Development of a new heating stage equipped thermal electron filter - - PDF document

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Development of a new heating stage equipped thermal electron filter - - PDF document

Development of a new heating stage equipped thermal electron filter for scanning electron microscopy M. Nakamura, T. Isshiki, M. Tamai and K. Nishio Kyoto Institute of Technology, Matsugasaki, Kyoto 606-8585, Japan (


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Development of a new heating stage equipped thermal electron filter for scanning electron microscopy

  • M. Nakamura, T. Isshiki, M. Tamai and K. Nishio

Kyoto Institute of Technology, Matsugasaki, Kyoto 606-8585, Japan (mailto:isshiki@dj.kit.ac.jp)

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Introduction

Microscopic observations of ma- terials at high temperature give useful information to elucidate sintering and phase transition behaviors of materials. Kamino and Saka [1] devel-

  • ped a heating stage for high-

resolution TEM, which has a nar- row tungsten filament to hold and heat specimen. This direct heating method has merits that the temperature of the filament can be raised by small current and is quickly stabilized within a few ten seconds.

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Although a weak point of the heating method was indirect measurement of specimen tem- perature, we make it possible to measure the temperature pre- cisely by using radiation ther- mometer [2]. In this paper, we discuss a prob- lem caused in the case of apply- ing the heating method to high- temperature scanning electron microscopy (HTSEM) and sug- gest a solution of it.

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High-temperature SEM

Problems of HTSEM

Thermal electrons Heated filament for HTSEM emits a lot of thermal electrons (Fig. 1).

100 105 1010 1015 1020 1025 400 800 1200 1600 2000 Electron density [

  • m−2s−1]

Temperature [oC]

  • Fig. 1 Dependence of electron density

emitted from tungsten on temperature.

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The emitted thermal electrons are detected by the secondary elec- tron detector. They act as back- ground noise and decrease con- trast of the SEM image. Temperature measurement Measurement of specimen temper- ature by converting heating cur- rent into specimen temperature is indirect method and a troublesome

  • job. The conversion table should

be rebuilt every time the heating stage is changed to keep accuracy

  • f the measurement.
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Solution

Thermal electron filter Secondary and thermal electrons have different energy distribution.

Secondary Thermal electrons electrons (Fig. 2) 20-30 eV < a few eV

1×10−4 2×10−4 3×10−4 4×10−4 5×10−4 6×10−4 2×105 4×105 6×105 8×105 Velocity distribution [%]

  • Velocity of electron [m/s]

0.5 eV 1.0 eV 400oC 800oC 1200oC 1600oC 2000oC

  • Fig. 2 Velocity distribution of thermal

electrons.

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These electrons can be separated by energy filtering method.

  • Fig. 3 shows an overview of a new

heating stage equipped with a ther- mal electron filter. A grid electrode inserted between the heating stage and the detector is as follows.

Voltage range: 0 - −30 V Grid wire

  • Material:

tungsten (20 µm φ)

  • Winding density:

4 turns/mm Dimension: 40 mm in width 10 mm in height

A small light bulb removing glass cover is employed as a disposable heating filament.

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  • Fig. 3 An overview of a new heating

stage for high-temperature SEM. Radiation thermometer A radiation thermometer (Japan Sensor, FTZ2), installed by the side

  • f a specimen chamber to detect
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infrared rays emitted from the heat- ing filament, is used for precise measurement of specimen temper- ature. The heating stage equipped an SEM (JEOL, JSM-845) is schemat- ically illustrated in Fig. 4.

Current controller (0mA - 150mA) Voltage controller (0V - 30V) thermal electrons secondary electrons infrared rays thermal electron filter secondary electron detector 10 kV radiation thermometer sapphire glass heating stage (tungsten filament)

  • Fig. 4 A schematic diagram of a new

heating stage for high-temperature SEM.

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Results & Discussion

Effect of the new heating stage is verified by high-temperature SEM

  • bservation of SiC particles (Fig.5).

with the filter without the filter

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Equipment: JEOL JSM-845 Accelerating voltage: 15 kV Probe current: 1 nA Magnification: 10,000 Grid voltage: −20 V

  • Fig. 5 High-temperature SEM images of

SiC particle with (a-e: left) and without (f-i: right) thermal electron filter.

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Thermal electron filter

without the filter (right, Fig. 5) > ∼ 800 ◦C (Fig. 5 f, g): Observation is hindered by the necessity of drastic adjustment of contrast and brightness. > ∼ 1,300 ◦C (Fig. 5 h, i): The effect of the thermal electrons is beyond the margin of adjust- ment and it is difficult to observe. with the filter (left, Fig. 5) < ∼ 1,200 ◦C (Fig. 5 a): The filter brings smooth observa- tion without drastic adjustment.

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< ∼ 1,400 ◦C (Fig. 5 b-e): It is possible to observe images.

Temperature measurement

Accuracy of temperature measure- ment using the radiation ther- mometer is verified by observation

  • f a melting point of metals (Ag

and Au). Use of the radiation thermome- ter brings real-time measurement

  • f specimen temperature precisely

without the influence of an individ- ual difference of heating filaments.

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Application to In-situ SEM

  • Fig. 6 shows an example of high-

temperature SEM observation of sintering process of Ca-deficient hydroxyapatite (Ca-def HAp) with the heating stage.

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  • Fig. 6 In-situ SEM observation of

Ca-deficient hydroxyapatite whiskers at various temperatures.

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The same sintering process as that in the air [3] is observed, i. e., < 900 ◦C: Whiskers keep their shape. 900 - 1,000 ◦C: Whiskers are rapidly sin- tered and fattened. > 1,000 ◦C: Size of particles and pores increases but surface area decreases. In-situ HTSEM observation of Ca-def HAp can reveal the rela- tion between heat treatment and characteristics of porous HAp sintered in the air.

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Summary

The thermal electron filter is ef- fective to prevent the distur- bance by the thermal electrons and the radiation thermometer brings accurate and convenient

  • bservation.

They are needed HTSEM observation by the direct heating method. References

[1] T. Kamino and H. Saka, Microsc. Microanal. Mi-

  • crostruct. 4 (1993) 127

[2] T. Isshiki, K. Nishio, Y. Deguchi, H. Yamamoto and

  • M. Shiojiri, In: Proc. 14th ICEM, Cancun, Mexico,

3, pp. 521 (1998) [3] M. Tamai, S. Miki, G. Pezzotti and A. Nakahira,

  • J. Ceram. Soc. Japan 108 (2000) 915