15 Micron Pixel Pitch Stefan Lauxtermann, Vikram Vangapally Sensor - - PowerPoint PPT Presentation

15 micron pixel pitch
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15 Micron Pixel Pitch Stefan Lauxtermann, Vikram Vangapally Sensor - - PowerPoint PPT Presentation

A Fully Depleted Backside Illuminated CMOS Imager with VGA Resolution and 15 Micron Pixel Pitch Stefan Lauxtermann, Vikram Vangapally Sensor Creations, Inc. 2013 International Image Sensor Workshop (IISW) June 12 16, 2013 1 June 12 - 16,


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SLIDE 1

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A Fully Depleted Backside Illuminated CMOS Imager with VGA Resolution and 15 Micron Pixel Pitch

Stefan Lauxtermann, Vikram Vangapally Sensor Creations, Inc. 2013 International Image Sensor Workshop (IISW) June 12 – 16, 2013

June 12 - 16, 2013

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SLIDE 2

Highlights of Fully Depleted (FD) BSI Imager

  • High Sensitivity with 100% fill factor

– Peak QE: > 90% – QE at 300nm: > 30% – QE at 1050nm: > 25% (200micron thick silicon)

  • PIN photodiode

– High Speed (3dB bandwidth > 1GHz) – Low Noise (<10e-)

  • 2x2 Charge Domain Binning

– Frame rate and SNR increase by factor 4

  • Frame rate: 30Hz, 60Hz, 240Hz, 1000Hz
  • Row programmable full well capacity: 500ke-, 60ke-, 10ke-
  • Snapshot shutter: ITR, IWR, HDR, NDR
  • Programmable number of output ports: 1, 2, 4, 8

June 12 - 16, 2013

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Performance Spectrum Unachieved by any

  • ther Monolithic Imager Technology
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SLIDE 3

Cross Section of Fully Depleted CMOS Technology

June 12 - 16, 2013

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Charge Collection Region Defined by Lateral and Vertical Depletion

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SLIDE 4

3D Simulation of FD CMOS Pixel on 6.5 kW x cm Si

June 12 - 16, 2013

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3D Device Simulations were Used to Optimize Pixel Structure

Backside illumination Cut line 50mm Backside Contact Cut plane 50mm thick Si 15mm pixel pitch

Potential [V] 3.5

  • 10.5
  • 10.5

3.5 Potential [V]

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SLIDE 5

Potential Distribution Throughout Detector

June 12 - 16, 2013

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Potential [V]

0V 10V 50mm 0mm Potential Back side Collection Junction

3.5

  • 10.5

50mm

Photo Generated Charge Carriers are Gathered by Fast Drift Process (instead of slow diffusion) in Front Side Collection Junction

Front side

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SLIDE 6

June 12 - 16, 2013

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Estimate of Depletion Layer Versus Si Resistivity High Resistivity Silicon Must be Used to Achieve Deep Depletion

For best performance a backside bias must be applied

Our 6.5 kOhm x cm material can be depleted to a thickness > 400um when applying a backside bias of 100V

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SLIDE 7

June 12 - 16, 2013

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Estimated NIR QE Versus Detector Thickness Monolithic CMOS Sensor with NIR QE Comparable to Scientific CCDs At 200um detector thickness the achievable quantum efficiency for l=1050nm is >25%

measured value

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SLIDE 8

June 12 - 16, 2013

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Predicted Depletion Current of thick FD PIN Diode Dark Current is Dominated by Depletion – Not Diffusion – Current

At T= 300K and a depletion depth of 200um (corresponding to a backside bias

  • f 20V for 6.5kOhm x cm Si), the dark current limit is 4nA/cm2

measured value

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SLIDE 9

June 12 - 16, 2013

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Predicted Charge Spread Versus Detector Thickness MTF Performance Limited Pixel Pitch of FD imager: < 4.5um

For a 200um thick FD CMOS imager with 100V backside bias, photo generated charge carriers can spread up to 4.5 um before reaching the front side collection junction

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SLIDE 10

June 12 - 16, 2013

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Predicted FD PIN Diode Response Time Fully Depleted Imager is Suited to Support Nanosecond Integration Time Windows

Transit time of photo generated charge carriers in 100um FD CMOS imager with 100V backside bias < 1nsec, corresponding to a 3dB bandwidth > 1GHz

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SLIDE 11

Pixel Schematic

  • Programmable Full well capacity
  • Integrate while Read (IWR) snapshot shutter
  • Correlated Double Sampling readout with IWR snapshot shutter functionality

June 12 - 16, 2013

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Pixel Schematic Supports Low Noise Readout for < 100 nsec Integration Time Windows

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SLIDE 12

Pixel Timing

June 12 - 16, 2013

12

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SLIDE 13

2x2 Charge Domain Binning

  • Potential well of charge collecting junction is turned off in

skipped pixels (white circles)

June 12 - 16, 2013

13

SNR Increase in Readout Noise Limited Domain: 4x → Same as CCDs Frame Rate Increase: 4x → 2x Faster than CCDs

2x2 binned “super-pixel”

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SLIDE 14

June 12 - 16, 2013

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Predicted Sensor Performance of FD-CMOS Sensor Size and Layout of Fully Depleted VGA Sensor Comparable to Standard CMOS Imagers

Layout Screen Shot

12mm 12mm

All pads are placed along bottom edge

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SLIDE 15

Summary of Specifications

June 12 - 16, 2013

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FD CMOS Provides Unique Performance Matrix in a Monolithic Imaging Device

Parameter Value Array Format 640x512 Pixel Size 15um Die Size 12 x 12 mm2 Frame rate 30Hz, 60Hz, 240Hz, 1000Hz Pixel Rate 5 MHz, 5MHz, 20MHz, 41 MHz Number outputs 1,2,4,8 Shutter type global shutter Integration modes ITR, IWR, HDR, NDR Exposure time 100nsec to 30 msec Charge capacity 500ke, 60ke, 10ke Minimum Noise < 10e- QE at 1050nm > 25% for 200nm thick Si Binning 2x2, 1x2, 2x1 Output type analog Power 60 mW @ 60Hz frame rate Supply Voltages 1.8V/3.3V Serial interface 3 wire

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SLIDE 16

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June 12 - 16, 2013