T
PB
W eierstraß-InstitutfürAngewandteAnalysisundStochastik
- H. Groß, A. Rathsfeld
Numerical Aspects of the Scatterometric Measurement of Periodic Surface Structures
Numerical Aspects of the Scatterometric Measurement of Periodic Surface Structures M37, July 21 1 (44) Outline
Outline 1
Direct Problem: Diffraction by Grating Structures.
2
Reconstruction of Periodic Surface Structures
3
Sensitivity Analysis Tasks of Sensitivity Analysis Uncertainty Estimates for Derived Values
4
Stochastic Geometries
5
Conclusions
Numerical Aspects of the Scatterometric Measurement of Periodic Surface Structures M37, July 21 2 (44) Direct Problem: Diffraction by Grating Structures.
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θ z x y
reflected modes transmitted modes
chrome photoresist
incoming field (E ,H )
i i
silicon oxide
periodic gratings (similarly, biperiodic surface structures) details of surface geometry in size of wavelength
Numerical Aspects of the Scatterometric Measurement of Periodic Surface Structures M37, July 21 4 (44) Direct Problem: Diffraction by Grating Structures.
Lithography chip production like old-fashioned photography: photoresist layer illuminated by light scattered from mask, development: baking and etching procedures − → chip
mask photo resist wafer light source
standard test configurations: – periodic line-space structure (lines formed by bridges with trapezoidal cross section) – biperiodic array of trapezoidal blocks resp. holes
Numerical Aspects of the Scatterometric Measurement of Periodic Surface Structures M37, July 21 5 (44)