A Novel SPM System for Determining Quantum Electronic Structure at the Nanometer-scale
Joseph A. Stroscio, NIST Fellow
Electron Physics Group
2011 Nanoelectronics Metrology, May 25, 2011
Joseph A. Stroscio, NIST Fellow Electron Physics Group 2011 - - PowerPoint PPT Presentation
A Novel SPM System for Determining Quantum Electronic Structure at the Nanometer-scale Joseph A. Stroscio, NIST Fellow Electron Physics Group 2011 Nanoelectronics Metrology, May 25, 2011 Presentation Outline Microscopy Honeycomb Lattices
2011 Nanoelectronics Metrology, May 25, 2011
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18th century microscopes Musée des Arts et Métiers, Paris
http:/www.eatechnology.com Wikipedia
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Quantum Mechanical Tunneling Distance Current
2 d
from Wikipedia
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2
F F
E V t E t t t
57, 2579 (1986)
Fein, PRL 58, 1192 (1987)
GaAs(110)
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1990 1981 2004 2010 T = 4 K T = 295 K T = 0.6 K T = 10 mK
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Processing Lab ULTSPM Lab at NIST
Stage 1 Stage 2 Stage 3 Vibration Isolation
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Magnet IVC UHV ≈700 mK STILL Shield ≈50 mK ICP Shield STM Silver rods Mixing Chamber ≈10 mK
3He dilute 3He richSTILL
3He Pumping
Station
3He
Pump
4LHe
1K pot
3He
Z3 Z1 Z2 E3 E1 E2 E4 E5
Comp
3He-4He Gas Handling System
(GHS)
1.5 K 4 K 700 m K 50 mK 10 m K Vladimir Shvarts Zuyu Zhao
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Young Jae Song Alexander F. Otte Young Kuk Joseph A. Stroscio
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Er atoms on CuN 8 nm Graphene/SiC 5 nm T=13 mK
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Savage, N., "Researchers pencil in graphene transistors." IEEE Spec. 45, 13 (2008).
IBM and HRL GHz Transistors
Nature Nanotech. (2010) SKKU, Korea
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Top View (real space) Carbon with 4 valence electrons Two atom basis in the unit cell → pseudo-spin
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Figure from droid-life.com
kx ky
Energy
Figure from P. Kim
Wallace (1947) kx' ky'
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For behavior away from Dirac point, make an expansion:
Paul Dirac
y x
kx' ky' E
/2 , /2
F nn x y F F x y i F i x y
k k
K K k
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kx' ky' E kx' ky' E
K K’
x y F x y
K x y F x y
K
Leads to additional degeneracy
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kx' ky' E
Katsnelson et al. Nature Physics 2006
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Geim & Novoselov Nature 2007
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“Standard” Landau level spacing Graphene Landau level spacing
Relativistic:
2
n
Standard Model:
*
n
Lev Landau 1908 - 1968 B
landscape
interactions
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http://en.wikipedia.org/wiki/Quantum_Hall
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C-Face termination Si-Face termination
SiC
SiC SiC
4 - 100 ML 1 - 5 ML
(0001) (0001)
Graphene layers
n~1012/cm2 n~1010/cm2 E E
SiC
Berger et al., J. Phys. Chem B 108, 19912 (2004) Berger et al., Science 312, 1191 (2006) de Heer et al., Sol. St. Commun., 143, 92 (2007)
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100 200 300 1 2 3 4 5
dI/dV (nS) Sample Bias (meV)
B= 5 T
n=0 1 2 3 4 5 6 7
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2 4 6 100 200 300
100 200 10 20 30
Linear Fit B=2 T B=3 T B=4 T
EN-E0 (meV) (NB)
1/2
N=1 B=0 T B=2 T B=3 T B=4 T
dI/dV (nS) Sample Bias (mV)
N=0
Zero field Dirac point is at -125 meV indicating a doping of ~1 x 1012 cm-2 Graphene on C-face SiC
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5
1 2 3 4 5
dI/dV (nS) Sample Bias (mV) B = 11.5 T
100 200 1 2 3
dI/dV (nS) Sample Bias (mV) B= 2 T N=1
ΔVrms = 1 mV ΔVrms = 50 μV
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5
1 2 3 4 5
dI/dV (nS) Sample Bias (mV) B = 11.5 T
ΔVrms = 50 μV
2 4 6 8 10 12 14 0.0 0.5 1.0 1.5 2.0
ES(meV)
Magnetic Field B (T) gS = 2.26 0.05
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5
1 2 3 4 5
dI/dV (nS) Sample Bias (mV) B = 11.5 T
ΔVrms = 50 μV
~1 meV/T
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3 5 3 6 9 3 6 9 5 10 5 10 5 10 15 5 10 15
B=11.75 T B=11 T B=11.5 T B=11.375 T B=11.25 T
ESL ESR
Sample Bias (mV)
=6
EV
B=11.125 T =11/2 1/2 filled LL
ESF ESF ESE
=5
dI/dV (nS)
=5 1/2 filled LL =9/2 =4
3 6 9 12
3 6 9
1/2 filled LL B=14 T =7/2
3 5 3 6 9
dI/dV (nS)
B=11 T ESL ESR
Sample Bias (mV)
=6
Fermi Level
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3 5 3 6 9 3 6 9 5 10 5 10 5 10 15 5 10 15
B=11.75 T B=11 T B=11.5 T B=11.375 T B=11.25 T
ESL ESR
Sample Bias (mV)
=6
EV
B=11.125 T =11/2 1/2 filled LL
ESF ESF ESE
=5
dI/dV (nS)
=5 1/2 filled LL =9/2 =4
3 6 9 12
3 6 9
1/2 filled LL B=14 T =7/2
3
5 10
Sample Bias (mV)
B=11.25 T ESE
=5
dI/dV (nS)
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Pauli Exclusion Principle
Wolfgang Pauli
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(2010)
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Impurities
EF @ Vg2 EF @ Vg1 Disorder potential variation Vg2 > Vg1 Puddle size @ Vg2
Gate Electrode
Etc……
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Raman spectroscopy
Optical viewing and probe alignment in CNST STM
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Gate insulator Gate electrode
100 200 300
Sample Bias (mV) dI/dV (nS)
5 10 15 20 25 30
Gate Voltage (V)
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LL0 LL1 LL0 LL-1
D F G
LL-1
5 10 15 20 25 30 35
100 200 300
Gate Voltage (V) Sample Bias (mV)
2 4 6
Filling Factor
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LL0 LL1 Potential Disorder Map
electron-rich hole-rich
2 nS dI/dV B=8 T STS Measurement of Dirac Point Fluctuations
Physics (2010)
0.4 dI/dV (nS) 1 Sample Bias (mV) dI/dV (nS)
N=0 N=-2 N=-1
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B = 0 T B = 2 T B = 4 T B = 5 T B = 6 T B = 7 T B = 8 T LL0 LL-1 LL-2 LL0 LL1 LL2
degeneracy
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E
Vb
STM tip Sample QD Vacuum barrier I.S.
1 2 3 4 Double barrier tunneling due to vacuum barrier and incompressible regions
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Si (back gate) SiO2
Cg Vg A I
STM tip
Vb
Landau level formed (Compressible region) Resistive region (Incompressible strip)
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Si (back gate) SiO2
Cg Vg A I
STM tip
Vb
Landau level formed (Compressible region) Resistive region (Incompressible strip)
EF EF Metallic Compressible Insulating Incompressible
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E k ΔU = 0
±LL0, 1 LL2 LL3 LL4 LL2 LL3 LL4
ΔU > 0
LL2 LL3 LL4 LL2 LL3 LL4 +LL0, 1 (top)
ΔU < 0
LL2 LL3 LL4 LL2 LL3 LL4
+LL0, 1 (top)
20 nm
STM topography image Disorder potential Electron puddle Hole puddle
20 nm
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20 nm
Single Layer Bilayer Electron puddle Hole puddle
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magnitude and sign
10 20 30 40 50 60
20 40
, , ,
Gate Voltage (V) Energy Gap, U (meV)
Hole puddle Electron puddle 8 T 6 T 0 T
etc… determine macroscale performance
BiSFET device
simultaneous transport and atomic characterization measurements to
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Jeonghoon Ha Jungseok Chae Young Kuk Sander Otte Young Jae Song
Niv Levy Tong Zhang
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Greg Rutter Suyong Jung Nikolai Klimov Nikolai Zhitenev Dave Newell Angie Hight- Walker
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Yike Hu Phil First Walt de Heer Hongki Min Shaffique Adam Mark Stiles Allan MacDonald Britt Torrance Eric Cockayne