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Laser drilling of a Copper Mesh Vincenzo Berardi U.O.S. Bari, Italy - PowerPoint PPT Presentation

7th RD51 Collaboration Meeting 13-15 April 2011 - CERN Laser drilling of a Copper Mesh Vincenzo Berardi U.O.S. Bari, Italy Dip. Interuniversitario di Fisica M. Merlin Laser Ablation Definition Laser ablation is the process of removing


  1. 7th RD51 Collaboration Meeting 13-15 April 2011 - CERN Laser drilling of a Copper Mesh Vincenzo Berardi U.O.S. Bari, Italy Dip. Interuniversitario di Fisica “M. Merlin”

  2. Laser Ablation Definition Laser ablation is the process of removing material from a solid surface by irradiating it with a laser beam. At low laser flux, the material is heated by the absorbed laser energy and evaporates or sublimates. At high laser flux, the material is typically converted to a plasma. Usually, laser ablation refers to removing material with a pulsed laser Vincenzo Berardi - 14 April 2011 CERN – 7° RD51 Collaboration Meeting

  3. Timescales of the laser ablation process fs ps ns µs energy absorption by free electons electron - lattice energy transfer ablation by phase explosion or evaporation Thermal diffusion Melting and resolidification Mazur et al. Nature Materials 2 , 217 (2002) Vincenzo Berardi - 14 April 2011 CERN – 7° RD51 Collaboration Meeting

  4. Laser drilling strategies for high accuracy Trepanning optic for helical drilling F. Dausinger et al., Springer (2004) Vincenzo Berardi - 14 April 2011 CERN – 7° RD51 Collaboration Meeting

  5. Cu Parameters Material Density Thermal Melting Vaporization (g cm -3 ) Conductivity point temperature (W m -1 K -1 ) (°C) (°C) Copper Metal 8.94 400 1084 2562  Finding optimal laser process parameters (pulse duration, wavelength, fluence, drilling strategy)  Copper oxide around the hole walls (post process cleaning could be required) Advantages Flexible technology: complete control of the hole morphology (taper, diameter) and geometry (density of the holes mm -2 , distribution) Vincenzo Berardi - 14 April 2011 CERN – 7° RD51 Collaboration Meeting

  6. Microchip laser fiber amplifier (100 ps) dichroic mirror, Q-switched output HR @ 1064nm, spin on glass AR @ 808nm glue Quasi-monolithic Q-switched microchip laser f=30mm f=20mm fiber coupled coating, diode laser, laser crystal, 0.55 m PM-DC SESAM 808nm, 1W mm 5 Watt Pump diode mm 18 Watt 1.5 m PM-PCF Yb-doped photonic crystal fiber Vincenzo Berardi - 14 April 2011 CERN – 7° RD51 Collaboration Meeting

  7. CNR-IFN Bari - Laser materials processing lab Short pulse 100 ps fiber laser Specifications Wavelength 1064 nm Pulse duration 100 ps Repetition rate ≈ 100 kHz Collaboration 100 μ J Pulse energy max. Average power 10 W Peak power max. 1 MW CNR-IFN Bari FSU JENA Vincenzo Berardi - 14 April 2011 CERN – 7° RD51 Collaboration Meeting

  8. Post process Analysis • Electron Microscopy - Field Emission • EDS (EDX) (Energy Dispersive X-ray Spectroscopy) Vincenzo Berardi - 14 April 2011 CERN – 7° RD51 Collaboration Meeting

  9. A look at the surface(s) 5 m m 18 m m 5 m m layer front surface 5 m m layer back surface Vincenzo Berardi - 14 April 2011 CERN – 7° RD51 Collaboration Meeting

  10. EDS Metallic surface Vincenzo Berardi - 14 April 2011 CERN – 7° RD51 Collaboration Meeting

  11. Single layer drilling Array of 400 x 400 holes 1cm x 1 cm (post processing 20 x 20) 5 m m Average Pitch (center to center) d = 24 m m 18 m m Average size (diameter) = 13 m m Laser Power = 500mW Overall processing time = 2 hours and 30 mins Vincenzo Berardi - 14 April 2011 CERN – 7° RD51 Collaboration Meeting

  12. Single layer drilling 5 m m 18 m m Diameter Pitch ( m m) ( m m) 5 m m layer 13.10 (0.8) 24.50 (1) #8_02Mar_5up_laser_entry01 #8_02Mar_5up_laser_entry02 18 m m layer 7.50 (0.8) 23.55 (1) #8_02Mar_5up_laser_entry03 #8_02Mar_5up_laser_entry04 Vincenzo Berardi - 14 April 2011 CERN – 7° RD51 Collaboration Meeting

  13. Double layer drilling 18 m m 1 5 m m 2 5 m m 3 #9_02Mar_5up_laser_entry01 #9_02Mar_5up_laser_entry03 18 m m 4 #9_02Mar_5up_laser_entry02 #9_02Mar_5down_laser_exit01 Vincenzo Berardi - 14 April 2011 CERN – 7° RD51 Collaboration Meeting

  14. Double layer drilling 18 m m 1 5 m m 2 5 m m 3 #9_02Mar_5down_laser_exit02 #9_02Mar_5down_laser_exit03 18 m m 4 #9_02Mar_5down_laser_exit04 #9_02Mar_5down_laser_exit05 Vincenzo Berardi - 14 April 2011 CERN – 7° RD51 Collaboration Meeting

  15. EDS Hole edge 5 m m 18 m m Between holes Vincenzo Berardi - 14 April 2011 CERN – 7° RD51 Collaboration Meeting

  16. EDS Near Hole edge 5 m m 18 m m Hole edge Vincenzo Berardi - 14 April 2011 CERN – 7° RD51 Collaboration Meeting

  17. Summary  Cu meshes can be drilled to obtain 12-14 micron diameter holes with a pitch of 20-25 microns (focusing spot down to < 10 μ m)  Only percussion drilling can be reliably used and Oxide formation can be limited but not avoided by flowing inert gas on the surface.  Contamination can be reduced by changing the geometry as follows 18 m m 5 m m 18 m m Vincenzo Berardi - 14 April 2011 CERN – 7° RD51 Collaboration Meeting

  18. IFN Group Antonio Ancona CNR-IFN, Staff Teresa Sibillano CNR-IFN, Staff Francesca Di Niso Dept of Physics, PhD student INFNGroup Gabriella Catanesi INFN, Staff Vincenzo Berardi Dept of Physics, Staff Emilio Radicioni INFN, Staff Vincenzo Berardi - 14 April 2011 CERN – 7° RD51 Collaboration Meeting

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