charge yield ratio 500
  • can not be totally explained by the

reflectivity:

  • expected as the simulation show field

enhancement around each nanohole 27 ) 88 . 1 /( ) 64 . 1 (

3 3

  

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SLIDE 14

Polarization dependence

  • Interesting question: does polarization matter?
  • Spacing between holes is different at 45 degrees.
  • Small effect due to incident angle on cathode

being 5 degrees

  • Measurements (taking into account mirror

reflectivity) confirm simulation prediction.

  • No polarization dependence.
  • 70
  • 60
  • 50
  • 40
  • 30
  • 20
  • 10

10 20

2500 3000 3500

Charge (a.u.) Waveplate angle

Charge Sine fit

Equation y=y0+A*sin(pi*(x-xc )/w)

  • Adj. R-Square

0.70414 Value Standard Error B xc

  • 1.65547

2.00264 B w 21.58648 1.57154 B A 174.26201 31.64152 B y0 3015.27863 24.22902

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SLIDE 15

Damage threshold

  • Definitely different than flat surface.
  • For copper absorbed fluence threshold 50-60

mJ/cm2

  • Increased laser absorption can cause significant

damage

  • Damage after 103 shots at 25 mJ/cm2 incident

fluence

  • Increase can be explained by field (intensity)

enhancement

Laser spot Damaged pattern bright field zoom x50 >500 GW/cm2 Laser spot First sample

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SLIDE 16

Charge yield measurements

  • Measured charge density scales as 3rd

power of laser intensity

  • indicating a 3-photon process
  • 35 MV/m extraction field. (30 degrees

phase at 70 MV/m peak)

  • Saturation due to the virtual cathode limit

could be affected by non uniform surface charge density at emission plane

  • e-beam bunch length comparable with

the same charge beam from a flat area. (measured by RF deflector)

  • nanoholes are low-Q cavities
  • broad resonances

10 100

0.01 0.1 1

Charge yield from nanopatterned surface

Charge yield (pC/mm

2)

Intensity (GW/cm

2)

Flat copper surface

Slope = 3

in – vacuum mirror not calibrated yet…

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SLIDE 17

Beam dynamics from nanopatterned cathodes

  • Thermal emittance measurements
  • Grid images look blurry.
  • Emittance analysis give somewhat (~1.5 times)

larger values when compared to flat surface thermal emittance

  • Nanopatterned beam simulations.
  • Can the structure be preserved?
  • Can we demonstrate that emission is mostly

from hole region?

  • Multi-scale simulation problem. Requires ad-hoc

numerical algorithms.

tim e=1.4e-013

Avg(z) = 7.56254e-008

  • 4e-6
  • 2e-6

0e-6 2e-6 4e-6

GPT

x

  • 4e-6
  • 3e-6
  • 2e-6
  • 1e-6

0e-6 1e-6 2e-6 3e-6 4e-6 y

60 um rms

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SLIDE 18

Acknowledgements

  • H. To (nanopatterned fabrication)
  • C. M. Scoby, J. T. Moody, E. Threkheld, D. Cesar, K.

Roberts, E. Curry (Pegasus Team)

  • LBL H. Padmore, A. Polyakov
  • Radiabeam Technologies. G. Andonian
  • Funding agencies: DOE-BES, DOE-HEP, JTO-ONR
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SLIDE 19

Conclusion and discussion

  • Nanoplasmonics meets high brightness electron sources
  • Significant increase in multiphoton charge yield with respect to flat surface

– Reflectivity – Local intensity enhancement

  • First RF photoinjector test successful
  • Beam properties measured
  • Damage threshold limitation
  • Applications of nanopatterned cathodes
  • Increase absolute charge yield ?

– Optimize structures. Nanogrooves. – Different substrates/metals

  • Sub-wavelength patterning initial beam distribution.
  • Nanostructures beam dynamics evolution
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SLIDE 20
  • When: 12/12/12 – 12/14/12
  • Where: University of California, Los

Angeles

  • What: Workshop on Ultrafast

Electron Sources for Diffraction and Microscopy applications

http://home.physics.ucla.edu/UESMD_2012/

The goal is to convene together people from the accelerator and instrument development community with some of the application guys and define the capabilities and limits of the technique in order to trace a path on how progress in UED can really make an impact in material studies and ultrafast science. Which of the beam characteristics should we push more? What processes or material studies will take most advantage from the unique properties of the source? What are the limits (and the requirements) in temporal resolution?

Co-Chairs: X.J. Wang & P. Musumeci

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SLIDE 21

Strong polarization dependence for some patterns Shifted resonance. Not clear if FIB has some issues.