Development of a new heating stage equipped thermal electron filter for scanning electron microscopy
- M. Nakamura, T. Isshiki, M. Tamai and K. Nishio
Kyoto Institute of Technology, Matsugasaki, Kyoto 606-8585, Japan (mailto:isshiki@dj.kit.ac.jp)
Development of a new heating stage equipped thermal electron filter - - PDF document
Development of a new heating stage equipped thermal electron filter for scanning electron microscopy M. Nakamura, T. Isshiki, M. Tamai and K. Nishio Kyoto Institute of Technology, Matsugasaki, Kyoto 606-8585, Japan (
Kyoto Institute of Technology, Matsugasaki, Kyoto 606-8585, Japan (mailto:isshiki@dj.kit.ac.jp)
100 105 1010 1015 1020 1025 400 800 1200 1600 2000 Electron density [
Temperature [oC]
1×10−4 2×10−4 3×10−4 4×10−4 5×10−4 6×10−4 2×105 4×105 6×105 8×105 Velocity distribution [%]
0.5 eV 1.0 eV 400oC 800oC 1200oC 1600oC 2000oC
Current controller (0mA - 150mA) Voltage controller (0V - 30V) thermal electrons secondary electrons infrared rays thermal electron filter secondary electron detector 10 kV radiation thermometer sapphire glass heating stage (tungsten filament)
Equipment: JEOL JSM-845 Accelerating voltage: 15 kV Probe current: 1 nA Magnification: 10,000 Grid voltage: −20 V
[1] T. Kamino and H. Saka, Microsc. Microanal. Mi-
[2] T. Isshiki, K. Nishio, Y. Deguchi, H. Yamamoto and
3, pp. 521 (1998) [3] M. Tamai, S. Miki, G. Pezzotti and A. Nakahira,