ThetaMetrisis Polydefkous 14, 12242 Athens, Greece - - PowerPoint PPT Presentation

Polydefkous 14, 12242 Athens, Greece www.thetametrisis.com e-mail: info@thetametrisis.com

ThetaMetrisis

March 2010 Status

ThetaMet taMetrisi risis s Profile ile

 is a privately held company located in Athens, Greece.  focuses to the design and development of turnkey hardware & software solutions for the characteri riza zatio ion

• f thin and thick films (film thickness, refractive index,

extinction coefficient, absorbance, transmittance, fluorescence, reflectance etc.) through optical al measurements.  tools are cost-affordable le without any compromise in accuracy and versatility, thanks to the flexible tool design and parameterized software.  core technology is based on White Light Reflectanc nce e Spectroscopy offering accurate and real-time calculation of the optical properties and film thickness

• f stacked thin and thick films.

 also delivers unique analytic ical l serv rvices for film characteriz erizatio ion such as in-situ film swelling in the presence of controlled vapors, film thickness changes due to thermal cycling, film dissolution, etc

Mission ion At ThetaMetrisis, film metrology tools are tailored to customer’s needs without any compromise in accuracy, quality and after sales support.

Technology logy

White e Light Reflect ctance ce Spectrosc

• scop
• py

Measurement layers Measurement parameters Other Characteristics Transparent or Semi- transparent Thickness: 5nm – 150μm* Real time measurements Suspended or Supported in air or in Liquid Optical constants (n & k) Dissolution measurements** Up to 10-films layer stack Polymer characterization**

* depends on the spectrometer used ** requires extra configuration

Products: ducts: FR-Basi asic

FR-Basic-UV-NIR case is designed and fabricated with Anodized Aluminum profile and offers a robust and modular construction. Thus it can be redesigned according the special customer needs, without any additional cost. The he ent ntire sy syste tem is is shi hipped ed rea eady for

• r meas

asur urements ts. The only addit itio ional part needed is is a PC PC wi with a fr free US USB por

• rt. The

he sy syste tem can an be be eas asily ily us used ed by by any nyon

• ne wit

with bas asic ic computer er skills without any any deep ep knowledge of

• f optics.

FR-Basic-scematics

Prod

• duct

uct Configu igurati tion

• ns:

s: FR-Basic sic VIS-NIR NIR

The Solution for Point of Interest est optical al measur ureme ements nts in the 350 350-1100 100nm nm range

Product ct Configur igurati tions: s: FR-Basic sic UV-NIR IR

The Solution for Point of Interest est optical al measurem ements s in the 200 200-110 100nm range

FR FR-μPr Probe

• be

The Solution for Point of Interest est optical al measurem ements s through optical al microscop scope

250X250μm2 area through 40X objective lens

FR FR-Bas Basic c Typical cal Results lts

Suspended Si membrane Au/SiO2 over Si Substrate SOI wafer SU-8 film over Si

FR FR-Bas Basic c VIS-NIR IR Speci cifica catio tions

Spectrometer OceanOptics USB4000 Detector Toshiba TCD1304AP linear CCD array Scanning range: 200nm - 1000 nm Number of Pixels 3648 Grating Grating #3, 350nm - 1000nm, best efficient (>30%) 350nm - 850nm Aperture 50 µm wide slit Optical resolution For 50μm slit ~2.0nm (FWHM), for different slit size 0.3nm - 10nm Signal-to-noise ratio 300:1 A/D resolution 16 bit Dark noise 50 RMS counts Acquisition time 10 milliseconds to 10 seconds Light Source Wavelength range 360-2000nm Lamp type Tungsten Halogen Light Source Power Output 5W – 20W (at 6 selectable power settings). lifetime ~2000h Stabilized Time ~10min General characteristics Sample size 10mm - 150mm (irregular shape) Computer requirements PC with Windows XP/Vista and a USB port available Power requirements 115VAC/230VAC (1.3A/0.8A) Dimensions (W x L x H) 320mm x 360mm x 160mm Weight 11.5Kgr

FR FR-Basi Basic c UV/VIS IS Specifica cation tions

Spectrometer OceanOptics USB4000 Detector Toshiba TCD1304AP linear CCD array Scanning range: 200nm - 1000 nm Number of Pixels 3648 Grating Grating #1, 200nm - 850nm, best efficient (>30%) 200nm - 575nm Aperture 50 µm wide slit Optical resolution For 50μm slit ~2.0nm (FWHM), for different slit size 0.3nm - 10nm Signal-to-noise ratio 300:1 A/D resolution 16 bit Dark noise 50 RMS counts Acquisition time 10 milliseconds to 10 seconds Light Source Lamp type Compined Deuterium - Tungsten Halogen Light Source (controlled indipendally) Wavelength range 200-410 nm (deuterium), 360-2000 nm (tungsten halogen) Power Output 3.8 watts (deuterium); 1.2 watts (tungsten halogen) lifetime ~1500 hours (deuterium); 1500 hours (tungsten halogen) Stabilized Time ~10min General characteristics Sample size 10mm - 150mm (irregular shape) Computer requirements PC with Windows XP/Vista and a USB port available Power requirements 115VAC/230VAC (1.3A/0.8A) Dimensions (W x L x H) 320mm x 360mm x 160mm Weight 11.5Kgr

Produ duct cts: s: FR-Therm ermal al

Film m Charac acteri teriza zation tion during g therma mal l treatment ment

FR-Thermal tool handles layer stacks consisted of numerous layers and two quantities can be be calculated simultaneously in in real time e.g. the thicknesses of two films or the thickness and n & k of one film. The measurements are used for the determination of the physicochemical properties of the films, e.g. the measurement of glass transition temperature of polymeric films. The FR-Thermal is ideal for many thermal studies such as film therm rmal decompo position, tempe perature depe pende dent changes of

• f opt

ptical pr prope perties, Post Appl pply Bake and Post Expo posure Bake thickn kness loss in in lithograph phy etc.

Tg

film calculation

Produ duct cts: s: FR-Liqu quid

Film m Charac acteri teriza zation tion during g wet processing ing

Real time monitoring of thin resist film dissolution FR-Liquid tool handles layer sta tacks consisted of numerous layers and two qu quant ntiti ties can be be calcul ulated ted simul ulta tane neou

• usly in

in real tim time e.g. the thicknesses of two films or the thickness and n & k of one film etc. FR FR-Li Liqui uid is is ide deal for

• r all wet pr

processing ng app pplication

• ns. In all

cases the reflectance data are stored for subsequent

• processing. Furthermore the FR-Liquid cell can be connected to

an external chiller (not included in the basic configuration) for measurements at temperatures below room temperature.

Softw twar are: e: FR-Mon

• nitor

itor

• Abso

sorb rban ance/ ce/ Tran ansm smit ittan ance e / Fluores escen cence ce measuremen ements

• Film

m thic ickn knes ess s measu suremen ements

• Optica

ical l constants stants measuremen ements

• Real

al time e measuremen ements

• Off-lin

linemeasur emeasuremen ements

• Special

ial features: es: light source e control, l, ambien ent temper erature, , ambien ient humidity, sample’s temperature, ….

FR FR-Tool l Key Advan anta tages es

• Modular and Expandable tool
• User-configurable
• Light Intensity control
• Robustness
• Software configurable to user’s

needs

• Cost Affordable

FR FR-Mon Monitor tor v1.2

Measurement screenshot Configuration window

Typical cal Application tions

 Absorbance – Transmission – Fluorescence measurements  Chemical & Biological Sensing  Photonic Structures Characterization  Materials (Metal, Dielectrics) Characterization  Semiconductor Fabrication  Polymers Characterization  Supported & Free-standing films characterization  Process control (endpoint & fault detection)  Optical Coatings  In-Situ Measurements  Hard-coats  ………………

Contac tact t Info

• Ioannis Raptis raptis@thetametrisis.com
• Dimitris Goustouridis dgoustouridis@thetametrisis.com

Address:

Polydefkous 14, 12242 Egaleo, Athens, Greece Tel: +30-6974-157612 Fax: +30-210-5987898 E-mail: info@thetametrisis.com