ThetaMetrisis Polydefkous 14, 12242 Athens, Greece - PowerPoint PPT Presentation

ThetaMetrisis Polydefkous 14, 12242 Athens, Greece www.thetametrisis.com e-mail: info@thetametrisis.com March 2010 Status

ThetaMet taMetrisi risis s Profile ile is a privately held company located in Athens, Greece.  focuses to the design and development of turnkey  hardware & software solutions for the characteri riza zatio ion of thin and thick films (film thickness, refractive index, extinction coefficient, absorbance, transmittance, fluorescence, reflectance etc.) through optical al measurements. tools are cost-affordable le without any compromise in  accuracy and versatility, thanks to the flexible tool design and parameterized software. core technology is based on White Light Reflectanc nce e  Spectroscopy offering accurate and real-time calculation of the optical properties and film thickness of stacked thin and thick films. also delivers unique analytic ical l serv rvices for film  characteriz erizatio ion such as in-situ film swelling in the presence of controlled vapors, film thickness changes due to thermal cycling, film dissolution, etc

Mission ion At ThetaMetrisis, film metrology tools are tailored to customer’s needs without any compromise in accuracy, quality and after sales support.

Technology logy White e Light Reflect ctance ce Spectrosc oscop opy Measurement Measurement Other Characteristics layers parameters Transparent or Semi- Thickness: Real time transparent 5nm – 150 μ m* measurements Suspended or Supported Optical constants Dissolution in air or in Liquid (n & k) measurements** Up to 10-films layer stack Polymer characterization** * depends on the spectrometer used ** requires extra configuration

Products: ducts: FR-Basi asic FR-Basic-scematics FR-Basic-UV-NIR case is designed and fabricated with Anodized Aluminum profile and offers a robust and modular construction. Thus it can be redesigned according the special customer needs, without any additional cost. The he ent ntire sy syste tem is is shi hipped ed rea eady for or meas asur urements ts. The only addit itio ional part needed is is a PC PC wi with a fr free US USB por ort. The he sy syste tem can an be be eas asily ily us used ed by by any nyon one wit with bas asic ic computer er skills without any any deep ep knowledge of of optics.

Prod oduct uct Configu igurati tion ons: s: FR-Basic sic VIS-NIR NIR The Solution for Point of Interest est optical al measur ureme ements nts in the 350 350-1100 100nm nm range

Product ct Configur igurati tions: s: FR-Basic sic UV-NIR IR The Solution for Point of Interest est optical al measurem ements s in the 200 200-110 100nm range

FR FR- μ Pr Probe obe 250X250 μ m 2 area through 40X objective lens The Solution for Point of Interest est optical al measurem ements s through optical al microscop scope

FR FR-Bas Basic c Typical cal Results lts SOI wafer Suspended Si membrane Au/SiO 2 over Si Substrate SU-8 film over Si

FR FR-Bas Basic c VIS-NIR IR Speci cifica catio tions Spectrometer OceanOptics USB4000 Detector Toshiba TCD1304AP linear CCD array Scanning range: 200nm - 1000 nm Number of Pixels 3648 Grating Grating #3, 350nm - 1000nm, best efficient (>30%) 350nm - 850nm Aperture 50 µm wide slit Optical resolution For 50 μ m slit ~2.0nm (FWHM), for different slit size 0.3nm - 10nm Signal-to-noise ratio 300:1 A/D resolution 16 bit Dark noise 50 RMS counts Acquisition time 10 milliseconds to 10 seconds Light Source Wavelength range 360-2000nm Lamp type Tungsten Halogen Light Source Power Output 5W – 20W (at 6 selectable power settings). lifetime ~2000h Stabilized Time ~10min General characteristics Sample size 10mm - 150mm (irregular shape) Computer requirements PC with Windows XP/Vista and a USB port available Power requirements 115VAC/230VAC (1.3A/0.8A) Dimensions (W x L x H) 320mm x 360mm x 160mm Weight 11.5Kgr

FR FR-Basi Basic c UV/VIS IS Specifica cation tions Spectrometer OceanOptics USB4000 Detector Toshiba TCD1304AP linear CCD array Scanning range: 200nm - 1000 nm Number of Pixels 3648 Grating Grating #1, 200nm - 850nm, best efficient (>30%) 200nm - 575nm Aperture 50 µm wide slit Optical resolution For 50 μ m slit ~2.0nm (FWHM), for different slit size 0.3nm - 10nm Signal-to-noise ratio 300:1 A/D resolution 16 bit Dark noise 50 RMS counts Acquisition time 10 milliseconds to 10 seconds Light Source Lamp type Compined Deuterium - Tungsten Halogen Light Source (controlled indipendally) Wavelength range 200-410 nm (deuterium), 360-2000 nm (tungsten halogen) Power Output 3.8 watts (deuterium); 1.2 watts (tungsten halogen) lifetime ~1500 hours (deuterium); 1500 hours (tungsten halogen) Stabilized Time ~10min General characteristics Sample size 10mm - 150mm (irregular shape) Computer requirements PC with Windows XP/Vista and a USB port available Power requirements 115VAC/230VAC (1.3A/0.8A) Dimensions (W x L x H) 320mm x 360mm x 160mm Weight 11.5Kgr

Produ duct cts: s: FR-Therm ermal al Film m Charac acteri teriza zation tion during g therma mal l treatment ment film calculation T g FR-Thermal tool handles layer stacks consisted of numerous layers and two quantities can be be calculated simultaneously in in real time e.g. the thicknesses of two films or the thickness and n & k of one film. The measurements are used for the determination of the physicochemical properties of the films, e.g. the measurement of glass transition temperature of polymeric films. The FR-Thermal is ideal for many thermal studies such as film therm rmal decompo position, tempe perature depe pende dent changes of of opt ptical pr prope perties, Post Appl pply Bake and Post Expo posure Bake thickn kness loss in in lithograph phy etc.

Produ duct cts: s: FR-Liqu quid Film m Charac acteri teriza zation tion during g wet processing ing Real time monitoring of thin resist film dissolution FR-Liquid tool handles layer sta tacks consisted of numerous layers and two qu quant ntiti ties can be be calcul ulated ted simul ulta tane neou ously in in real tim time e.g. the thicknesses of two films or the thickness and n & k of one film etc. FR FR-Li Liqui uid is is ide deal for or all wet pr processing ng app pplication ons. In all cases the reflectance data are stored for subsequent processing. Furthermore the FR-Liquid cell can be connected to an external chiller (not included in the basic configuration) for measurements at temperatures below room temperature.

Softw twar are: e: FR-Mon onitor itor • Abso sorb rban ance/ ce/ Tran ansm smit ittan ance e / Fluores escen cence ce measuremen ements • Film m thic ickn knes ess s measu suremen ements • Optica ical l constants stants measuremen ements • Real al time e measuremen ements • Off-lin linemeasur emeasuremen ements • Special ial features: es: light source e control, l, ambien ent temper erature, , ambien ient humidity, sample’s temperature, ….

FR FR-Tool l Key Advan anta tages es • Modular and Expandable tool • User-configurable • Light Intensity control • Robustness • Software configurable to user’s needs • Cost Affordable

FR FR-Mon Monitor tor v1.2 Measurement screenshot Configuration window

Typical cal Application tions  Absorbance – Transmission – Fluorescence measurements  Chemical & Biological Sensing  Photonic Structures Characterization  Materials (Metal, Dielectrics) Characterization  Semiconductor Fabrication  Polymers Characterization  Supported & Free-standing films characterization  Process control (endpoint & fault detection)  Optical Coatings  In-Situ Measurements  Hard-coats  ………………

Contac tact t Info • Ioannis Raptis raptis@thetametrisis.com • Dimitris Goustouridis dgoustouridis@thetametrisis.com Address: Polydefkous 14, 12242 Egaleo, Athens, Greece Tel: +30-6974-157612 Fax: +30-210-5987898 E-mail: info@thetametrisis.com